JPS6237384B2 - - Google Patents

Info

Publication number
JPS6237384B2
JPS6237384B2 JP58199855A JP19985583A JPS6237384B2 JP S6237384 B2 JPS6237384 B2 JP S6237384B2 JP 58199855 A JP58199855 A JP 58199855A JP 19985583 A JP19985583 A JP 19985583A JP S6237384 B2 JPS6237384 B2 JP S6237384B2
Authority
JP
Japan
Prior art keywords
chromium
transparent substrate
film
mask blank
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP58199855A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6091356A (ja
Inventor
Masao Ushida
Shigekazu Matsui
Shuji Yoshida
Masaru Mitsui
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoya Corp
Original Assignee
Hoya Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp filed Critical Hoya Corp
Priority to JP58199855A priority Critical patent/JPS6091356A/ja
Publication of JPS6091356A publication Critical patent/JPS6091356A/ja
Publication of JPS6237384B2 publication Critical patent/JPS6237384B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/88—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof prepared by photographic processes for production of originals simulating relief

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Physical Vapour Deposition (AREA)
JP58199855A 1983-10-25 1983-10-25 クロムマスクブランクとその製造方法 Granted JPS6091356A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58199855A JPS6091356A (ja) 1983-10-25 1983-10-25 クロムマスクブランクとその製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58199855A JPS6091356A (ja) 1983-10-25 1983-10-25 クロムマスクブランクとその製造方法

Publications (2)

Publication Number Publication Date
JPS6091356A JPS6091356A (ja) 1985-05-22
JPS6237384B2 true JPS6237384B2 (enrdf_load_stackoverflow) 1987-08-12

Family

ID=16414767

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58199855A Granted JPS6091356A (ja) 1983-10-25 1983-10-25 クロムマスクブランクとその製造方法

Country Status (1)

Country Link
JP (1) JPS6091356A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07305163A (ja) * 1994-05-10 1995-11-21 Itochu Fine Chem Kk 低反射クロム系膜
WO1997015866A1 (fr) * 1995-10-24 1997-05-01 Ulvac Coating Corporation Masque a changement de phase et son procede de fabrication

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0765156B2 (ja) * 1985-10-09 1995-07-12 セイコーエプソン株式会社 時計用外装部品の製造方法
JP2524103B2 (ja) * 1985-10-22 1996-08-14 セイコーエプソン株式会社 時計用外装部品
JPH0742568B2 (ja) * 1985-10-22 1995-05-10 セイコーエプソン株式会社 時計用外装部品
US5449547A (en) * 1993-03-15 1995-09-12 Teikoku Piston Ring Co., Ltd. Hard coating material, sliding member coated with hard coating material and method for manufacturing sliding member
TW480367B (en) * 2000-02-16 2002-03-21 Shinetsu Chemical Co Photomask blank, photomask and method of manufacture

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6052428B2 (ja) * 1978-05-25 1985-11-19 富士通株式会社 酸化クロム被膜の形成法
JPS57104141A (en) * 1980-12-22 1982-06-29 Dainippon Printing Co Ltd Photomask and photomask substrate

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07305163A (ja) * 1994-05-10 1995-11-21 Itochu Fine Chem Kk 低反射クロム系膜
WO1997015866A1 (fr) * 1995-10-24 1997-05-01 Ulvac Coating Corporation Masque a changement de phase et son procede de fabrication

Also Published As

Publication number Publication date
JPS6091356A (ja) 1985-05-22

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