JPS62291173A - 遮断可能な高出力半導体素子 - Google Patents

遮断可能な高出力半導体素子

Info

Publication number
JPS62291173A
JPS62291173A JP62138839A JP13883987A JPS62291173A JP S62291173 A JPS62291173 A JP S62291173A JP 62138839 A JP62138839 A JP 62138839A JP 13883987 A JP13883987 A JP 13883987A JP S62291173 A JPS62291173 A JP S62291173A
Authority
JP
Japan
Prior art keywords
wall
layer
cathode
region
groove
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62138839A
Other languages
English (en)
Japanese (ja)
Inventor
ホルシュト　グリューニンク
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BBC Brown Boveri AG Switzerland
Original Assignee
BBC Brown Boveri AG Switzerland
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by BBC Brown Boveri AG Switzerland filed Critical BBC Brown Boveri AG Switzerland
Publication of JPS62291173A publication Critical patent/JPS62291173A/ja
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D12/00—Bipolar devices controlled by the field effect, e.g. insulated-gate bipolar transistors [IGBT]
    • H10D12/211—Gated diodes
    • H10D12/212—Gated diodes having PN junction gates, e.g. field controlled diodes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D12/00—Bipolar devices controlled by the field effect, e.g. insulated-gate bipolar transistors [IGBT]
    • H10D12/211—Gated diodes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D18/00—Thyristors
    • H10D18/60—Gate-turn-off devices 
    • H10D18/65—Gate-turn-off devices  with turn-off by field effect 
    • H10D18/655—Gate-turn-off devices  with turn-off by field effect  produced by insulated gate structures
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/13—Semiconductor regions connected to electrodes carrying current to be rectified, amplified or switched, e.g. source or drain regions
    • H10D62/149—Source or drain regions of field-effect devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/17—Semiconductor regions connected to electrodes not carrying current to be rectified, amplified or switched, e.g. channel regions
    • H10D62/343—Gate regions of field-effect devices having PN junction gates
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00—Electrodes of devices having potential barriers
    • H10D64/20—Electrodes characterised by their shapes, relative sizes or dispositions 
    • H10D64/27—Electrodes not carrying the current to be rectified, amplified, oscillated or switched, e.g. gates
    • H10D64/311—Gate electrodes for field-effect devices

Landscapes

  • Thyristors (AREA)
JP62138839A 1986-06-03 1987-06-02 遮断可能な高出力半導体素子 Pending JPS62291173A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CH2233/86A CH670173A5 (enExample) 1986-06-03 1986-06-03
CH02233/86-3 1986-06-03

Publications (1)

Publication Number Publication Date
JPS62291173A true JPS62291173A (ja) 1987-12-17

Family

ID=4228973

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62138839A Pending JPS62291173A (ja) 1986-06-03 1987-06-02 遮断可能な高出力半導体素子

Country Status (5)

Country Link
US (1) US4952990A (enExample)
EP (1) EP0249122B1 (enExample)
JP (1) JPS62291173A (enExample)
CH (1) CH670173A5 (enExample)
DE (1) DE3785488D1 (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0317802A1 (de) * 1987-11-25 1989-05-31 BBC Brown Boveri AG Abschaltbares Leistungshalbleiterbauelement sowie Verfahren zu dessen Herstellung
FR2679068B1 (fr) * 1991-07-10 1997-04-25 France Telecom Procede de fabrication d'un transistor a effet de champ vertical, et transistor obtenu par ce procede.
JP2751910B2 (ja) * 1996-02-28 1998-05-18 日本電気株式会社 半導体受光素子及びその製造方法
DE19648041B4 (de) * 1996-11-20 2010-07-15 Robert Bosch Gmbh Integriertes vertikales Halbleiterbauelement
US5940689A (en) * 1997-06-30 1999-08-17 Harris Corporation Method of fabricating UMOS semiconductor devices using a self-aligned, reduced mask process
JP2001024182A (ja) * 1999-07-12 2001-01-26 Ngk Insulators Ltd 半導体装置
JP4696964B2 (ja) * 2005-07-15 2011-06-08 ソニー株式会社 メモリ用の半導体装置
JP2013530527A (ja) * 2010-05-25 2013-07-25 エスエス エスシー アイピー、エルエルシー 逆方向バイアス下においてゲート−ソース漏れが低減された自己整合半導体デバイスおよび作製方法
US9203041B2 (en) 2014-01-31 2015-12-01 International Business Machines Corporation Carbon nanotube transistor having extended contacts
US11545585B2 (en) * 2020-08-21 2023-01-03 Monolithic Power Systems, Inc. Single sided channel mesa power junction field effect transistor
US12206028B2 (en) 2020-08-21 2025-01-21 Monolithic Power Systems, Inc. Single sided channel mesa power junction field effect transistor

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4037245A (en) * 1975-11-28 1977-07-19 General Electric Company Electric field controlled diode with a current controlling surface grid
US4514747A (en) * 1978-08-07 1985-04-30 Hitachi, Ltd. Field controlled thyristor with double-diffused source region
FR2480505A1 (fr) * 1980-04-14 1981-10-16 Thomson Csf Transistor a effet de champ a jonction de puissance a fonctionnement vertical et procede de fabrication
JPS57172765A (en) * 1981-04-17 1982-10-23 Semiconductor Res Found Electrostatic induction thyristor
JPS57173974A (en) * 1981-04-20 1982-10-26 Hitachi Ltd Semiconductor device
US4571815A (en) * 1981-11-23 1986-02-25 General Electric Company Method of making vertical channel field controlled device employing a recessed gate structure
US4476622A (en) * 1981-12-24 1984-10-16 Gte Laboratories Inc. Recessed gate static induction transistor fabrication
DE3468787D1 (en) * 1983-03-31 1988-02-18 Bbc Brown Boveri & Cie Semiconductor power device and method of manufacture
EP0178387B1 (de) * 1984-10-19 1992-10-07 BBC Brown Boveri AG Abschaltbares Leistungshalbleiterbauelement

Also Published As

Publication number Publication date
US4952990A (en) 1990-08-28
CH670173A5 (enExample) 1989-05-12
DE3785488D1 (de) 1993-05-27
EP0249122A1 (de) 1987-12-16
EP0249122B1 (de) 1993-04-21

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