JPS58114426A - レジスト塗布装置 - Google Patents

レジスト塗布装置

Info

Publication number
JPS58114426A
JPS58114426A JP20984381A JP20984381A JPS58114426A JP S58114426 A JPS58114426 A JP S58114426A JP 20984381 A JP20984381 A JP 20984381A JP 20984381 A JP20984381 A JP 20984381A JP S58114426 A JPS58114426 A JP S58114426A
Authority
JP
Japan
Prior art keywords
resist
hood
wafer
reservoir
opening
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP20984381A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6249728B2 (enrdf_load_stackoverflow
Inventor
Ichiro Yazawa
一郎 矢沢
Hideo Tadokoro
田所　秀夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oki Electric Industry Co Ltd
Original Assignee
Oki Electric Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oki Electric Industry Co Ltd filed Critical Oki Electric Industry Co Ltd
Priority to JP20984381A priority Critical patent/JPS58114426A/ja
Publication of JPS58114426A publication Critical patent/JPS58114426A/ja
Publication of JPS6249728B2 publication Critical patent/JPS6249728B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Coating Apparatus (AREA)
JP20984381A 1981-12-28 1981-12-28 レジスト塗布装置 Granted JPS58114426A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20984381A JPS58114426A (ja) 1981-12-28 1981-12-28 レジスト塗布装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20984381A JPS58114426A (ja) 1981-12-28 1981-12-28 レジスト塗布装置

Publications (2)

Publication Number Publication Date
JPS58114426A true JPS58114426A (ja) 1983-07-07
JPS6249728B2 JPS6249728B2 (enrdf_load_stackoverflow) 1987-10-21

Family

ID=16579533

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20984381A Granted JPS58114426A (ja) 1981-12-28 1981-12-28 レジスト塗布装置

Country Status (1)

Country Link
JP (1) JPS58114426A (enrdf_load_stackoverflow)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6042730U (ja) * 1983-08-31 1985-03-26 関西日本電気株式会社 半導体製造装置
JPS6151732U (enrdf_load_stackoverflow) * 1984-09-10 1986-04-07
JPS61219136A (ja) * 1985-03-25 1986-09-29 Iwatsu Electric Co Ltd レジスト回転塗布機
US4790262A (en) * 1985-10-07 1988-12-13 Tokyo Denshi Kagaku Co., Ltd. Thin-film coating apparatus

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6042730U (ja) * 1983-08-31 1985-03-26 関西日本電気株式会社 半導体製造装置
JPS6151732U (enrdf_load_stackoverflow) * 1984-09-10 1986-04-07
JPS61219136A (ja) * 1985-03-25 1986-09-29 Iwatsu Electric Co Ltd レジスト回転塗布機
US4790262A (en) * 1985-10-07 1988-12-13 Tokyo Denshi Kagaku Co., Ltd. Thin-film coating apparatus

Also Published As

Publication number Publication date
JPS6249728B2 (enrdf_load_stackoverflow) 1987-10-21

Similar Documents

Publication Publication Date Title
FI860178A7 (fi) Foerfarande och anordning foer oeverdragning av partiklar och vaetskedroppar.
US3870014A (en) Liquid and aerosol collecting device
JPS58114426A (ja) レジスト塗布装置
KR100752535B1 (ko) 스피닝 마이크로전자 기판 위의 공기를 제어하기 위한방법 및 장치
JPS6231817B2 (enrdf_load_stackoverflow)
JPH0929158A (ja) 回転式塗布装置
JP2006086204A (ja) 塗布装置
JP2854210B2 (ja) スピンナ装置
JP2576914B2 (ja) スピンナ装置
JPS61207019A (ja) 回転塗布装置
JP2800008B2 (ja) 回転処理装置及び回転処理方法
JPH0453224A (ja) スピンコータ
JPH0315735B2 (enrdf_load_stackoverflow)
US6395086B1 (en) Shield for wafer station
JPH03284744A (ja) スピンコーター
JPS63250123A (ja) 半導体製造装置
JP3589518B2 (ja) 基板処理装置
JPS6333660Y2 (enrdf_load_stackoverflow)
JPS61206221A (ja) スピン塗布装置
JPS63260025A (ja) 回転塗布装置
JPH02252232A (ja) レジスト塗布装置
JPS63283131A (ja) 半導体用回転塗布機
JPS58178522A (ja) 塗布方法および装置
JPH1164241A (ja) 乾式現像処理装置
JPH06320092A (ja) 乾燥固化性液状物滴下用ノズル