JPH0546096B2 - - Google Patents

Info

Publication number
JPH0546096B2
JPH0546096B2 JP59192970A JP19297084A JPH0546096B2 JP H0546096 B2 JPH0546096 B2 JP H0546096B2 JP 59192970 A JP59192970 A JP 59192970A JP 19297084 A JP19297084 A JP 19297084A JP H0546096 B2 JPH0546096 B2 JP H0546096B2
Authority
JP
Japan
Prior art keywords
film
resist
etched
etching
organic film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59192970A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6175525A (ja
Inventor
Kyusaku Nishioka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP19297084A priority Critical patent/JPS6175525A/ja
Publication of JPS6175525A publication Critical patent/JPS6175525A/ja
Publication of JPH0546096B2 publication Critical patent/JPH0546096B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Drying Of Semiconductors (AREA)
JP19297084A 1984-09-12 1984-09-12 微細加工方法 Granted JPS6175525A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19297084A JPS6175525A (ja) 1984-09-12 1984-09-12 微細加工方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19297084A JPS6175525A (ja) 1984-09-12 1984-09-12 微細加工方法

Publications (2)

Publication Number Publication Date
JPS6175525A JPS6175525A (ja) 1986-04-17
JPH0546096B2 true JPH0546096B2 (enrdf_load_stackoverflow) 1993-07-13

Family

ID=16300071

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19297084A Granted JPS6175525A (ja) 1984-09-12 1984-09-12 微細加工方法

Country Status (1)

Country Link
JP (1) JPS6175525A (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4520777B2 (ja) * 2004-06-28 2010-08-11 日本オプネクスト株式会社 半導体光素子の製造方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6032844B2 (ja) * 1977-06-16 1985-07-30 住友電気工業株式会社 光導波路の製造方法

Also Published As

Publication number Publication date
JPS6175525A (ja) 1986-04-17

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