JPS6247124A - 露光装置用高速シヤツタ− - Google Patents

露光装置用高速シヤツタ−

Info

Publication number
JPS6247124A
JPS6247124A JP60186600A JP18660085A JPS6247124A JP S6247124 A JPS6247124 A JP S6247124A JP 60186600 A JP60186600 A JP 60186600A JP 18660085 A JP18660085 A JP 18660085A JP S6247124 A JPS6247124 A JP S6247124A
Authority
JP
Japan
Prior art keywords
shutter
pinholes
fly
exposure apparatus
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60186600A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0587010B2 (enrdf_load_stackoverflow
Inventor
Yukio Tokuda
幸夫 徳田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP60186600A priority Critical patent/JPS6247124A/ja
Publication of JPS6247124A publication Critical patent/JPS6247124A/ja
Publication of JPH0587010B2 publication Critical patent/JPH0587010B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Shutters For Cameras (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP60186600A 1985-08-27 1985-08-27 露光装置用高速シヤツタ− Granted JPS6247124A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60186600A JPS6247124A (ja) 1985-08-27 1985-08-27 露光装置用高速シヤツタ−

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60186600A JPS6247124A (ja) 1985-08-27 1985-08-27 露光装置用高速シヤツタ−

Publications (2)

Publication Number Publication Date
JPS6247124A true JPS6247124A (ja) 1987-02-28
JPH0587010B2 JPH0587010B2 (enrdf_load_stackoverflow) 1993-12-15

Family

ID=16191396

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60186600A Granted JPS6247124A (ja) 1985-08-27 1985-08-27 露光装置用高速シヤツタ−

Country Status (1)

Country Link
JP (1) JPS6247124A (enrdf_load_stackoverflow)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01246003A (ja) * 1988-03-29 1989-10-02 Mitsubishi Metal Corp 表面被覆硬質材料製切削工具
JPH01252304A (ja) * 1988-03-29 1989-10-09 Mitsubishi Metal Corp 表面被覆硬質材料製切削工具
FR2890461A1 (fr) * 2005-09-05 2007-03-09 Sagem Defense Securite Obturateur et illuminateur d'un dispositif de photolithographie
JP2011044480A (ja) * 2009-08-19 2011-03-03 Nikon Corp 照明光学系、露光装置、およびデバイス製造方法
JP2015535949A (ja) * 2012-09-25 2015-12-17 サジャン・デファンス・セキュリテＳａｇｅｍ Ｄｅｆｅｎｓｅ Ｓｅｃｕｒｉｔｅ 回折の制御を可能にするフォトリソグラフィック照明装置

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01246003A (ja) * 1988-03-29 1989-10-02 Mitsubishi Metal Corp 表面被覆硬質材料製切削工具
JPH01252304A (ja) * 1988-03-29 1989-10-09 Mitsubishi Metal Corp 表面被覆硬質材料製切削工具
FR2890461A1 (fr) * 2005-09-05 2007-03-09 Sagem Defense Securite Obturateur et illuminateur d'un dispositif de photolithographie
WO2007028793A1 (fr) * 2005-09-05 2007-03-15 Sagem Defense Securite Illuminateur d'un dispositif de photolithographie
JP2009507387A (ja) * 2005-09-05 2009-02-19 サジャン・デファンス・セキュリテ フォトリソグラフィデバイスのための照明装置
US7982855B2 (en) 2005-09-05 2011-07-19 Miguel Boutonne Illuminator for a photolithography device
JP2011044480A (ja) * 2009-08-19 2011-03-03 Nikon Corp 照明光学系、露光装置、およびデバイス製造方法
JP2015535949A (ja) * 2012-09-25 2015-12-17 サジャン・デファンス・セキュリテＳａｇｅｍ Ｄｅｆｅｎｓｅ Ｓｅｃｕｒｉｔｅ 回折の制御を可能にするフォトリソグラフィック照明装置

Also Published As

Publication number Publication date
JPH0587010B2 (enrdf_load_stackoverflow) 1993-12-15

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