JPS6232160B2 - - Google Patents
Info
- Publication number
- JPS6232160B2 JPS6232160B2 JP60084417A JP8441785A JPS6232160B2 JP S6232160 B2 JPS6232160 B2 JP S6232160B2 JP 60084417 A JP60084417 A JP 60084417A JP 8441785 A JP8441785 A JP 8441785A JP S6232160 B2 JPS6232160 B2 JP S6232160B2
- Authority
- JP
- Japan
- Prior art keywords
- single crystal
- cylindrical
- cutting
- axis
- lithium tantalate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B33/00—After-treatment of single crystals or homogeneous polycrystalline material with defined structure
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/10—Inorganic compounds or compositions
- C30B29/16—Oxides
- C30B29/22—Complex oxides
- C30B29/30—Niobates; Vanadates; Tantalates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2223/00—Details relating to semiconductor or other solid state devices covered by the group H01L23/00
- H01L2223/544—Marks applied to semiconductor devices or parts
- H01L2223/54493—Peripheral marks on wafers, e.g. orientation flats, notches, lot number
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60084417A JPS60246299A (ja) | 1985-04-22 | 1985-04-22 | タンタル酸リチウム単結晶ウエハーの製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60084417A JPS60246299A (ja) | 1985-04-22 | 1985-04-22 | タンタル酸リチウム単結晶ウエハーの製造方法 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP51119417A Division JPS6051280B2 (ja) | 1976-10-06 | 1976-10-06 | タンタル酸リチウム単結晶ウエハ−の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60246299A JPS60246299A (ja) | 1985-12-05 |
| JPS6232160B2 true JPS6232160B2 (cs) | 1987-07-13 |
Family
ID=13830009
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60084417A Granted JPS60246299A (ja) | 1985-04-22 | 1985-04-22 | タンタル酸リチウム単結晶ウエハーの製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60246299A (cs) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100496526B1 (ko) * | 2002-09-25 | 2005-06-22 | 일진디스플레이(주) | 표면 탄성파 소자용 탄탈산 리튬 단결정 기판의 제조방법 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6051280B2 (ja) * | 1976-10-06 | 1985-11-13 | 株式会社東芝 | タンタル酸リチウム単結晶ウエハ−の製造方法 |
-
1985
- 1985-04-22 JP JP60084417A patent/JPS60246299A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS60246299A (ja) | 1985-12-05 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| DE69001411T2 (de) | Verfahren zur Herstellung eines Substrats für Halbleiteranordnungen. | |
| KR930007797B1 (ko) | 탄성 표면파 장치 | |
| DE2917698C2 (de) | Piezoelektrische Vorrichtung | |
| DE102018107496B3 (de) | Volumenschallwellenresonatorvorrichtung und Verfahren zu deren Herstellung | |
| US4755314A (en) | Single crystal wafer of lithium tantalate | |
| JPS6232160B2 (cs) | ||
| JPS6051280B2 (ja) | タンタル酸リチウム単結晶ウエハ−の製造方法 | |
| DE69211463T2 (de) | Akustische Oberflächenwellenanordnung | |
| US4898641A (en) | Single crystal wafer of lithium tantalate | |
| JP3849996B2 (ja) | 単結晶光学素子の製造方法 | |
| CA1128840A (en) | Method of growing quartz | |
| JP3866887B2 (ja) | 圧電性単結晶ウエーハ | |
| JPS63182904A (ja) | エネルギ閉じ込め型圧電振動部品 | |
| DE4497992C2 (de) | Rechteckiges AT-Schnitt-Quarzelement, Quarzschwinger, Quarzschwingereinheit und Quarzoszillator sowie Verfahren zur Herstellung des Quarzelements | |
| US2412644A (en) | Method of manufacturing coated articles | |
| JPH04294622A (ja) | 圧電素子の製造方法 | |
| JP2950000B2 (ja) | 人工水晶育成方法 | |
| JP2006156976A (ja) | 圧電単結晶素子 | |
| JP2845432B2 (ja) | 四ホウ酸リチウム単結晶基板の製造方法 | |
| EP0243215B1 (en) | A single crystal wafer of lithium tantalate | |
| JPH11106284A (ja) | 単結晶の製造方法 | |
| JP7019052B2 (ja) | 弾性表面波素子用基板及びその製造方法 | |
| JPH04130810A (ja) | Atカット水晶振動片の製造方法 | |
| JPH0325966B2 (cs) | ||
| JP2787996B2 (ja) | 四ほう酸リチウム単結晶の製造方法 |