JPS62273546A - Electrophotographic sensitive body - Google Patents

Electrophotographic sensitive body

Info

Publication number
JPS62273546A
JPS62273546A JP11780186A JP11780186A JPS62273546A JP S62273546 A JPS62273546 A JP S62273546A JP 11780186 A JP11780186 A JP 11780186A JP 11780186 A JP11780186 A JP 11780186A JP S62273546 A JPS62273546 A JP S62273546A
Authority
JP
Japan
Prior art keywords
amorphous silicon
photoconductive layer
zirconium
contg
photoreceptor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11780186A
Other languages
Japanese (ja)
Inventor
Yuzuru Fukuda
譲 福田
Shigeru Yagi
茂 八木
Kenichi Karakida
唐木田 健一
Yasunari Okugawa
奥川 康令
Yasuo Ro
盧 泰男
Noriyoshi Takahashi
高橋 徳好
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Business Innovation Corp
Original Assignee
Fuji Xerox Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Xerox Co Ltd filed Critical Fuji Xerox Co Ltd
Priority to JP11780186A priority Critical patent/JPS62273546A/en
Publication of JPS62273546A publication Critical patent/JPS62273546A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03GELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G5/00Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
    • G03G5/02Charge-receiving layers
    • G03G5/04Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
    • G03G5/043Photoconductive layers characterised by having two or more layers or characterised by their composite structure
    • G03G5/0433Photoconductive layers characterised by having two or more layers or characterised by their composite structure all layers being inorganic
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03GELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G5/00Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
    • G03G5/14Inert intermediate or cover layers for charge-receiving layers
    • G03G5/147Cover layers
    • G03G5/14704Cover layers comprising inorganic material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photoreceptors In Electrophotography (AREA)

Abstract

PURPOSE:To obtain the titled body having a very small dark attenuation of the electrostatic charge potential by constituting the photoconductive layer from an i-type semiconductor composed of an amorphous silicon contg. hydrogen atom as a main component, and by constituting a surface layer from a dried curing material of a solution contg. at least one kind of org. zirconium compd. CONSTITUTION:The photoconductive layer composed of the amorphous silicon is coated on a conductive substrate and the surface layer is laminated on said photoconductive layer. The dried curing material of the solution contg. at least one kind of the org. zirconium compd. is used as the surface layer. The i-type semiconductor contg. the amorphous silicon as the main component, and at least one kind of atom selected from carbon atom, nitrogen tom and oxygen atom as an impurity, is used as the photoconductive layer. The photoconductive layer contg. the amorphous silicon as the main component is formed on the substrate by using one kind of a silicon hydride gas such as SiH4 etc., or its mixture as a starting material by a method of glow- discharging method. Thus, the high mechanical strength, the high durability, the high heat-resisting property and the high photosensitivity of the titled body are maintained, and the high electrostatic charge holding power of the titled body is obtd. without being affected the surroundings of an outside and the number of using, thereby obtaining the picture image having excellent quality.

Description

【発明の詳細な説明】 3、発明の詳細な説明 (産業上の利用分野) 本発明は、電子写真用感光体に関し、特に、感光層に非
晶質ケイ素を用いた電子写真用感光体に関する。
Detailed Description of the Invention 3. Detailed Description of the Invention (Field of Industrial Application) The present invention relates to an electrophotographic photoreceptor, and particularly relates to an electrophotographic photoreceptor using amorphous silicon in the photosensitive layer. .

(従来の技術) 電子写真法は、感光体に帯電、像露光により静電潜像を
形成し、この潜像をトナーと称される現像剤で現像後、
転写紙にトナー像を転写し定着して複写物を得る方法で
ある。この電子写真法に用いられる感光層は、基本構成
として導電性基板上に感光層を積層して成る。しかして
、従来より、感光体を構成する材料としてはセレンある
いはセレン合金、硫化カドミウム、酸化亜鉛等の無R感
光材料、あるいは、ポリビニルカルバゾール、トリニト
ロフルオレノン、ビスアゾ顔料、フタロンアニン、ピラ
ゾリン、ヒドラゾン等の有機感光材料が知られており、
感光層を単層あるいは積層にして用いられている。しか
しながら、従来より用いられているこれらの感光層は、
耐久性、耐熱性、光感度などにおいて未だ解決すべき問
題点を有している。
(Prior Art) In electrophotography, an electrostatic latent image is formed by charging a photoreceptor and exposing it to light, and after developing this latent image with a developer called a toner,
This is a method of transferring and fixing a toner image onto transfer paper to obtain a copy. The basic structure of the photosensitive layer used in this electrophotographic method is that the photosensitive layer is laminated on a conductive substrate. Conventionally, the materials constituting photoreceptors have been non-R photosensitive materials such as selenium or selenium alloys, cadmium sulfide, and zinc oxide, or materials such as polyvinylcarbazole, trinitrofluorenone, bisazo pigments, phthalonanine, pyrazoline, and hydrazone. Organic photosensitive materials are known,
The photosensitive layer is used as a single layer or as a stack. However, these conventionally used photosensitive layers are
There are still problems to be solved in terms of durability, heat resistance, photosensitivity, etc.

(発明が解決しようとする問題点) 近年、この感光層として非晶質ケイ素(アモルファスシ
リコン)を用いた感光体が知られ種々その改善が試みら
れている。この非晶質ケイ素を用いた感光体は、シラン
(SiH,)ガスをグロー放電分解法等によりケイ素の
非晶質膜を導電性基板上に形成したものであって、非晶
質ケイ素膜中に水素原子が組み込まれて光導電性を呈す
るものである。この非晶質ケイ素感光体は、感光層の表
面硬度が高く傷つきに<<、摩耗にも強く、耐熱性も高
く、機械的強度においてもすぐれている。更に、非晶質
ケイ素は、分光感度域が広く、高い光感度を有する如く
感光特性もすぐれている。しかし反面、非晶質ケイ素を
用いた感光体は、暗減衰が大きく、帯電しても十分な帯
電電位が得られるという欠点を有する。即ち、非晶質ケ
イ素感光体を帯電し、像露光して静電潜像を形成し、次
いで現像する際、感光体上の表面電荷が像露光工程まで
、あるいは現像工程までの間に光照射を受けなかった部
分の電荷までも減衰してしまい、現像に必要な帯電電位
が得られない。この帯電電位の減衰は、環境条件の影響
によっても変化しやすく、特に高温高湿環境では帯電電
位が大巾に低下する。
(Problems to be Solved by the Invention) In recent years, photoreceptors using amorphous silicon as the photosensitive layer have been known, and various attempts have been made to improve them. This photoreceptor using amorphous silicon is one in which an amorphous film of silicon is formed on a conductive substrate using silane (SiH) gas using a glow discharge decomposition method. Hydrogen atoms are incorporated into the material to exhibit photoconductivity. This amorphous silicon photoreceptor has a photosensitive layer that has a high surface hardness, is resistant to scratches, is resistant to abrasion, has high heat resistance, and has excellent mechanical strength. Furthermore, amorphous silicon has a wide spectral sensitivity range and has excellent photosensitivity, such as high photosensitivity. However, on the other hand, photoreceptors using amorphous silicon have the disadvantage that dark decay is large and a sufficient charging potential cannot be obtained even when charged. That is, when an amorphous silicon photoreceptor is charged, imagewise exposed to form an electrostatic latent image, and then developed, the surface charge on the photoreceptor is not irradiated with light until the imagewise exposure step or the development step. Even the charge on the parts that are not affected is attenuated, making it impossible to obtain the charging potential necessary for development. This attenuation of the charging potential is likely to change depending on the influence of environmental conditions, and in particular, the charging potential decreases significantly in a high temperature and high humidity environment.

更に、非晶質ケイ素の感光体は、繰返し使用すると徐々
に帯電電位が低下してしまう。この様な帯電電位の暗減
衰の大きな感光体を用いて複写物を作成すると、画像濃
度が低くまた、中間調の再現性に乏しい複写物となる。
Furthermore, when an amorphous silicon photoreceptor is used repeatedly, its charging potential gradually decreases. If a copy is made using a photoreceptor with such a large dark attenuation of the charged potential, the copy will have low image density and poor reproducibility of halftones.

本発明の目的は、非晶質ケイ素を用いる感光体の上述の
欠点を解消した電子写真用感光体を提供することにある
An object of the present invention is to provide an electrophotographic photoreceptor that eliminates the above-mentioned drawbacks of photoreceptors using amorphous silicon.

更に、本発明の目的は、非晶質ケイ素を用い、しかも、
帯電電位の暗減衰が極めて小さい電子写真用感光体を提
供することにある。
Furthermore, the object of the present invention is to use amorphous silicon, and
An object of the present invention is to provide an electrophotographic photoreceptor in which the dark decay of the charged potential is extremely small.

本発明の他の目的は、帯電特性が外部環境の雲囲気の変
化によって影響を受けない電子写真用感光体を提供する
ことにある。
Another object of the present invention is to provide an electrophotographic photoreceptor whose charging characteristics are not affected by changes in the cloud surroundings of the external environment.

また、本発明の他の目的は、繰返し使用されても画像品
質の優れた電子写真用感光体を提供することにある。
Another object of the present invention is to provide an electrophotographic photoreceptor with excellent image quality even after repeated use.

更に、本発明の他の目的は、機械的強度、耐久性、耐熱
性、光感度などの電子写真特性に優れた電子写真用感光
体を提供することにある。
Furthermore, another object of the present invention is to provide an electrophotographic photoreceptor having excellent electrophotographic properties such as mechanical strength, durability, heat resistance, and photosensitivity.

(問題点を解決するための手段) 本発明者は、鋭意研究を行なった結果、導電性基板上に
、非晶質ケイ素から成る光導電層を被覆し、更に、その
上に表面層を積層すると共に、該表面層として、有機ジ
ルコニウム化合m ヲ少?、、Cくとも1種類含有する
溶液の乾燥硬化物を用いることによって上記目的が達成
されることを見出した。
(Means for Solving the Problem) As a result of extensive research, the present inventor coated a photoconductive layer made of amorphous silicon on a conductive substrate, and further laminated a surface layer thereon. At the same time, as the surface layer, an organic zirconium compound is added. It has been found that the above object can be achieved by using a dry cured product of a solution containing at least one type of C.

光導電層としては、非晶質ケイ素を主体とし、不純物と
して炭素原子、窒素原子および酸素原子のうちの少なく
とも1種類を含有するl型半導体を用いる。
As the photoconductive layer, an l-type semiconductor mainly composed of amorphous silicon and containing at least one of carbon atoms, nitrogen atoms, and oxygen atoms as impurities is used.

かくして、本発明に従えば、導電性基板上に光導電層お
よび表面層を順次積層して成る電子写真用感光体におい
て、前記光導電層が、水素原子を含有する非晶質ケイ素
を主体として不純物とじて炭素原子、窒素原子および酸
素原子のうちの少なくとも1種類を含有する1型半導体
から成り、前記表面層が、有機ジルコニウム化合物を少
なくとも1+!li類含む溶液の乾燥硬化物から成るこ
とを特徴とする電子写真用感光体が提供される。
Thus, according to the present invention, in an electrophotographic photoreceptor comprising a photoconductive layer and a surface layer sequentially laminated on a conductive substrate, the photoconductive layer is mainly composed of amorphous silicon containing hydrogen atoms. The surface layer is made of a type 1 semiconductor containing at least one of carbon atoms, nitrogen atoms, and oxygen atoms as impurities, and the surface layer contains at least 1+ organic zirconium compound! Provided is an electrophotographic photoreceptor comprising a dried and cured product of a solution containing Li.

本発明の電子写真用感光体の表面層を形成するのに用い
られる有機ジルコニウム化合物としては、種々のものが
考えられるが、特に好ましいのは、ジルコニウム錯体お
よびジルコニウムアルコキシドである。ジルコニウム錯
体の好ましい例は、ジルコニウムアセトアセトネート、
ジルコニウムテトラキスアセチルアセトネート、ジルコ
ニウムテトラキスアセチルアセトネート、ジルコニウム
トリフ′トキシアセチルアセト不一ト、ジルコニウムト
リフロロアセチルアセトネート、ジルコニウムテトラキ
スエチルアセトアセテート、ジルコニウムブトキシトリ
スエチルアセトアセテート、ジルコニウムジブトキシビ
スエチルアセトアセテート、ジルコニウムトリブトキシ
皐ノエチルアセトアセテート、ビスアセチルアセトネー
トビスエチルアセトアセテートジルコニウム、モノアセ
チルアセトネートトリスエチルアセトアセテートジルコ
ニウム、ビスアセチルアセトネートビスエチルラクテー
トジルコニウム等のアセチルアセトンジルコニウム錯体
である。その他に、ジルコニウムテトラキスエチルラク
テート、ジルコニウムジブトキシビスエチルラクテート
等のジルコニウム錯体を用いることもできる。ジルコニ
ウムアルコキシドの好ましい例としては、ジルコニウム
テトラメトキシド、ジルコニウムテトラ−n−プロポキ
シド、ジルコニウムテトライソプロポキシド、ジルコニ
ウム−n−ブトキシド、ジルコニウムイソブトキシド、
等が挙げられる。
Although various organic zirconium compounds can be used to form the surface layer of the electrophotographic photoreceptor of the present invention, particularly preferred are zirconium complexes and zirconium alkoxides. Preferred examples of zirconium complexes include zirconium acetoacetonate,
Zirconium tetrakis acetylacetonate, zirconium tetrakis acetylacetonate, zirconium trifluoroacetylacetonate, zirconium trifluoroacetylacetonate, zirconium tetrakis ethyl acetoacetate, zirconium butoxy tris ethyl acetoacetate, zirconium dibutoxy bis ethyl acetoacetate, These are acetylacetone zirconium complexes, such as zirconium tributoxyl ethylacetoacetate, bisacetylacetonate bisethylacetoacetate zirconium, monoacetylacetonate trisethylacetoacetate zirconium, and bisacetylacetonate bisethylacetoacetate zirconium. In addition, zirconium complexes such as zirconium tetrakisethyl lactate and zirconium dibutoxybisethyl lactate can also be used. Preferred examples of zirconium alkoxide include zirconium tetramethoxide, zirconium tetra-n-propoxide, zirconium tetraisopropoxide, zirconium-n-butoxide, zirconium isobutoxide,
etc.

本発明の電子写真用感光体を得るに当っては、上記のご
とき有機ジルコニウム化合物の1種または2種以上を適
当な溶媒に溶解した溶液を塗布する。また、この際、こ
れらの有機ジルコニウム化合物に有機ケイ素化合物を混
合した溶液を用いてもよい。この有機ケイ素化合物とし
ては一般にシランカップリング剤と呼ばれている化合物
が好適であり、例えば、ビニル) IJクロルンラン、
ビニルトリエトキシシラン、ビニルトリス(β−メトキ
ンエトキシ)シラン、r−グリシドキシプロピルトリメ
トキシシラン、r−メタアクリロキシプロピルトリメト
キシシラン、N−β(アミノエチル)γ−アミノプロピ
ルトリメ′トキシシラン、N−βくアミノエチル)T−
アミノプロピルメチルジメトキシシラン、T−クロロプ
ロピルトリメトキシシラン、T−メルカプトプロピルト
リメトキシシラン、T−アミノプロピルトリエトキシシ
ラン、メチルトリメトキシシラン、ジメチルジメトキシ
ラン、トリメチルモノメトキシシラン、ジフェニルジメ
トキシシラン、ジフェニルジェトキシシラン、モノフェ
ニルトリメトキシシラン等が挙げられる。このようなシ
ランカップリング剤を混合して用いる場合には、該シラ
ンカップリング剤が全固形物重量に対して5〜50%と
なるようにするのがよい。
In order to obtain the electrophotographic photoreceptor of the present invention, a solution of one or more of the above organic zirconium compounds dissolved in a suitable solvent is coated. Further, at this time, a solution obtained by mixing these organic zirconium compounds with an organic silicon compound may be used. As this organosilicon compound, a compound generally called a silane coupling agent is suitable, such as vinyl) IJ chlorane,
Vinyltriethoxysilane, vinyltris(β-methyneethoxy)silane, r-glycidoxypropyltrimethoxysilane, r-methacryloxypropyltrimethoxysilane, N-β(aminoethyl)γ-aminopropyltrimethoxysilane, N-βaminoethyl)T-
Aminopropylmethyldimethoxysilane, T-chloropropyltrimethoxysilane, T-mercaptopropyltrimethoxysilane, T-aminopropyltriethoxysilane, methyltrimethoxysilane, dimethyldimethoxylane, trimethylmonomethoxysilane, diphenyldimethoxysilane, diphenyljetoxysilane Examples include toxysilane, monophenyltrimethoxysilane, and the like. When such silane coupling agents are mixed and used, it is preferable that the silane coupling agents account for 5 to 50% of the total solid weight.

かくして、有機ジルコニウム化合物、場合によっては更
に有機ケイ素化合物を含有する溶液を、光導電層上に、
スプレー塗布、浸漬塗布、ナイフ塗布またはロール塗布
などの方法で塗布した後、乾燥硬化させることによって
本発明の電子写真用、感光体が得られる。乾燥硬化温度
は100〜400℃の間の任意の温度に設定することが
できる。最終的に得られる表面層の膜厚も任意に設定さ
れ得るが、0.1〜10μm1特に1μm以下が好適で
ある。
Thus, a solution containing an organozirconium compound and optionally an organosilicon compound is applied onto the photoconductive layer.
The electrophotographic photoreceptor of the present invention can be obtained by coating by spray coating, dip coating, knife coating, roll coating, or the like, followed by drying and curing. The drying and curing temperature can be set at any temperature between 100 and 400°C. The thickness of the surface layer finally obtained can also be set arbitrarily, but a thickness of 0.1 to 10 .mu.m, particularly 1 .mu.m or less, is suitable.

非晶質ケイ素を主体とする光導電層は、SiHいS1□
H6、Si*Ha、5i4H1゜、等の水素ケイ素ガス
の1種またはそれらの混合物を原料として、グロー放電
法、スパッタリング法、イオンブレーティング法、真空
蒸着法などの方法によって基板上に形成する。中でも、
プラズマCV D (ChemicalVapor D
eposition )法によってシラ(SI84 )
ガス等をグロー放電分解する方法(グロー放電法)が、
膜中への水素の含有量の制御の点から好ましい。
The photoconductive layer mainly composed of amorphous silicon is SiH S1□
It is formed on a substrate by a method such as a glow discharge method, a sputtering method, an ion blasting method, or a vacuum evaporation method using one type of hydrogen silicon gas such as H6, Si*Ha, 5i4H1°, or a mixture thereof as a raw material. Among them,
Plasma CV D (Chemical Vapor D
Shira (SI84) by eposition method
The method of decomposing gas etc. by glow discharge (glow discharge method) is
This is preferable from the viewpoint of controlling the hydrogen content in the film.

また、この場合水素の含有を一層効率良く行なうために
、プラズマCVD装置内にシランガス等と同時に、別途
に水素(H2)ガスを導入してもよい。
Further, in this case, in order to more efficiently contain hydrogen, hydrogen (H2) gas may be separately introduced into the plasma CVD apparatus at the same time as silane gas or the like.

本発明の電子写真用感光体の光導電層として用いるのは
、水素原子を含有する非晶ケイ素を主体として不純物と
して炭素原子、窒素原子および酸素原子のうちの少なく
とも11類を含有するl型半導体であり、導電型制御用
不純物を含有しないわずかにn型傾向を示すl型のもの
も本発明の光導電層であるが、微量のホウ素原子を添加
することにより完全なl型半導体とすることができる。
The photoconductive layer of the electrophotographic photoreceptor of the present invention is an l-type semiconductor mainly composed of amorphous silicon containing hydrogen atoms and containing at least 11 types of impurities among carbon atoms, nitrogen atoms, and oxygen atoms. A photoconductive layer of the present invention that does not contain impurities for controlling the conductivity type and has a slight n-type tendency is also a photoconductive layer of the present invention, but it can be made into a complete l-type semiconductor by adding a small amount of boron atoms. Can be done.

このホウ素原子の添加には、通常、ジボラン(B2H6
)ガスが原料として用いられ、10〜1100ppの程
度添加することによって完全な1型半導体の非晶質ケイ
素が得られる。
This boron atom addition is usually performed using diborane (B2H6
) gas is used as a raw material, and by adding about 10 to 1100 pp, a perfect type 1 semiconductor amorphous silicon can be obtained.

また、感光体の長波長域の感度を増加させることを目的
として、光導電層にゲルマニウム(C,e)などの元素
を添加することも可能である。またハロゲン原子を添加
することによって、暗抵抗の増加等を図ることもできる
It is also possible to add elements such as germanium (C, e) to the photoconductive layer for the purpose of increasing the sensitivity of the photoreceptor in the long wavelength range. Further, by adding halogen atoms, it is also possible to increase the dark resistance.

かくして、本発明の電子写真用感光体の光導電層を調製
するには、プラズマCVD装置内に、主原料である水素
化ケイ素ガス、更に所望に応じて水素ガスを用い、それ
らのガスと共に、必要な元素を含むガス状化合物を導入
してグロー放電分解を行なえばよい。以上のようにプラ
ズマCVD法による非晶質ケイ素から成る光導電層を形
成するのに有効な放電条件は、例えば、交流放電の場合
、周波数は通常0.1〜30 M Hz 、放電時の真
空度は0.1〜5 Torr、基板加熱温度は100〜
400℃である。しかして、非晶質ケイ素を主体とする
光導電層の膜厚は、1〜100μm、特に10〜50μ
mとするのが好適である。
Thus, in order to prepare the photoconductive layer of the electrophotographic photoreceptor of the present invention, silicon hydride gas, which is the main raw material, and hydrogen gas, if desired, are used in a plasma CVD apparatus, and together with these gases, Glow discharge decomposition may be performed by introducing a gaseous compound containing the necessary elements. As mentioned above, effective discharge conditions for forming a photoconductive layer made of amorphous silicon by the plasma CVD method include, for example, in the case of AC discharge, the frequency is usually 0.1 to 30 MHz, and the vacuum during discharge. The degree is 0.1 to 5 Torr, the substrate heating temperature is 100 to
The temperature is 400°C. Therefore, the film thickness of the photoconductive layer mainly composed of amorphous silicon is 1 to 100 μm, particularly 10 to 50 μm.
It is preferable to set it to m.

導電性基板としては、アルミニウム、ニッケル、クロム
、ステンレス鋼、もしくは黄銅などの金属、導電膜を有
するプラスチックシートもしくはガラス、または、導電
化処理をした紙などを用いることができる。また、導電
性基板の形状は、円筒状、平板状、エンドレスベルト状
等の任意の形状を採ることができる。
As the conductive substrate, a metal such as aluminum, nickel, chromium, stainless steel, or brass, a plastic sheet or glass having a conductive film, or paper treated to be conductive can be used. Moreover, the shape of the conductive substrate can be any shape such as a cylindrical shape, a flat plate shape, an endless belt shape, or the like.

(実施例) 次に、比較例と本発明の実施例とを挙げて、本発明の電
子写真用感光体を更に説明する。
(Example) Next, the electrophotographic photoreceptor of the present invention will be further described with reference to comparative examples and examples of the present invention.

比較例1: 容量結合型プラズマCVD装置の反応室内の所定の位置
に円筒状Af基板を設置し、基板温度を所定の温度であ
る250℃に維持し、反応室内に100%シラン(Si
H4)ガスを毎分120CC1水素希釈のl OOpp
m ジボラン(B2H6)ガスを毎分20cc、および
100%エチレン(C2H,)ガスを毎分12CC,さ
らに100%水素(N2)ガスを毎分33ccの範囲で
流入させ、反応槽内を0.5Torrの内圧に維持した
後、13.57MHzの交周波電力を投入して、グロー
放電を生じせしめ、高周波電源の出力を85Wに維持し
た。このようにして、円筒状のAβ基板上に厚さ25μ
mで非晶質ケイ素を主体とし不純物としてホウ素および
炭素原子を含有するl型半導体から成る光導電層を有す
る感光体を得た。このようにして得られた感光体を複写
機に入れ、正のコロナ放電方式で画質を評価したところ
、初期時では実用上問題のない画像濃度が得られたが、
複写操作を繰り返すうちに徐々に画像濃度は低下した。
Comparative Example 1: A cylindrical Af substrate was installed at a predetermined position in the reaction chamber of a capacitively coupled plasma CVD apparatus, the substrate temperature was maintained at a predetermined temperature of 250°C, and 100% silane (Si) was placed in the reaction chamber.
H4) gas per minute 120CC1 hydrogen dilution lOOpp
m diborane (B2H6) gas at 20 cc/min, 100% ethylene (C2H,) gas at 12 cc/min, and 100% hydrogen (N2) gas at 33 cc/min, and the inside of the reaction tank was maintained at 0.5 Torr. After maintaining the internal pressure at , 13.57 MHz alternating frequency power was applied to generate glow discharge, and the output of the high frequency power source was maintained at 85 W. In this way, a film with a thickness of 25 μm was placed on a cylindrical Aβ substrate.
A photoreceptor having a photoconductive layer made of an l-type semiconductor mainly composed of amorphous silicon and containing boron and carbon atoms as impurities was obtained. When the photoreceptor thus obtained was placed in a copying machine and the image quality was evaluated using a positive corona discharge method, an image density that was acceptable for practical use was initially obtained; however,
As the copying operation was repeated, the image density gradually decreased.

また、この感光体を30℃、85%RHの環境下で画質
評価したところ、初期時より画像の流れが観察された。
Further, when the image quality of this photoreceptor was evaluated in an environment of 30° C. and 85% RH, image flow was observed from the initial stage.

実施例1; 比較例1と同一方法、同一条件にて作成した非晶質ケイ
素を主体とし不純物としてホウ素および炭素を含有する
l型半導体から成る光導電層を有する感光体の上に、ジ
ルコニウムアセチルアセトン1重量部、メチルアルコー
ル50重量部、およびn−ブチルアルコール20重量部
からなる溶液を浸漬塗布し、200℃の炉中で1時間乾
燥硬化し、0.2μ厚の表面層を有する感光体を得た。
Example 1; Zirconium acetylacetone was deposited on a photoreceptor having a photoconductive layer made of an l-type semiconductor mainly composed of amorphous silicon and containing boron and carbon as impurities, which was prepared by the same method and under the same conditions as Comparative Example 1. A solution consisting of 1 part by weight, 50 parts by weight of methyl alcohol, and 20 parts by weight of n-butyl alcohol was applied by dip coating, and dried and cured in an oven at 200°C for 1 hour to obtain a photoreceptor having a surface layer of 0.2 μm thickness. Obtained.

このようにして得られた表面層はセラミックスに似た性
質を持ち、非晶質珪素の1優れた特性である、表面硬度
、耐摩耗性、耐熱性をほとんど損うことがなかった。
The surface layer thus obtained had properties similar to ceramics, with almost no loss in surface hardness, wear resistance, and heat resistance, which are excellent properties of amorphous silicon.

この感光体を複写機に入れ、正のコロナ帯電方式により
画質評価したところ、初期時では実用上問題のない画像
濃度が1昇られた。また、複写操作を5万回繰り返した
が画像濃度の低下はみられなかった。この感光体を30
℃、85%RHの環境下で画質評価を行なったが画像の
流れはみられず高解像度を示した。同時に、負のコロナ
帯電方式で実施した複写試験も、正帯電方式の場合と同
様、良好な結果を与えた。
When this photoreceptor was placed in a copying machine and the image quality was evaluated using a positive corona charging method, the image density was increased by 1 at the initial stage, which was not a problem for practical use. Further, although the copying operation was repeated 50,000 times, no decrease in image density was observed. This photoreceptor is 30
Image quality was evaluated under an environment of 85% RH and 85% RH, but no image flow was observed, indicating high resolution. At the same time, copying tests conducted using the negative corona charging method also gave good results, similar to those using the positive charging method.

比較例2.: 容量結合型プラズマCVD装置の反応室内の所定の位置
に円筒状AA基板を設置し、基板温度を所定の温度であ
る250℃に維持し、反応室内に100%シラン(Si
H4)ガスを毎分12 Qcc。
Comparative example 2. : A cylindrical AA substrate was installed at a predetermined position in the reaction chamber of a capacitively coupled plasma CVD apparatus, the substrate temperature was maintained at a predetermined temperature of 250°C, and 100% silane (Si) was placed in the reaction chamber.
H4) gas at 12 Qcc per minute.

水素希釈の10 Qppm ジボラン(B2H6)ガス
を毎分20CC1および100%の窒素(N2)ガスを
毎分35cc、さらに100%水素(N2)ガスを毎分
15ccの範囲で流入させ、反応槽内を0.5Torr
の内圧を維持した後、13.06 M )(zの高周波
電力を投入して、グロー放電を生じせしめ、高周波電源
の出力を85Wに維持した。このようにして円筒状のA
42基板上に、厚さ25μmで非晶質ケイ素を主体とし
て不純物としてホウ素原子および窒素原子を含有するl
型半導体から成る光導電層を有する感光体を(尋た。こ
のようにして(尋られた感光体を複写機に入れ、正のコ
ロナ帯電方式により画質を評価したところ、初期時では
実用上問題のない画像濃度が得られたが、複写操作を繰
り返すうちに、徐々に画像濃度は低下した。また、この
感光体を30℃、85%RHの環境下で画質評価したと
ころ、初期時より画像の流れが観察された。
Hydrogen dilution: 10 Qppm diborane (B2H6) gas was introduced at a rate of 20 CC1 per minute, 100% nitrogen (N2) gas was introduced at a rate of 35 cc/min, and 100% hydrogen (N2) gas was introduced at a rate of 15 cc/min. 0.5 Torr
After maintaining the internal pressure of 13.06 M) (z), a glow discharge was generated by applying high frequency power, and the output of the high frequency power source was maintained at 85 W. In this way, the cylindrical A
42 substrate with a thickness of 25 μm, consisting mainly of amorphous silicon and containing boron atoms and nitrogen atoms as impurities.
A photoreceptor with a photoconductive layer made of a type semiconductor was put into a copying machine and the image quality was evaluated using a positive corona charging method. Although an image density with no blemish was obtained, as copying operations were repeated, the image density gradually decreased.Furthermore, when this photoreceptor was evaluated for image quality in an environment of 30°C and 85% RH, it was found that the image density was lower than that at the initial stage. flow was observed.

実施例2: 比較例2と同一方法、同一条件にて作成した非晶質ケイ
素を主体としホウ素および窒素を含有するl型半導体か
ら成る光導電層を有する感光体の上に、ジルコニウムテ
トラブトキシド1重量部、エチルアルコール100重量
部からなる溶液を浸漬塗布し、200℃の炉中で1時間
乾燥硬化し、0.2μ厚の表面層を有する感光体を得た
。このようにして得られた表面層はセラミックスに似た
性質を持ち、非晶質珪素の優れた特性である、表面硬度
、耐摩耗性、耐熱性をほとんど損うことがなかった。
Example 2: On a photoreceptor having a photoconductive layer made of an l-type semiconductor mainly composed of amorphous silicon and containing boron and nitrogen, which was prepared by the same method and under the same conditions as Comparative Example 2, zirconium tetrabutoxide 1 A solution consisting of 100 parts by weight of ethyl alcohol was applied by dip coating, and dried and cured in an oven at 200° C. for 1 hour to obtain a photoreceptor having a surface layer with a thickness of 0.2 μm. The surface layer thus obtained had properties similar to ceramics, with almost no loss in surface hardness, wear resistance, and heat resistance, which are the excellent properties of amorphous silicon.

この感光体を複写機に入れ、正のコロナ帯電方式により
画質評価したところ、初期時では実用上問題のない画像
濃度が得られた。また、複写操作を5万回繰り返したが
画像濃度の低下はみられなかった。この感光体を30℃
、85%RHの環境下で画質評価を行なったが画像の流
れはみられず高解像度を示した。同時に、負のコロナ帯
電方式で実施した複写試験も、正帯電方式の場合と同様
、良好な結果を与えた。
When this photoreceptor was placed in a copying machine and the image quality was evaluated using a positive corona charging method, an image density that was acceptable for practical use was obtained at the initial stage. Further, although the copying operation was repeated 50,000 times, no decrease in image density was observed. This photoreceptor was heated at 30°C.
Image quality was evaluated under an environment of 85% RH, but no image flow was observed, indicating high resolution. At the same time, copying tests conducted using the negative corona charging method also gave good results, similar to those using the positive charging method.

比較例3; 容蚤結合型プラズマCVD装置の反応室内の所定の位置
に円筒状へβ基板を設置し、基板温度を所定の温度であ
る250℃に維持し、反応室内に100%シラン(S 
IH4)ガスを毎分120cc、水素希釈のICLOp
pm ジボラン(B2H6)ガスを毎分20cc、およ
び100%酸素(02)ガスを毎分10cc、さらに1
00%水素(H2)ガスを毎分99ccで流入させ、反
応槽内を0.5Torrの内圧に維持した後、13.5
6 MHzの交周波電力を投入して、グロー放電を生じ
せしめ、高周波電源の出力を85Wに維持した。このよ
うにして円筒状のAI基板上に厚さ25μmで非晶質ケ
イ素を主体とし不純物としてホウ素および酸素原子を含
有するl型半導体から成る光導電層を有する感光体を得
た。このようにして1尋られた感光体を複写機に入れ、
正のコロナ帯電方式により画質を評価したところ、初期
時では実用上問題のない画像濃度が得られたが、複写操
作を繰り返すうちに除々に画像濃度は低下した。また、
この感光体を30℃、85%R)lの環境下で画質評価
したところ、初期時より画像の流れが観察された。
Comparative Example 3: A β substrate was installed in a cylindrical shape at a predetermined position in a reaction chamber of a coupled plasma CVD apparatus, the substrate temperature was maintained at a predetermined temperature of 250°C, and 100% silane (S) was placed in the reaction chamber.
IH4) 120cc of gas per minute, ICLOp with hydrogen dilution
pm Diborane (B2H6) gas at 20 cc/min and 100% oxygen (02) gas at 10 cc/min, and 1
After introducing 00% hydrogen (H2) gas at a rate of 99 cc per minute and maintaining the internal pressure in the reaction tank at 0.5 Torr, 13.5
Alternating frequency power of 6 MHz was applied to generate glow discharge, and the output of the high frequency power source was maintained at 85 W. In this way, a photoreceptor was obtained having a photoconductive layer having a thickness of 25 μm and consisting of an l-type semiconductor mainly composed of amorphous silicon and containing boron and oxygen atoms as impurities on a cylindrical AI substrate. Insert the photoreceptor that has been processed in this way into the copying machine,
When the image quality was evaluated using a positive corona charging method, an image density with no practical problems was obtained at the initial stage, but as copying operations were repeated, the image density gradually decreased. Also,
When this photoreceptor was evaluated for image quality under an environment of 30° C. and 85% R), image flow was observed from the initial stage.

実施例3: 比較例3と同一方法、同一条件で作成した非晶質ケイ素
を主体とし不純物としてホウ素および酸素を含有するl
型半導体から成る光導電層を有する感光体の上に、ジル
コニウムテトラブトキシド1重量部、メチルトリメトキ
シシラン1重量部、エチルアルコール100重Ill、
インプロピルアルコール100重量部からなる溶液を浸
漬塗布し、200℃の炉中で1時間乾燥硬化し、0.1
μ厚の表面層を有する感光体をf4だ。このようにして
得られた表面層はセラミックスに似た性質を持ち、非晶
質珪素の優れた特性である、表面硬度、耐摩耗性、耐熱
性をほとんど損うことがなかった。
Example 3: A material mainly composed of amorphous silicon and containing boron and oxygen as impurities was prepared by the same method and under the same conditions as Comparative Example 3.
1 part by weight of zirconium tetrabutoxide, 1 part by weight of methyltrimethoxysilane, 100 parts by weight of ethyl alcohol,
A solution consisting of 100 parts by weight of inpropyl alcohol was applied by dip coating, dried and cured in an oven at 200°C for 1 hour, and 0.1
A photoreceptor having a surface layer of μ thickness is called f4. The surface layer thus obtained had properties similar to ceramics, with almost no loss in surface hardness, wear resistance, and heat resistance, which are the excellent properties of amorphous silicon.

この感光体を複写機に入れ、正のコロナ帯電方式により
画質評価したところ、初期時では実用上問題のない画像
濃度が得られた。また、複写操作を5万回繰り返したが
画像濃度の低下はみられなかった。この感光体を30℃
、85%R1(の環境下で画質評価を行なったが画像の
流れはみちれず高解像度を示した。同時に、負のコロナ
帯電方式で実施した複写試験も、正帯電方式の場合と同
様、良好な結果を与えた。
When this photoreceptor was placed in a copying machine and the image quality was evaluated using a positive corona charging method, an image density that was acceptable for practical use was obtained at the initial stage. Further, although the copying operation was repeated 50,000 times, no decrease in image density was observed. This photoreceptor was heated at 30°C.
The image quality was evaluated in an environment of , 85% R1, and the image showed high resolution with no noticeable flow. At the same time, the copying test conducted with the negative corona charging method was as good as with the positive charging method. gave good results.

(発明の効果) 本発明の電子写真用感光体は、非晶質ケイ素からの成る
感光体の優れた特性である高機械的強度、高耐久性、高
耐熱、高光感度を保持し、しかも、外部環境や使用回数
の影冒を受けずに高い電荷保持力を有して、優れた品質
の画像を供する二とができる。
(Effects of the Invention) The electrophotographic photoreceptor of the present invention maintains the excellent properties of a photoreceptor made of amorphous silicon, such as high mechanical strength, high durability, high heat resistance, and high photosensitivity, and furthermore, It has a high charge retention ability that is not affected by the external environment or the number of times of use, and can provide images of excellent quality.

Claims (2)

【特許請求の範囲】[Claims] (1)導電性基板上に光導電層および表面層を順次積層
して成る電子写真用感光体において、 前記光導電層が、水素原子を含有する非晶質ケイ素を主
体とし、不純物として炭素原子、窒素原子および酸素原
子のうちの少なくとも1種類を含有するi型半導体から
成り、 前記表面層が、有機ジルコニウム化合物を少なくとも1
種類含む溶液の乾燥硬化物から成ることを特徴とする電
子写真用感光体。
(1) In an electrophotographic photoreceptor comprising a photoconductive layer and a surface layer sequentially laminated on a conductive substrate, the photoconductive layer is mainly composed of amorphous silicon containing hydrogen atoms, and contains carbon atoms as impurities. , an i-type semiconductor containing at least one of nitrogen atoms and oxygen atoms, and the surface layer contains at least one organic zirconium compound.
1. A photoreceptor for electrophotography, characterized in that it is made of a dried and cured product of a solution containing various types of photoreceptors.
(2)前記有機ジルコニウム化合物が、ジルコニウム錯
体またはジルコニウムアルコキシドである特許請求の範
囲第(1)項記載の電子写真用感光体。
(2) The electrophotographic photoreceptor according to claim (1), wherein the organic zirconium compound is a zirconium complex or a zirconium alkoxide.
JP11780186A 1986-05-22 1986-05-22 Electrophotographic sensitive body Pending JPS62273546A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11780186A JPS62273546A (en) 1986-05-22 1986-05-22 Electrophotographic sensitive body

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11780186A JPS62273546A (en) 1986-05-22 1986-05-22 Electrophotographic sensitive body

Publications (1)

Publication Number Publication Date
JPS62273546A true JPS62273546A (en) 1987-11-27

Family

ID=14720615

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11780186A Pending JPS62273546A (en) 1986-05-22 1986-05-22 Electrophotographic sensitive body

Country Status (1)

Country Link
JP (1) JPS62273546A (en)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58111951A (en) * 1982-09-18 1983-07-04 Canon Inc Image forming member for electrophotography
JPS58111950A (en) * 1982-09-18 1983-07-04 Canon Inc Image forming member for electrophotography
JPS59223444A (en) * 1983-06-03 1984-12-15 Fuji Xerox Co Ltd Electrophotographic sensitive body
JPS59223446A (en) * 1983-06-03 1984-12-15 Fuji Xerox Co Ltd Electrophotographic sensitive body

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58111951A (en) * 1982-09-18 1983-07-04 Canon Inc Image forming member for electrophotography
JPS58111950A (en) * 1982-09-18 1983-07-04 Canon Inc Image forming member for electrophotography
JPS59223444A (en) * 1983-06-03 1984-12-15 Fuji Xerox Co Ltd Electrophotographic sensitive body
JPS59223446A (en) * 1983-06-03 1984-12-15 Fuji Xerox Co Ltd Electrophotographic sensitive body

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