JPS6249728B2 - - Google Patents
Info
- Publication number
- JPS6249728B2 JPS6249728B2 JP20984381A JP20984381A JPS6249728B2 JP S6249728 B2 JPS6249728 B2 JP S6249728B2 JP 20984381 A JP20984381 A JP 20984381A JP 20984381 A JP20984381 A JP 20984381A JP S6249728 B2 JPS6249728 B2 JP S6249728B2
- Authority
- JP
- Japan
- Prior art keywords
- resist
- container
- wall
- resist coating
- peripheral wall
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000011248 coating agent Substances 0.000 claims description 31
- 238000000576 coating method Methods 0.000 claims description 31
- 230000002093 peripheral effect Effects 0.000 claims description 16
- 235000012431 wafers Nutrition 0.000 description 30
- 229920002120 photoresistant polymer Polymers 0.000 description 21
- 239000007788 liquid Substances 0.000 description 8
- 239000002245 particle Substances 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 238000007599 discharging Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000013618 particulate matter Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Coating Apparatus (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20984381A JPS58114426A (ja) | 1981-12-28 | 1981-12-28 | レジスト塗布装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20984381A JPS58114426A (ja) | 1981-12-28 | 1981-12-28 | レジスト塗布装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58114426A JPS58114426A (ja) | 1983-07-07 |
| JPS6249728B2 true JPS6249728B2 (enrdf_load_stackoverflow) | 1987-10-21 |
Family
ID=16579533
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP20984381A Granted JPS58114426A (ja) | 1981-12-28 | 1981-12-28 | レジスト塗布装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58114426A (enrdf_load_stackoverflow) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6042730U (ja) * | 1983-08-31 | 1985-03-26 | 関西日本電気株式会社 | 半導体製造装置 |
| JPS6151732U (enrdf_load_stackoverflow) * | 1984-09-10 | 1986-04-07 | ||
| JPS61219136A (ja) * | 1985-03-25 | 1986-09-29 | Iwatsu Electric Co Ltd | レジスト回転塗布機 |
| JPH0444216Y2 (enrdf_load_stackoverflow) * | 1985-10-07 | 1992-10-19 |
-
1981
- 1981-12-28 JP JP20984381A patent/JPS58114426A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS58114426A (ja) | 1983-07-07 |
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