JPS6251760U - - Google Patents
Info
- Publication number
- JPS6251760U JPS6251760U JP1985143021U JP14302185U JPS6251760U JP S6251760 U JPS6251760 U JP S6251760U JP 1985143021 U JP1985143021 U JP 1985143021U JP 14302185 U JP14302185 U JP 14302185U JP S6251760 U JPS6251760 U JP S6251760U
- Authority
- JP
- Japan
- Prior art keywords
- protection device
- electrostatic discharge
- discharge protection
- protected
- bonding pad
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims description 3
- 229920005591 polysilicon Polymers 0.000 claims description 3
- 238000010586 diagram Methods 0.000 description 2
- 239000011229 interlayer Substances 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/02—Bonding areas ; Manufacturing methods related thereto
- H01L24/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L24/05—Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/04042—Bonding areas specifically adapted for wire connectors, e.g. wirebond pads
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/484—Connecting portions
- H01L2224/48463—Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a ball bond
Landscapes
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
- Protection Of Static Devices (AREA)
- Amplifiers (AREA)
- Semiconductor Integrated Circuits (AREA)
Description
第1図は本考案に依る静電破壊保護装置を説明
する上面図、第2図は第1図の―線断面図、
第3図および第4図は一般的な静電破壊保護装置
を説明する回路図、第5図は従来の静電破壊保護
装置を説明する上面図、第6図は第5図の―
線断面図である。 主な図番の説明、3はポリシリコン抵抗体、4
は層間絶縁膜、5はボンデイングパツド、7は導
電層、8はボンデイングワイヤーである。
する上面図、第2図は第1図の―線断面図、
第3図および第4図は一般的な静電破壊保護装置
を説明する回路図、第5図は従来の静電破壊保護
装置を説明する上面図、第6図は第5図の―
線断面図である。 主な図番の説明、3はポリシリコン抵抗体、4
は層間絶縁膜、5はボンデイングパツド、7は導
電層、8はボンデイングワイヤーである。
Claims (1)
- ボンデイングパツドよりポリシリコン抵抗体を
介して被保護MISトランジスタのゲート電極あ
るいはドレイン領域に接続される静電破壊保護装
置に於いて、前記ポリシリコン抵抗体上に絶縁層
を介して前記ボンデイングパツドより延在された
導電層で被覆することを特徴とする静電破壊保護
装置。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1985143021U JPS6251760U (ja) | 1985-09-19 | 1985-09-19 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1985143021U JPS6251760U (ja) | 1985-09-19 | 1985-09-19 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6251760U true JPS6251760U (ja) | 1987-03-31 |
Family
ID=31052310
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1985143021U Pending JPS6251760U (ja) | 1985-09-19 | 1985-09-19 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6251760U (ja) |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6254458A (ja) * | 1985-09-03 | 1987-03-10 | Toshiba Corp | 入力保護回路 |
-
1985
- 1985-09-19 JP JP1985143021U patent/JPS6251760U/ja active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6254458A (ja) * | 1985-09-03 | 1987-03-10 | Toshiba Corp | 入力保護回路 |