JPS6091356A - クロムマスクブランクとその製造方法 - Google Patents
クロムマスクブランクとその製造方法Info
- Publication number
- JPS6091356A JPS6091356A JP58199855A JP19985583A JPS6091356A JP S6091356 A JPS6091356 A JP S6091356A JP 58199855 A JP58199855 A JP 58199855A JP 19985583 A JP19985583 A JP 19985583A JP S6091356 A JPS6091356 A JP S6091356A
- Authority
- JP
- Japan
- Prior art keywords
- chromium
- mask blank
- base plate
- film
- transparent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 title claims abstract description 16
- 238000004519 manufacturing process Methods 0.000 title claims description 4
- 239000011651 chromium Substances 0.000 title abstract description 12
- 229910052804 chromium Inorganic materials 0.000 title abstract description 9
- 239000007789 gas Substances 0.000 claims abstract description 17
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims abstract description 11
- 239000000203 mixture Substances 0.000 claims abstract description 8
- 239000000758 substrate Substances 0.000 claims description 13
- 229910052757 nitrogen Inorganic materials 0.000 claims description 4
- 238000007254 oxidation reaction Methods 0.000 claims description 2
- 230000001590 oxidative effect Effects 0.000 claims description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims 1
- 239000010931 gold Substances 0.000 claims 1
- 229910052737 gold Inorganic materials 0.000 claims 1
- 230000003647 oxidation Effects 0.000 claims 1
- MWUXSHHQAYIFBG-UHFFFAOYSA-N nitrogen oxide Inorganic materials O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 abstract description 16
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 abstract description 6
- 229910052786 argon Inorganic materials 0.000 abstract description 4
- 230000007547 defect Effects 0.000 abstract description 4
- 239000005361 soda-lime glass Substances 0.000 abstract description 3
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 abstract 1
- 229910002091 carbon monoxide Inorganic materials 0.000 abstract 1
- 239000008246 gaseous mixture Substances 0.000 abstract 1
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 150000004767 nitrides Chemical class 0.000 description 5
- 238000000034 method Methods 0.000 description 3
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 229910000423 chromium oxide Inorganic materials 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000005121 nitriding Methods 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 238000003786 synthesis reaction Methods 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 238000005352 clarification Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- AZLYZRGJCVQKKK-UHFFFAOYSA-N dioxohydrazine Chemical compound O=NN=O AZLYZRGJCVQKKK-UHFFFAOYSA-N 0.000 description 1
- 239000003292 glue Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 230000002747 voluntary effect Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/88—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof prepared by photographic processes for production of originals simulating relief
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58199855A JPS6091356A (ja) | 1983-10-25 | 1983-10-25 | クロムマスクブランクとその製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58199855A JPS6091356A (ja) | 1983-10-25 | 1983-10-25 | クロムマスクブランクとその製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6091356A true JPS6091356A (ja) | 1985-05-22 |
| JPS6237384B2 JPS6237384B2 (enrdf_load_stackoverflow) | 1987-08-12 |
Family
ID=16414767
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58199855A Granted JPS6091356A (ja) | 1983-10-25 | 1983-10-25 | クロムマスクブランクとその製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6091356A (enrdf_load_stackoverflow) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6283461A (ja) * | 1985-10-09 | 1987-04-16 | Seiko Epson Corp | 時計用外装部品の製造方法 |
| JPS6296666A (ja) * | 1985-10-22 | 1987-05-06 | Seiko Epson Corp | 時計用外装部品 |
| JPS6296665A (ja) * | 1985-10-22 | 1987-05-06 | Seiko Epson Corp | 時計用外装部品 |
| GB2276176A (en) * | 1993-03-15 | 1994-09-21 | Teikoku Piston Ring Co Ltd | Hard coating material based on chromium nitride and sliding member coated therewith |
| EP1130466A3 (en) * | 2000-02-16 | 2003-05-07 | Shin-Etsu Chemical Co., Ltd. | Photomask blank, photomask and method of manufacture |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5674647A (en) * | 1992-11-21 | 1997-10-07 | Ulvac Coating Corporation | Phase shift mask and manufacturing method thereof and exposure method using phase shift mask |
| JPH07305163A (ja) * | 1994-05-10 | 1995-11-21 | Itochu Fine Chem Kk | 低反射クロム系膜 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS54153790A (en) * | 1978-05-25 | 1979-12-04 | Fujitsu Ltd | Chromium oxide layer formation |
| JPS57104141A (en) * | 1980-12-22 | 1982-06-29 | Dainippon Printing Co Ltd | Photomask and photomask substrate |
-
1983
- 1983-10-25 JP JP58199855A patent/JPS6091356A/ja active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS54153790A (en) * | 1978-05-25 | 1979-12-04 | Fujitsu Ltd | Chromium oxide layer formation |
| JPS57104141A (en) * | 1980-12-22 | 1982-06-29 | Dainippon Printing Co Ltd | Photomask and photomask substrate |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6283461A (ja) * | 1985-10-09 | 1987-04-16 | Seiko Epson Corp | 時計用外装部品の製造方法 |
| JPS6296666A (ja) * | 1985-10-22 | 1987-05-06 | Seiko Epson Corp | 時計用外装部品 |
| JPS6296665A (ja) * | 1985-10-22 | 1987-05-06 | Seiko Epson Corp | 時計用外装部品 |
| GB2276176A (en) * | 1993-03-15 | 1994-09-21 | Teikoku Piston Ring Co Ltd | Hard coating material based on chromium nitride and sliding member coated therewith |
| US5449547A (en) * | 1993-03-15 | 1995-09-12 | Teikoku Piston Ring Co., Ltd. | Hard coating material, sliding member coated with hard coating material and method for manufacturing sliding member |
| GB2276176B (en) * | 1993-03-15 | 1996-12-04 | Teikoku Piston Ring Co Ltd | Hard coating material,sliding member coated with hard coating material and method for manufacturing sliding member |
| EP1130466A3 (en) * | 2000-02-16 | 2003-05-07 | Shin-Etsu Chemical Co., Ltd. | Photomask blank, photomask and method of manufacture |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6237384B2 (enrdf_load_stackoverflow) | 1987-08-12 |
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