JPS6255294B2 - - Google Patents
Info
- Publication number
- JPS6255294B2 JPS6255294B2 JP1436280A JP1436280A JPS6255294B2 JP S6255294 B2 JPS6255294 B2 JP S6255294B2 JP 1436280 A JP1436280 A JP 1436280A JP 1436280 A JP1436280 A JP 1436280A JP S6255294 B2 JPS6255294 B2 JP S6255294B2
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- stripe
- large area
- marks
- correction coefficient
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000010894 electron beam technology Methods 0.000 claims description 47
- 239000000463 material Substances 0.000 claims description 24
- 238000000034 method Methods 0.000 claims description 16
- 238000005259 measurement Methods 0.000 claims description 11
- 230000003287 optical effect Effects 0.000 description 5
- 238000001514 detection method Methods 0.000 description 3
- 230000003321 amplification Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000003199 nucleic acid amplification method Methods 0.000 description 2
- 239000013589 supplement Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
- H01J37/3045—Object or beam position registration
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1436280A JPS56112726A (en) | 1980-02-08 | 1980-02-08 | Exposure of electron beam |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1436280A JPS56112726A (en) | 1980-02-08 | 1980-02-08 | Exposure of electron beam |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS56112726A JPS56112726A (en) | 1981-09-05 |
| JPS6255294B2 true JPS6255294B2 (enrdf_load_stackoverflow) | 1987-11-19 |
Family
ID=11858942
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1436280A Granted JPS56112726A (en) | 1980-02-08 | 1980-02-08 | Exposure of electron beam |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS56112726A (enrdf_load_stackoverflow) |
-
1980
- 1980-02-08 JP JP1436280A patent/JPS56112726A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS56112726A (en) | 1981-09-05 |
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