JPS56112726A - Exposure of electron beam - Google Patents

Exposure of electron beam

Info

Publication number
JPS56112726A
JPS56112726A JP1436280A JP1436280A JPS56112726A JP S56112726 A JPS56112726 A JP S56112726A JP 1436280 A JP1436280 A JP 1436280A JP 1436280 A JP1436280 A JP 1436280A JP S56112726 A JPS56112726 A JP S56112726A
Authority
JP
Japan
Prior art keywords
region
wafer
electron beam
exposure
correction coefficient
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1436280A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6255294B2 (enrdf_load_stackoverflow
Inventor
Kazumitsu Tanaka
Nobuo Goto
Hitoshi Takemura
Tetsuo Yuasa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Jeol Ltd
Nihon Denshi KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd, Nihon Denshi KK filed Critical Jeol Ltd
Priority to JP1436280A priority Critical patent/JPS56112726A/ja
Publication of JPS56112726A publication Critical patent/JPS56112726A/ja
Publication of JPS6255294B2 publication Critical patent/JPS6255294B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045—Object or beam position registration

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
JP1436280A 1980-02-08 1980-02-08 Exposure of electron beam Granted JPS56112726A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1436280A JPS56112726A (en) 1980-02-08 1980-02-08 Exposure of electron beam

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1436280A JPS56112726A (en) 1980-02-08 1980-02-08 Exposure of electron beam

Publications (2)

Publication Number Publication Date
JPS56112726A true JPS56112726A (en) 1981-09-05
JPS6255294B2 JPS6255294B2 (enrdf_load_stackoverflow) 1987-11-19

Family

ID=11858942

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1436280A Granted JPS56112726A (en) 1980-02-08 1980-02-08 Exposure of electron beam

Country Status (1)

Country Link
JP (1) JPS56112726A (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPS6255294B2 (enrdf_load_stackoverflow) 1987-11-19

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