JPS6256591A - 電気めつき方法 - Google Patents

電気めつき方法

Info

Publication number
JPS6256591A
JPS6256591A JP19555085A JP19555085A JPS6256591A JP S6256591 A JPS6256591 A JP S6256591A JP 19555085 A JP19555085 A JP 19555085A JP 19555085 A JP19555085 A JP 19555085A JP S6256591 A JPS6256591 A JP S6256591A
Authority
JP
Japan
Prior art keywords
plating
nickel
plated
electroplating
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP19555085A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0319307B2 (enrdf_load_stackoverflow
Inventor
Toru Murakami
透 村上
Hiroshi Uotani
魚谷 鴻
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Uemera Kogyo Co Ltd
C Uyemura and Co Ltd
Original Assignee
Uemera Kogyo Co Ltd
C Uyemura and Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Uemera Kogyo Co Ltd, C Uyemura and Co Ltd filed Critical Uemera Kogyo Co Ltd
Priority to JP19555085A priority Critical patent/JPS6256591A/ja
Publication of JPS6256591A publication Critical patent/JPS6256591A/ja
Publication of JPH0319307B2 publication Critical patent/JPH0319307B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/22Secondary treatment of printed circuits
    • H05K3/24Reinforcing the conductive pattern
    • H05K3/241Reinforcing the conductive pattern characterised by the electroplating method; means therefor, e.g. baths or apparatus

Landscapes

  • Electroplating And Plating Baths Therefor (AREA)
JP19555085A 1985-09-04 1985-09-04 電気めつき方法 Granted JPS6256591A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19555085A JPS6256591A (ja) 1985-09-04 1985-09-04 電気めつき方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19555085A JPS6256591A (ja) 1985-09-04 1985-09-04 電気めつき方法

Publications (2)

Publication Number Publication Date
JPS6256591A true JPS6256591A (ja) 1987-03-12
JPH0319307B2 JPH0319307B2 (enrdf_load_stackoverflow) 1991-03-14

Family

ID=16342964

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19555085A Granted JPS6256591A (ja) 1985-09-04 1985-09-04 電気めつき方法

Country Status (1)

Country Link
JP (1) JPS6256591A (enrdf_load_stackoverflow)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04116191A (ja) * 1990-09-04 1992-04-16 C Uyemura & Co Ltd 電気めっき方法
JPH05331677A (ja) * 1992-05-27 1993-12-14 Sumitomo Metal Mining Co Ltd 電気鉄めっき液
JPH05331676A (ja) * 1992-05-27 1993-12-14 Sumitomo Metal Mining Co Ltd 電気鉄めっき液
JP2009168691A (ja) * 2008-01-17 2009-07-30 Sumitomo Electric Ind Ltd ピンホールの評価方法
JP2009168692A (ja) * 2008-01-17 2009-07-30 Sumitomo Electric Ind Ltd ピンホールの評価方法
WO2018015168A1 (en) * 2016-07-18 2018-01-25 Basf Se Composition for cobalt plating comprising additive for void-free submicron feature filling
EP3839103A1 (en) * 2015-06-30 2021-06-23 MacDermid Enthone Inc. Cobalt filling of interconnects in microelectronics

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04116191A (ja) * 1990-09-04 1992-04-16 C Uyemura & Co Ltd 電気めっき方法
JPH05331677A (ja) * 1992-05-27 1993-12-14 Sumitomo Metal Mining Co Ltd 電気鉄めっき液
JPH05331676A (ja) * 1992-05-27 1993-12-14 Sumitomo Metal Mining Co Ltd 電気鉄めっき液
JP2009168691A (ja) * 2008-01-17 2009-07-30 Sumitomo Electric Ind Ltd ピンホールの評価方法
JP2009168692A (ja) * 2008-01-17 2009-07-30 Sumitomo Electric Ind Ltd ピンホールの評価方法
EP3839103A1 (en) * 2015-06-30 2021-06-23 MacDermid Enthone Inc. Cobalt filling of interconnects in microelectronics
US11434578B2 (en) 2015-06-30 2022-09-06 Macdermid Enthone Inc. Cobalt filling of interconnects in microelectronics
WO2018015168A1 (en) * 2016-07-18 2018-01-25 Basf Se Composition for cobalt plating comprising additive for void-free submicron feature filling
CN109477234A (zh) * 2016-07-18 2019-03-15 巴斯夫欧洲公司 包含用于无空隙亚微米结构填充的添加剂的钴镀覆用组合物
EP3885475A1 (en) * 2016-07-18 2021-09-29 Basf Se Composition for cobalt plating comprising additive for void-free submicron feature filling
CN114059125A (zh) * 2016-07-18 2022-02-18 巴斯夫欧洲公司 包含用于无空隙亚微米结构填充的添加剂的钴镀覆用组合物

Also Published As

Publication number Publication date
JPH0319307B2 (enrdf_load_stackoverflow) 1991-03-14

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees