JPS6255693B2 - - Google Patents

Info

Publication number
JPS6255693B2
JPS6255693B2 JP53143643A JP14364378A JPS6255693B2 JP S6255693 B2 JPS6255693 B2 JP S6255693B2 JP 53143643 A JP53143643 A JP 53143643A JP 14364378 A JP14364378 A JP 14364378A JP S6255693 B2 JPS6255693 B2 JP S6255693B2
Authority
JP
Japan
Prior art keywords
film
pattern
photoresist pattern
semiconductor substrate
photoresist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP53143643A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5570028A (en
Inventor
Kazuya Kikuchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP14364378A priority Critical patent/JPS5570028A/ja
Priority to US06/047,241 priority patent/US4253888A/en
Publication of JPS5570028A publication Critical patent/JPS5570028A/ja
Publication of JPS6255693B2 publication Critical patent/JPS6255693B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Weting (AREA)
JP14364378A 1978-06-16 1978-11-20 Fabricating method of semiconductor device Granted JPS5570028A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP14364378A JPS5570028A (en) 1978-11-20 1978-11-20 Fabricating method of semiconductor device
US06/047,241 US4253888A (en) 1978-06-16 1979-06-11 Pretreatment of photoresist masking layers resulting in higher temperature device processing

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14364378A JPS5570028A (en) 1978-11-20 1978-11-20 Fabricating method of semiconductor device

Publications (2)

Publication Number Publication Date
JPS5570028A JPS5570028A (en) 1980-05-27
JPS6255693B2 true JPS6255693B2 (enrdf_load_stackoverflow) 1987-11-20

Family

ID=15343543

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14364378A Granted JPS5570028A (en) 1978-06-16 1978-11-20 Fabricating method of semiconductor device

Country Status (1)

Country Link
JP (1) JPS5570028A (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR920002028B1 (ko) * 1988-07-21 1992-03-09 삼성반도체통신 주식회사 부산물을 이용한 리프트 오프 공정
JP2744356B2 (ja) * 1991-03-06 1998-04-28 富士通株式会社 半導体素子の製造方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6025897B2 (ja) * 1976-10-08 1985-06-20 松下電器産業株式会社 半導体装置の製造方法
JPS6013302B2 (ja) * 1976-12-11 1985-04-06 富士通株式会社 フオトレジストの処理方法

Also Published As

Publication number Publication date
JPS5570028A (en) 1980-05-27

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