JPS6244417B2 - - Google Patents

Info

Publication number
JPS6244417B2
JPS6244417B2 JP57174263A JP17426382A JPS6244417B2 JP S6244417 B2 JPS6244417 B2 JP S6244417B2 JP 57174263 A JP57174263 A JP 57174263A JP 17426382 A JP17426382 A JP 17426382A JP S6244417 B2 JPS6244417 B2 JP S6244417B2
Authority
JP
Japan
Prior art keywords
silicon
polycrystalline silicon
substrate
single crystal
manufacturing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP57174263A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5963738A (ja
Inventor
Akinobu Sato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JIDO KEISOKU GIJUTSU KENKYUKUMIAI
Original Assignee
JIDO KEISOKU GIJUTSU KENKYUKUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by JIDO KEISOKU GIJUTSU KENKYUKUMIAI filed Critical JIDO KEISOKU GIJUTSU KENKYUKUMIAI
Priority to JP57174263A priority Critical patent/JPS5963738A/ja
Publication of JPS5963738A publication Critical patent/JPS5963738A/ja
Publication of JPS6244417B2 publication Critical patent/JPS6244417B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10W10/019—
    • H10W10/10—

Landscapes

  • Local Oxidation Of Silicon (AREA)
  • Element Separation (AREA)
JP57174263A 1982-10-04 1982-10-04 誘電体分離基板の製造方法 Granted JPS5963738A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57174263A JPS5963738A (ja) 1982-10-04 1982-10-04 誘電体分離基板の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57174263A JPS5963738A (ja) 1982-10-04 1982-10-04 誘電体分離基板の製造方法

Publications (2)

Publication Number Publication Date
JPS5963738A JPS5963738A (ja) 1984-04-11
JPS6244417B2 true JPS6244417B2 (cg-RX-API-DMAC10.html) 1987-09-21

Family

ID=15975575

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57174263A Granted JPS5963738A (ja) 1982-10-04 1982-10-04 誘電体分離基板の製造方法

Country Status (1)

Country Link
JP (1) JPS5963738A (cg-RX-API-DMAC10.html)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5382551A (en) * 1993-04-09 1995-01-17 Micron Semiconductor, Inc. Method for reducing the effects of semiconductor substrate deformities

Also Published As

Publication number Publication date
JPS5963738A (ja) 1984-04-11

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