JPS6243426A - アルカリ可溶性シルメチレン重合体 - Google Patents
アルカリ可溶性シルメチレン重合体Info
- Publication number
- JPS6243426A JPS6243426A JP18295085A JP18295085A JPS6243426A JP S6243426 A JPS6243426 A JP S6243426A JP 18295085 A JP18295085 A JP 18295085A JP 18295085 A JP18295085 A JP 18295085A JP S6243426 A JPS6243426 A JP S6243426A
- Authority
- JP
- Japan
- Prior art keywords
- formula
- polymer
- expressed
- alkali
- silmethylene
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Silicon Polymers (AREA)
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18295085A JPS6243426A (ja) | 1985-08-22 | 1985-08-22 | アルカリ可溶性シルメチレン重合体 |
| US06/859,370 US4745169A (en) | 1985-05-10 | 1986-05-05 | Alkali-soluble siloxane polymer, silmethylene polymer, and polyorganosilsesquioxane polymer |
| EP86106238A EP0204963B1 (en) | 1985-05-10 | 1986-05-07 | Use of Alkali-Soluble Polyorganosilsesquioxane Polymers in a resist for preparing electronics parts. |
| DE8686106238T DE3687479T2 (de) | 1985-05-10 | 1986-05-07 | Verwendung von in alkalische milieu loeslichen silsesquioxanpolymeren in einem resist zur herstellung von electronischen teilen. |
| US07/893,946 US5264319A (en) | 1985-05-10 | 1992-06-04 | Photosensitive resin composition having high resistance to oxygen plasma, containing alkali-soluble organosilicon polymer and photosensitive dissolution inhibitor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18295085A JPS6243426A (ja) | 1985-08-22 | 1985-08-22 | アルカリ可溶性シルメチレン重合体 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6243426A true JPS6243426A (ja) | 1987-02-25 |
| JPH0558447B2 JPH0558447B2 (enExample) | 1993-08-26 |
Family
ID=16127185
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18295085A Granted JPS6243426A (ja) | 1985-05-10 | 1985-08-22 | アルカリ可溶性シルメチレン重合体 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6243426A (enExample) |
-
1985
- 1985-08-22 JP JP18295085A patent/JPS6243426A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0558447B2 (enExample) | 1993-08-26 |
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