JPS623418B2 - - Google Patents
Info
- Publication number
- JPS623418B2 JPS623418B2 JP12008877A JP12008877A JPS623418B2 JP S623418 B2 JPS623418 B2 JP S623418B2 JP 12008877 A JP12008877 A JP 12008877A JP 12008877 A JP12008877 A JP 12008877A JP S623418 B2 JPS623418 B2 JP S623418B2
- Authority
- JP
- Japan
- Prior art keywords
- metal
- emulsion
- printing
- pattern
- stainless steel
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000002184 metal Substances 0.000 claims description 21
- 229910052751 metal Inorganic materials 0.000 claims description 21
- 238000007639 printing Methods 0.000 claims description 17
- 239000000839 emulsion Substances 0.000 claims description 15
- 238000000034 method Methods 0.000 claims description 13
- 238000007747 plating Methods 0.000 claims description 12
- 239000010935 stainless steel Substances 0.000 claims description 10
- 229910001220 stainless steel Inorganic materials 0.000 claims description 10
- 239000011888 foil Substances 0.000 claims description 7
- 239000010410 layer Substances 0.000 description 15
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 14
- 239000000463 material Substances 0.000 description 7
- 229910052759 nickel Inorganic materials 0.000 description 7
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 6
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- 229910000881 Cu alloy Inorganic materials 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 229920002120 photoresistant polymer Polymers 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 239000012790 adhesive layer Substances 0.000 description 1
- 239000010953 base metal Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 230000007261 regionalization Effects 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- UKLNMMHNWFDKNT-UHFFFAOYSA-M sodium chlorite Chemical compound [Na+].[O-]Cl=O UKLNMMHNWFDKNT-UHFFFAOYSA-M 0.000 description 1
- 229960002218 sodium chlorite Drugs 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Landscapes
- Photosensitive Polymer And Photoresist Processing (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12008877A JPS5454704A (en) | 1977-10-07 | 1977-10-07 | Method of reproducing printing screen |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12008877A JPS5454704A (en) | 1977-10-07 | 1977-10-07 | Method of reproducing printing screen |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5454704A JPS5454704A (en) | 1979-05-01 |
JPS623418B2 true JPS623418B2 (enrdf_load_stackoverflow) | 1987-01-24 |
Family
ID=14777603
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12008877A Granted JPS5454704A (en) | 1977-10-07 | 1977-10-07 | Method of reproducing printing screen |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5454704A (enrdf_load_stackoverflow) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3441593A1 (de) * | 1984-11-14 | 1986-05-22 | Ferd. Rüesch AG, St. Gallen | Verfahren und vorrichtung zum herstellen von siebdruckgeweben fuer siebdruckzylinder |
JPS61189543A (ja) * | 1985-02-19 | 1986-08-23 | Process Rabo Micron:Kk | スクリ−ン印刷用原版の製造方法 |
-
1977
- 1977-10-07 JP JP12008877A patent/JPS5454704A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS5454704A (en) | 1979-05-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE2752900A1 (de) | Verfahren zum aufbringen eines photoresistfilms auf ein substrat | |
JPS5933673B2 (ja) | 薄い自立金属構造の製造方法 | |
US3358363A (en) | Method of making fuse elements | |
US2459129A (en) | Production of photographic stencils | |
TW444526B (en) | Process for the production of etched circuits | |
JPH0936084A (ja) | パターン形成方法 | |
JPS623418B2 (enrdf_load_stackoverflow) | ||
JPH11323592A (ja) | 電鋳金属体およびその製造方法 | |
JP3017752B2 (ja) | 印刷用メタルマスクおよびその製造方法 | |
JP2002076575A (ja) | 半導体装置用基板の製造方法 | |
JP3395222B2 (ja) | プリント配線板の製造方法 | |
JP3804534B2 (ja) | リードフレームの製造方法 | |
JP2005037883A (ja) | メッシュ層を有するメタルマスク | |
US3458370A (en) | Fotoform-metallic evaporation mask making | |
JPH07142841A (ja) | プリント配線板の製造方法 | |
JP2000235989A (ja) | バンプ付き回路基板の製造方法 | |
JPH08253878A (ja) | エッチング部品の製造方法 | |
JP2723744B2 (ja) | 印刷配線板の製造方法 | |
JPH0683067A (ja) | 印刷版の製造方法 | |
CN115087223B (zh) | 一种解决pcb阻焊鬼影的工艺方法及pcb板 | |
JPH0353587A (ja) | レジストパターンの形成方法 | |
JP2000294121A (ja) | プラズマディスプレイパネルの電極形成方法 | |
JPS6233316B2 (enrdf_load_stackoverflow) | ||
JP2500659B2 (ja) | 印刷配線板の製造方法 | |
JPH1025581A (ja) | エッチング部品の製造方法 |