JPS6254962A - トランジスタ - Google Patents
トランジスタInfo
- Publication number
- JPS6254962A JPS6254962A JP60196246A JP19624685A JPS6254962A JP S6254962 A JPS6254962 A JP S6254962A JP 60196246 A JP60196246 A JP 60196246A JP 19624685 A JP19624685 A JP 19624685A JP S6254962 A JPS6254962 A JP S6254962A
- Authority
- JP
- Japan
- Prior art keywords
- gate electrode
- transistor
- floating gate
- channel region
- threshold voltage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000006386 memory function Effects 0.000 claims abstract description 14
- 239000000758 substrate Substances 0.000 claims description 9
- 239000004065 semiconductor Substances 0.000 claims description 7
- 230000015654 memory Effects 0.000 description 18
- 238000002347 injection Methods 0.000 description 7
- 239000007924 injection Substances 0.000 description 7
- 238000000034 method Methods 0.000 description 6
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 230000005684 electric field Effects 0.000 description 3
- 230000010354 integration Effects 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 229910052796 boron Inorganic materials 0.000 description 2
- -1 boron ions Chemical class 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 230000005641 tunneling Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B69/00—Erasable-and-programmable ROM [EPROM] devices not provided for in groups H10B41/00 - H10B63/00, e.g. ultraviolet erasable-and-programmable ROM [UVEPROM] devices
Landscapes
- Read Only Memory (AREA)
- Semiconductor Memories (AREA)
- Non-Volatile Memory (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60196246A JPS6254962A (ja) | 1985-09-04 | 1985-09-04 | トランジスタ |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60196246A JPS6254962A (ja) | 1985-09-04 | 1985-09-04 | トランジスタ |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6254962A true JPS6254962A (ja) | 1987-03-10 |
JPH0577189B2 JPH0577189B2 (fr) | 1993-10-26 |
Family
ID=16354615
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP60196246A Granted JPS6254962A (ja) | 1985-09-04 | 1985-09-04 | トランジスタ |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6254962A (fr) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63268194A (ja) * | 1987-04-24 | 1988-11-04 | Toshiba Corp | 不揮発性半導体メモリ |
JPS6421970A (en) * | 1987-07-16 | 1989-01-25 | Nec Corp | Nonvolatile semiconductor memory device |
JPS6450298A (en) * | 1987-08-21 | 1989-02-27 | Toshiba Corp | Non-volatile semiconductor memory |
JPH01119069A (ja) * | 1987-10-30 | 1989-05-11 | Nec Corp | 不揮発性半導体記憶装置 |
EP0472241A2 (fr) * | 1990-08-21 | 1992-02-26 | Philips Patentverwaltung GmbH | Mémoire à semi-conducteurs électriquement programmable et effaçable et sa méthode d'opération |
JPH04233768A (ja) * | 1990-08-21 | 1992-08-21 | Philips Gloeilampenfab:Nv | 半導体メモリ及びその動作方法 |
US5323039A (en) * | 1988-10-21 | 1994-06-21 | Kabushiki Kaisha Toshiba | Non-volatile semiconductor memory and method of manufacturing the same |
-
1985
- 1985-09-04 JP JP60196246A patent/JPS6254962A/ja active Granted
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63268194A (ja) * | 1987-04-24 | 1988-11-04 | Toshiba Corp | 不揮発性半導体メモリ |
JPS6421970A (en) * | 1987-07-16 | 1989-01-25 | Nec Corp | Nonvolatile semiconductor memory device |
JPS6450298A (en) * | 1987-08-21 | 1989-02-27 | Toshiba Corp | Non-volatile semiconductor memory |
JPH01119069A (ja) * | 1987-10-30 | 1989-05-11 | Nec Corp | 不揮発性半導体記憶装置 |
US5323039A (en) * | 1988-10-21 | 1994-06-21 | Kabushiki Kaisha Toshiba | Non-volatile semiconductor memory and method of manufacturing the same |
EP0639860A1 (fr) * | 1988-10-21 | 1995-02-22 | Kabushiki Kaisha Toshiba | Mémoire semi-conductrice rémanente |
US5824583A (en) * | 1988-10-21 | 1998-10-20 | Kabushiki Kaisha Toshiba | Non-volatile semiconductor memory and method of manufacturing the same |
EP0472241A2 (fr) * | 1990-08-21 | 1992-02-26 | Philips Patentverwaltung GmbH | Mémoire à semi-conducteurs électriquement programmable et effaçable et sa méthode d'opération |
JPH04233768A (ja) * | 1990-08-21 | 1992-08-21 | Philips Gloeilampenfab:Nv | 半導体メモリ及びその動作方法 |
JPH04233769A (ja) * | 1990-08-21 | 1992-08-21 | Philips Gloeilampenfab:Nv | 半導体メモリ |
EP0472241B1 (fr) * | 1990-08-21 | 1998-05-06 | Philips Patentverwaltung GmbH | Mémoire à semi-conducteurs électriquement programmable et effaçable et sa méthode d'opération |
Also Published As
Publication number | Publication date |
---|---|
JPH0577189B2 (fr) | 1993-10-26 |
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