JPS62273549A - Electrophotographic sensitive body - Google Patents
Electrophotographic sensitive bodyInfo
- Publication number
- JPS62273549A JPS62273549A JP11780486A JP11780486A JPS62273549A JP S62273549 A JPS62273549 A JP S62273549A JP 11780486 A JP11780486 A JP 11780486A JP 11780486 A JP11780486 A JP 11780486A JP S62273549 A JPS62273549 A JP S62273549A
- Authority
- JP
- Japan
- Prior art keywords
- amorphous silicon
- intermediate layer
- zirconium
- atom
- photoreceptor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229910021417 amorphous silicon Inorganic materials 0.000 claims abstract description 30
- 239000000758 substrate Substances 0.000 claims abstract description 20
- 239000004065 semiconductor Substances 0.000 claims abstract description 10
- 239000012535 impurity Substances 0.000 claims abstract description 9
- 125000004437 phosphorous atom Chemical group 0.000 claims abstract description 8
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 6
- 125000004432 carbon atom Chemical group C* 0.000 claims abstract description 5
- 125000004433 nitrogen atom Chemical group N* 0.000 claims abstract description 5
- 125000004430 oxygen atom Chemical group O* 0.000 claims abstract description 5
- 108091008695 photoreceptors Proteins 0.000 claims description 39
- 150000003755 zirconium compounds Chemical class 0.000 claims description 6
- 229910052726 zirconium Inorganic materials 0.000 abstract description 10
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 abstract description 8
- 206010034972 Photosensitivity reaction Diseases 0.000 abstract description 7
- 230000036211 photosensitivity Effects 0.000 abstract description 7
- 239000000463 material Substances 0.000 abstract description 6
- 229910052799 carbon Inorganic materials 0.000 abstract description 3
- 229910052757 nitrogen Inorganic materials 0.000 abstract description 3
- -1 zirconium alkoxide Chemical class 0.000 abstract description 2
- 238000000034 method Methods 0.000 description 22
- 239000007789 gas Substances 0.000 description 20
- 230000000052 comparative effect Effects 0.000 description 17
- 229910052739 hydrogen Inorganic materials 0.000 description 14
- 239000001257 hydrogen Substances 0.000 description 14
- 150000002431 hydrogen Chemical class 0.000 description 13
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 10
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 8
- 239000000243 solution Substances 0.000 description 8
- 238000006243 chemical reaction Methods 0.000 description 7
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 6
- 229910000077 silane Inorganic materials 0.000 description 6
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 5
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- 230000007423 decrease Effects 0.000 description 4
- 229910052698 phosphorus Inorganic materials 0.000 description 4
- 229910000073 phosphorus hydride Inorganic materials 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 3
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 3
- BSDOQSMQCZQLDV-UHFFFAOYSA-N butan-1-olate;zirconium(4+) Chemical compound [Zr+4].CCCC[O-].CCCC[O-].CCCC[O-].CCCC[O-] BSDOQSMQCZQLDV-UHFFFAOYSA-N 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 238000010790 dilution Methods 0.000 description 3
- 239000012895 dilution Substances 0.000 description 3
- 238000003618 dip coating Methods 0.000 description 3
- 239000011574 phosphorus Substances 0.000 description 3
- 239000002994 raw material Substances 0.000 description 3
- 125000000022 2-aminoethyl group Chemical group [H]C([*])([H])C([H])([H])N([H])[H] 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 238000005299 abrasion Methods 0.000 description 2
- 125000004429 atom Chemical group 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 239000007822 coupling agent Substances 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 235000019441 ethanol Nutrition 0.000 description 2
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 2
- 150000003961 organosilicon compounds Chemical class 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 1
- POILWHVDKZOXJZ-ARJAWSKDSA-M (z)-4-oxopent-2-en-2-olate Chemical compound C\C([O-])=C\C(C)=O POILWHVDKZOXJZ-ARJAWSKDSA-M 0.000 description 1
- FKNIDKXOANSRCS-UHFFFAOYSA-N 2,3,4-trinitrofluoren-1-one Chemical compound C1=CC=C2C3=C([N+](=O)[O-])C([N+]([O-])=O)=C([N+]([O-])=O)C(=O)C3=CC2=C1 FKNIDKXOANSRCS-UHFFFAOYSA-N 0.000 description 1
- VIHLAKDKGTYILV-UHFFFAOYSA-N 2-methylpropan-1-ol zirconium Chemical compound [Zr].CC(C)CO.CC(C)CO.CC(C)CO.CC(C)CO VIHLAKDKGTYILV-UHFFFAOYSA-N 0.000 description 1
- WUPHOULIZUERAE-UHFFFAOYSA-N 3-(oxolan-2-yl)propanoic acid Chemical compound OC(=O)CCC1CCCO1 WUPHOULIZUERAE-UHFFFAOYSA-N 0.000 description 1
- OXYZDRAJMHGSMW-UHFFFAOYSA-N 3-chloropropyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)CCCCl OXYZDRAJMHGSMW-UHFFFAOYSA-N 0.000 description 1
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 description 1
- 229910001369 Brass Inorganic materials 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- 229910001370 Se alloy Inorganic materials 0.000 description 1
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 230000002238 attenuated effect Effects 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- 239000010951 brass Substances 0.000 description 1
- 229910052980 cadmium sulfide Inorganic materials 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 1
- JJQZDUKDJDQPMQ-UHFFFAOYSA-N dimethoxy(dimethyl)silane Chemical compound CO[Si](C)(C)OC JJQZDUKDJDQPMQ-UHFFFAOYSA-N 0.000 description 1
- AHUXYBVKTIBBJW-UHFFFAOYSA-N dimethoxy(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](OC)(OC)C1=CC=CC=C1 AHUXYBVKTIBBJW-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 description 1
- WOXXJEVNDJOOLV-UHFFFAOYSA-N ethenyl-tris(2-methoxyethoxy)silane Chemical compound COCCO[Si](OCCOC)(OCCOC)C=C WOXXJEVNDJOOLV-UHFFFAOYSA-N 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 150000007857 hydrazones Chemical class 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- POPACFLNWGUDSR-UHFFFAOYSA-N methoxy(trimethyl)silane Chemical compound CO[Si](C)(C)C POPACFLNWGUDSR-UHFFFAOYSA-N 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- SGNLDVYVSFANHW-UHFFFAOYSA-N pentane-2,4-dione;zirconium Chemical compound [Zr].CC(=O)CC(C)=O SGNLDVYVSFANHW-UHFFFAOYSA-N 0.000 description 1
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920003227 poly(N-vinyl carbazole) Polymers 0.000 description 1
- XPGAWFIWCWKDDL-UHFFFAOYSA-N propan-1-olate;zirconium(4+) Chemical compound [Zr+4].CCC[O-].CCC[O-].CCC[O-].CCC[O-] XPGAWFIWCWKDDL-UHFFFAOYSA-N 0.000 description 1
- ZGSOBQAJAUGRBK-UHFFFAOYSA-N propan-2-olate;zirconium(4+) Chemical compound [Zr+4].CC(C)[O-].CC(C)[O-].CC(C)[O-].CC(C)[O-] ZGSOBQAJAUGRBK-UHFFFAOYSA-N 0.000 description 1
- DNXIASIHZYFFRO-UHFFFAOYSA-N pyrazoline Chemical compound C1CN=NC1 DNXIASIHZYFFRO-UHFFFAOYSA-N 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- 239000011669 selenium Substances 0.000 description 1
- 150000003377 silicon compounds Chemical class 0.000 description 1
- 229910052990 silicon hydride Inorganic materials 0.000 description 1
- SCABQASLNUQUKD-UHFFFAOYSA-N silylium Chemical compound [SiH3+] SCABQASLNUQUKD-UHFFFAOYSA-N 0.000 description 1
- 239000002689 soil Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000010345 tape casting Methods 0.000 description 1
- GQIUQDDJKHLHTB-UHFFFAOYSA-N trichloro(ethenyl)silane Chemical compound Cl[Si](Cl)(Cl)C=C GQIUQDDJKHLHTB-UHFFFAOYSA-N 0.000 description 1
- ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 239000005050 vinyl trichlorosilane Substances 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
- 150000003754 zirconium Chemical class 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/14—Inert intermediate or cover layers for charge-receiving layers
- G03G5/142—Inert intermediate layers
- G03G5/144—Inert intermediate layers comprising inorganic material
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/02—Charge-receiving layers
- G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
- G03G5/043—Photoconductive layers characterised by having two or more layers or characterised by their composite structure
- G03G5/0433—Photoconductive layers characterised by having two or more layers or characterised by their composite structure all layers being inorganic
Abstract
Description
【発明の詳細な説明】
3、発明の詳細な説明
産業上の利用分野
本発明は、電子写真用感光体に関し、枠に、感光層に非
晶質ケイ素を用いた電子写真用感光体に関する。DETAILED DESCRIPTION OF THE INVENTION 3. Detailed Description of the Invention Field of Industrial Application The present invention relates to an electrophotographic photoreceptor, and more particularly to an electrophotographic photoreceptor using amorphous silicon for the frame and photosensitive layer.
従来の技術
電子写真法は、感光体に帯電、像露光により静電層1′
象を形成し、この潜像をトナーと弥される現像剤で現像
後、転写紙にトナー像を転写し定着して複写物を得る方
法である。この電子写真法に用いられる感光1本は、基
本構成として導電性基板上に感光層を積層して成る。し
かして、従来より、感光1を構成する材料としてはセレ
ンあるいはセレン合金、硫化カドミウム、酸化亜鉛等の
無機、感光材料、あるいは、ポリビニルカルバゾール、
トリニトロフルオレノン、ビスアゾ顔料、フタロシアニ
ン、ピラゾリン、ヒドラゾン等のを殿感光材料が知られ
ており、感光層をtlあるい:ま積層にして用いられて
いる。In the conventional electrophotographic method, a photoreceptor is charged and an electrostatic layer 1' is formed by image exposure.
This is a method of forming a latent image, developing this latent image with a developer containing toner, and then transferring and fixing the toner image onto transfer paper to obtain a copy. The basic structure of a photosensitive tube used in this electrophotographic method is that a photosensitive layer is laminated on a conductive substrate. Conventionally, the materials constituting the photosensitive material 1 have been selenium or selenium alloys, inorganic materials such as cadmium sulfide, zinc oxide, photosensitive materials, or polyvinylcarbazole,
Photosensitive materials containing trinitrofluorenone, bisazo pigments, phthalocyanine, pyrazoline, hydrazone and the like are known, and photosensitive layers are used in the form of TL or laminated layers.
発明が解決しようとする問題点
しかしながら、従来より用いられているこれらの感光層
は、耐久性、耐熱性、光感度などにおいて未だ解決すべ
き問題点を有している。Problems to be Solved by the Invention However, these conventionally used photosensitive layers have problems in durability, heat resistance, photosensitivity, etc. that still need to be solved.
近年、この感光層として非晶質ケイ素(アモルファスン
リコン)を用いた感光体が知られ種々その改善が試みら
れている。この非晶質ケイ素を用いた感光体は、シラン
(SiH4)ガスをグロー放電分解法等によりケイ素の
非晶質膜を導電性基板上に形成したものであって、非晶
質ケイ素膜中に水素、皇子が組み込まれて光導電性を呈
するものである。この非晶質ケイ素感光体は、感光層の
表面硬度が高く傷つきにくり、摩耗にも強く、耐熱性も
高く、機械的強度においてもすぐれている。更に、非晶
質ケイ素は、分光感度域が広く、高い光感度を有する如
く感光特性もすぐれている。しかし反面、非晶質ケイ素
を用いた感光体は、暗減衰が大きく、帯電しても十分な
帯電電位が得られないという欠点を有する。即ち、非晶
質ケイ素感光体を帯電し、(像露光して静電潜像を形成
し、次いで現像する際、感光体上の表面電荷が像露光工
程まで、あるいは現像工程までの間に光照射を受けなか
った部分の電荷までも減衰してしまい、現像に必要な帯
電電位が得られない。この帯電電位の減衰は、環境条件
の影響によっても変化しやすく、特に高温高湿環境では
帯電電位が大巾に低下する。更に、非晶質ケイ素の感光
体は、繰返し使用すると徐々に帯電電位が低下してしま
う。この様な帯電電位のIff減衰の大きな感光体を用
いて複写物を作成すると、画!1rAa度が低くまた、
中間調の再現性に乏しい複写物となる。In recent years, photoreceptors using amorphous silicon as the photosensitive layer have been known, and various attempts have been made to improve them. This photoreceptor using amorphous silicon has an amorphous film of silicon formed on a conductive substrate using silane (SiH4) gas using a glow discharge decomposition method. It incorporates hydrogen and Oji and exhibits photoconductivity. This amorphous silicon photoreceptor has a photosensitive layer that has a high surface hardness and is resistant to scratches, is resistant to abrasion, has high heat resistance, and has excellent mechanical strength. Furthermore, amorphous silicon has a wide spectral sensitivity range and has excellent photosensitivity, such as high photosensitivity. However, on the other hand, photoreceptors using amorphous silicon have the disadvantage that dark decay is large and a sufficient charging potential cannot be obtained even when charged. That is, when an amorphous silicon photoreceptor is charged, imagewise exposed to form an electrostatic latent image, and then developed, the surface charge on the photoreceptor is exposed to light during the imagewise exposure process or the development process. Even the charge in the areas that were not exposed to irradiation is attenuated, making it impossible to obtain the charging potential necessary for development.This attenuation of the charging potential easily changes depending on the influence of environmental conditions, especially in high temperature and high humidity environments. The potential decreases significantly.Furthermore, when an amorphous silicon photoconductor is used repeatedly, the charging potential gradually decreases.It is difficult to make copies using a photoconductor with such a large Iff decay in the charging potential. When created, the image!1rAa degree is low, and
This results in a copy with poor reproduction of halftones.
本発明の目的は、非晶質ケイ素を用いる感光体の上述の
欠点を解消した電子写真用感光体を提供することにある
。An object of the present invention is to provide an electrophotographic photoreceptor that eliminates the above-mentioned drawbacks of photoreceptors using amorphous silicon.
更に、本発明の目的は、非晶質ケイ素を用い、しかも、
帯電電位の暗減衰が極めて小さい電子写真用感光体を提
供することにある。Furthermore, the object of the present invention is to use amorphous silicon, and
An object of the present invention is to provide an electrophotographic photoreceptor in which the dark decay of the charged potential is extremely small.
本発明の他の目的は、帯電特性が外部環境の雰囲気の変
化によって影響を受けない電子写真用感光体を提供する
ことにある。Another object of the present invention is to provide an electrophotographic photoreceptor whose charging characteristics are not affected by changes in the external environment.
また、本発明の他の目的は、繰返し使用されても画(象
品質の1量れた電子写真用感光体を提供することにある
。Another object of the present invention is to provide an electrophotographic photoreceptor that maintains excellent image quality even after repeated use.
更に、本発明の池の目的は、機械的強度、耐久性、耐熱
性、光感度などの電子写真特性に優れた電子写真用感光
体を提供することにある。A further object of the present invention is to provide an electrophotographic photoreceptor having excellent electrophotographic properties such as mechanical strength, durability, heat resistance, and photosensitivity.
問題点を解決するための手段
本発明者は、鋭意研究を行なった結果、導電性基板上に
、中間lを積冒し、その上に、非晶質ケイ素から成る光
導電層を被覆し、該中間層として、有機ジルコニウム化
合物を少なくとも1種類含有する溶液の乾燥硬化物を用
いることによって上記目的が達成されることを見出した
。光導電層としては、水素原子を含有する非晶質ケイ素
を主体とし、不純物としてリン原子を含有し、更に、炭
素原子、窒素原子または酸素原子のうちの少なくとも1
種類を含有するするn型半導体を用いる。Means for Solving the Problems As a result of extensive research, the present inventor deposited an intermediate layer on a conductive substrate, coated it with a photoconductive layer made of amorphous silicon, and It has been found that the above object can be achieved by using, as the intermediate layer, a dried and cured product of a solution containing at least one type of organic zirconium compound. The photoconductive layer is mainly made of amorphous silicon containing hydrogen atoms, contains phosphorus atoms as impurities, and further contains at least one of carbon atoms, nitrogen atoms, and oxygen atoms.
An n-type semiconductor containing a type of semiconductor is used.
かくして、本発明に従えば、導電性基板上に中間層およ
び光導電層を順次積層して成る電子写真用感光体におい
て、前記光導電層が、水素原子を含有する非晶質ケイ素
を正体とし不純物としてリン原子を含有し、更に、炭素
原子、窒素原子または酸素原子のうちの少なくとも1種
類を含有するn型半導体から成り、前記中間層が、有機
ジルコニウム化合物を少なくとも1種類含む溶液の乾燥
硬化物から成ることを特徴とする電子写真用感光体が提
供される。Thus, according to the present invention, in an electrophotographic photoreceptor in which an intermediate layer and a photoconductive layer are successively laminated on a conductive substrate, the photoconductive layer is made essentially of amorphous silicon containing hydrogen atoms. Drying and curing of a solution comprising an n-type semiconductor containing a phosphorus atom as an impurity and further containing at least one type of carbon atom, nitrogen atom, or oxygen atom, the intermediate layer containing at least one type of organic zirconium compound. An electrophotographic photoreceptor is provided.
本発明の電子写真用感光体の中間層を形成するのに用い
られる有機ジルコニウム化合物としては、種々のものが
考えられるが、特に好ましいのは、ジルコニウム錯体お
よびジルコニウムアルコキシドである。これらの好まし
い例としては、ジルコニウムテトラキスアセチルアセト
ネート、ジルコニウムジブトキシビスアセチルアセトネ
ート、ジルコニウムトリプトキンアセチルアセトネート
、ジルコニウムトリフロロアセチルアセトネート、ジル
コニウムテトラ−n−プロポキサイド、ジルコニウムテ
トラ−イソ−プロポキサイドジルコニウム−n−ブトキ
サイド、ジルコニウムイソブトキサイド、等が挙げられ
る。Although various organic zirconium compounds can be used to form the intermediate layer of the electrophotographic photoreceptor of the present invention, particularly preferred are zirconium complexes and zirconium alkoxides. Preferred examples of these include zirconium tetrakisacetylacetonate, zirconium dibutoxybisacetylacetonate, zirconium tryptoquine acetylacetonate, zirconium trifluoroacetylacetonate, zirconium tetra-n-propoxide, zirconium tetra-iso-propoxide. Examples include zirconium-n-butoxide, zirconium isobutoxide, and the like.
本発明の電子写真用感光体を得るに当っては、上記のご
とき有機ジルコニウム化合物の1種または2種以上を適
当な溶媒に溶解した溶液を塗布する。また、この際、こ
れらの有機ジルコニウム化合物に有機ケイ素化合物を混
合した溶液を用いてもよい。この有機ケイ素化合物とし
ては一般にシランカップリング剤と呼ばれている化合物
が好適であり、例えば、ビニルトリクロルシラン、ビニ
ルトリエトキシシラン、ビニルトリス(β−メトキシエ
トキシ)シラン、T−グリシドキシプロピルトリメトキ
シンラン、r−メタアクリロキシプロピルトリメトキシ
シラン、N−β(アミノエチル)γ−アミノプロピルト
リメトキシシラン、N−β(アミノエチル)r−アミノ
ブロピルメチルジメトキンシラン、γ−クロロプロピル
トリメトキシシラン、r−メルカプトプロピルトリメト
キシシラン、γ−アミノプロピルトリエトキシシラン、
メチルトリメトキシシラン、ジメチルジメトキシシラン
、トリメチルモノメトキシシラン、ジフェニルジメトキ
シシラン、ジフェニルジエトキ/シラン、モノフェニル
トリメトキンンラン等が挙げられる。このような7ラン
カツプリング剤を混合して用いる場合には、該プランカ
ップリング剤が全固形物重量に対して5〜50%となる
ようにするのがよい。In order to obtain the electrophotographic photoreceptor of the present invention, a solution of one or more of the above organic zirconium compounds dissolved in a suitable solvent is coated. Further, at this time, a solution obtained by mixing these organic zirconium compounds with an organic silicon compound may be used. Compounds generally called silane coupling agents are suitable as the organosilicon compound, such as vinyltrichlorosilane, vinyltriethoxysilane, vinyltris(β-methoxyethoxy)silane, and T-glycidoxypropyltrimethoxine. Ran, r-methacryloxypropyltrimethoxysilane, N-β (aminoethyl) γ-aminopropyltrimethoxysilane, N-β (aminoethyl) r-aminopropylmethyldimethoxysilane, γ-chloropropyltrimethoxy Silane, r-mercaptopropyltrimethoxysilane, γ-aminopropyltriethoxysilane,
Examples include methyltrimethoxysilane, dimethyldimethoxysilane, trimethylmonomethoxysilane, diphenyldimethoxysilane, diphenyldiethoxy/silane, and monophenyltrimethoxysilane. When such a 7-run coupling agent is mixed and used, it is preferable that the amount of the plan coupling agent is 5 to 50% based on the total solid weight.
かくして、有機ジルコニウム化合物、場合によっては更
に有機ケイ素化合物を含有する溶液を、導電性基板上に
、スプレー塗布、浸漬塗布、ナイフ塗布またはロール塗
布などの方法で塗布した後、乾燥硬化させ、その上に光
導電層を積層することによって本発明の電子写真用感光
体が1弄られる。Thus, a solution containing an organozirconium compound and optionally an organosilicon compound is applied onto a conductive substrate by methods such as spray coating, dip coating, knife coating or roll coating, dried and cured, and then applied. The electrophotographic photoreceptor of the present invention can be manufactured by laminating a photoconductive layer on the photoreceptor.
乾燥硬化温度は100〜400℃の間の任意の温度に設
定することができる。最終的に得られる中間層の膜厚も
任意に設定され得るが、0.1〜10μmが好適である
。The drying and curing temperature can be set at any temperature between 100 and 400°C. The thickness of the intermediate layer finally obtained can also be set arbitrarily, but 0.1 to 10 μm is suitable.
非晶質ケイ素を主体とする光導電層は、SiHい3+2
tlI+、513H@ 、514H1゜、等の水素ケイ
素ガスの1種またはそれらの混合物を原料として、グロ
ー放電法、スパッタリング法、イオンブレーティング法
、真空蒸着法などの方法によって中間1上に形成する。The photoconductive layer mainly composed of amorphous silicon is SiH3+2
Using one type of hydrogen silicon gas such as tlI+, 513H@, 514H1°, or a mixture thereof as a raw material, it is formed on the intermediate 1 by a method such as a glow discharge method, a sputtering method, an ion blasting method, or a vacuum evaporation method.
中でも、ブラダ7 CV D (ChemicalVa
por Deposition) 法によりシラン(
Sift、 ) ガス等をグロー放電分解する方法(
グロー放電法)が、膜中への水素の含有量の制御の点か
ら好ましい。Among them, Bladder 7 CV D (Chemical Va
por Deposition) method, silane (
Sift, ) Method of decomposing gas, etc. by glow discharge (
Glow discharge method) is preferred from the viewpoint of controlling the hydrogen content in the film.
また、この場合水素の含有を一層効率良く行なうために
、プラズマCVD装置内にシランガス等と同時に、別途
に水素(H2)ガスを導入してもよい。また、膜成長速
度の点からは、SiH4,5i2Lを用いるのが好まし
い。Further, in this case, in order to more efficiently contain hydrogen, hydrogen (H2) gas may be separately introduced into the plasma CVD apparatus at the same time as silane gas or the like. Furthermore, from the viewpoint of film growth rate, it is preferable to use SiH4,5i2L.
本発明の電子写真用感光体の光導電層として用いるのは
、水素原子を含有する非晶質ケイ素を主体として不純物
としてリン原子を含有するn型半導体からなり、更に、
炭素原子、窒素原子または酸素原子のうちの少なくとも
1種類を含有しているっこのような原子の含有は、特に
感光層膜の暗抵抗の増加、光感度の増加、更には、帯電
能(単位膜厚あたりの帯電電位)の増加の点から好まし
この非晶質ケイ素感光層へのリン(P)原子の添加には
ホスフィン(PH,) ガスが原料として用いられる
。この場合P原子の添加添加量は0.01〜t o o
Oppm の程度である。The photoconductive layer of the electrophotographic photoreceptor of the present invention is made of an n-type semiconductor mainly composed of amorphous silicon containing hydrogen atoms and containing phosphorus atoms as impurities;
The inclusion of atoms containing at least one of carbon atoms, nitrogen atoms, and oxygen atoms increases the dark resistance of the photosensitive layer, increases the photosensitivity, and further increases the chargeability (unit: Phosphine (PH) gas is preferably used as a raw material for adding phosphorus (P) atoms to the amorphous silicon photosensitive layer from the viewpoint of increasing the charge potential per film thickness. In this case, the amount of P atoms added is 0.01~t o
It is on the order of Oppm.
更に、感光体の長波長域の感度を増加させることを目的
として、光導電層膜にゲルマニウム(Ge)などの元素
を添加することも可能である。またハロゲン原子を添加
することによって、暗抵抗の増加等を図ることもできる
。Furthermore, it is also possible to add an element such as germanium (Ge) to the photoconductive layer film for the purpose of increasing the sensitivity of the photoreceptor in the long wavelength region. Further, by adding halogen atoms, it is also possible to increase the dark resistance.
かくして、本発明の電子写真用、感光体の光導電層を調
製するには、プラズマCVD装置内に、土原料である水
素化ケイ素ガス、更に所望に応じて水素ガスを用い、そ
れらのガスと共に、必要な元素を含むガス状化合物を導
入してグロー放電分解を行なえばよい。以上のようにプ
ラズマc V D 71による非晶質ケイ素から成る光
導電層を形成するのに有効な放電条件は、例えば、交流
放電の場合、周波数は通常0.1〜30Mtlz、放電
時の真空度は0、1〜5Torr、基板加熱温度は10
0〜400℃である。しかして、非晶質ケイ素を主体と
する光導電層の膜厚は、1〜100μm、特に10〜5
0μmとするのが好適である。Thus, in order to prepare the photoconductive layer of the photoreceptor for electrophotography of the present invention, silicon hydride gas as a soil raw material, and hydrogen gas as desired, are used in a plasma CVD apparatus together with these gases. , a gaseous compound containing necessary elements may be introduced to perform glow discharge decomposition. As mentioned above, effective discharge conditions for forming a photoconductive layer made of amorphous silicon by plasma c V D 71 include, for example, in the case of AC discharge, the frequency is usually 0.1 to 30 Mtlz, and the vacuum during discharge is degree is 0.1 to 5 Torr, substrate heating temperature is 10
The temperature is 0 to 400°C. Therefore, the film thickness of the photoconductive layer mainly composed of amorphous silicon is 1 to 100 μm, particularly 10 to 5 μm.
It is preferable to set it to 0 μm.
導電性基板としては、アルミニウム、ニッケル、クロム
、ステンレス鋼、もしくは黄銅などの金属、導電膜を有
するプラスチックシートもしくはガラス、または、導電
化処理をした紙などを用いることができる。また、導電
性基板の形状は、円筒状、平板状、エンドレスベルト状
等の任意の形状を採ることができる。As the conductive substrate, a metal such as aluminum, nickel, chromium, stainless steel, or brass, a plastic sheet or glass having a conductive film, or paper treated to be conductive can be used. Moreover, the shape of the conductive substrate can be any shape such as a cylindrical shape, a flat plate shape, an endless belt shape, or the like.
実施例
次に、比較例と本発明の実施例とを挙げて、本発明の電
子写真用感光体を更に説明する。EXAMPLES Next, the electrophotographic photoreceptor of the present invention will be further explained with reference to comparative examples and examples of the present invention.
比較例1;
容量結合型プラズマCVD装置の反応室内の所定の位置
に円筒状Aβ基板を設置し、基板温度を所定の温度であ
る250℃に維持し、反応室内に100%シラン(Si
H,) ガスを毎分120CG、水素希釈の300p
pm ホスフィン(PH3)ガスを毎分3Qcc、およ
びエチレン(C2H,)ガスを毎分15cc。Comparative Example 1: A cylindrical Aβ substrate was installed at a predetermined position in a reaction chamber of a capacitively coupled plasma CVD apparatus, the substrate temperature was maintained at a predetermined temperature of 250°C, and 100% silane (Si) was placed in the reaction chamber.
H,) 120CG/min of gas, 300p of hydrogen dilution
pm Phosphine (PH3) gas at 3Qcc/min and ethylene (C2H,) gas at 15cc/min.
さらに100%水素(N2)ガスを毎分75CCの範囲
で流入させ、反応槽内を0.5Torrの内圧に維持し
た後、13.57 M)Izの高周波電力を投入して、
グロー放電を生じせしめ、高周波電源の出力を85Wに
維持した。このようにして、円筒状のAf基板上に厚さ
25μmの非晶質ケイ素を主体とし不純物としてリン原
子を含有し、更に、水素と炭素を含むn型半導体から成
る光導電層を有する感光体を得た。Furthermore, 100% hydrogen (N2) gas was introduced at a rate of 75 CC per minute to maintain an internal pressure of 0.5 Torr in the reaction tank, and then a high frequency power of 13.57 M) Iz was applied.
A glow discharge was generated and the output of the high frequency power source was maintained at 85W. In this way, a photoreceptor having a 25 μm thick photoconductive layer made of an n-type semiconductor mainly composed of amorphous silicon, containing phosphorus atoms as an impurity, and further containing hydrogen and carbon, on a cylindrical Af substrate. I got it.
このようにして得られた感光体を複写機に入れ、負のコ
ロナ帯電方式で画質評価を行なったところ、実用に耐え
1尋る画像濃度は得られなかった。When the photoreceptor thus obtained was placed in a copying machine and the image quality was evaluated using a negative corona charging method, an image density that was acceptable for practical use was not obtained.
実施例1:
比較例1と同じ形状の円筒状へ1基板上に、ジルコニウ
ムアセチルアセトン1重量部、メチルアルコール50重
ffi部、n−ブチルアルコール20重量部からなる溶
液を浸漬塗布し、250℃の炉中で2時間乾燥して0.
2μm厚の中間層を設けた。Example 1: A solution consisting of 1 part by weight of zirconium acetylacetone, 50 parts by weight of methyl alcohol, and 20 parts by weight of n-butyl alcohol was applied by dip coating onto a cylindrical substrate having the same shape as Comparative Example 1, and heated at 250°C. Dry in the oven for 2 hours and get 0.
A 2 μm thick intermediate layer was provided.
次に、この中間層上に、比較例1と同じ方法により、比
較例1と同じ内容の非晶質ケイ素を主とする光導電層を
、比較例1とほぼ同じ膜厚で設けた。Next, on this intermediate layer, a photoconductive layer mainly made of amorphous silicon having the same content as in Comparative Example 1 was provided by the same method as in Comparative Example 1, and with almost the same thickness as in Comparative Example 1.
このようにして得られた光導電層はセラミックスに似た
性質を持ち、非晶質ケイ素の優れた時性である、表面硬
度、耐摩耗性、耐熱性をそのま5有していた。The photoconductive layer thus obtained had properties similar to ceramics, and had the same surface hardness, abrasion resistance, and heat resistance as amorphous silicon.
このようにして(弄られた感光体を複写機に入れ、負の
コロナ帯電方式で画質評価したところ、初期時では実用
上問題のない画(象濃度がi尋られた。また、複写操作
を5万回操り返したが画像濃度の低下はみられなかった
。In this way, the photoreceptor that had been tampered with was placed in a copying machine and the image quality was evaluated using a negative corona charging method. Although the operation was repeated 50,000 times, no decrease in image density was observed.
比較例2:
容量結合型プラズマCVD装置の反応室内の所定の位置
に円筒状A f基板を設置し、基板温度を所定の温度で
ある250℃に維持し、反応室内に100%7ラン(S
iH,)ガスを毎分12 Qcc、水素希釈の300p
pm ホスフィン(PL) ガスを毎分39cc、お
よび100%の窒素(N2)ガスを毎分9Qcc、さら
に100%水素(N2)ガスを毎分IQccで流入させ
、反応嗜内をQ、5Torrの内圧に維持した後、13
.5614Hz の高周波電力を投入して、グロー放電
を生じせしめ、高周波電源の出力を80 W i:維持
した。このようにして、円筒状のAβ基板上に、厚さ2
5μmで非晶質ケイ素を主体とし不純物としてリン、更
に、水素と窒素を含有するn型半導体から成る光導電層
を有する感光体を得た。Comparative Example 2: A cylindrical A f substrate was installed at a predetermined position in the reaction chamber of a capacitively coupled plasma CVD apparatus, the substrate temperature was maintained at a predetermined temperature of 250°C, and 100% 7 runs (S
iH,) gas at 12 Qcc per minute, 300 p of hydrogen dilution
pm Phosphine (PL) gas was introduced at 39cc/min, 100% nitrogen (N2) gas at 9Qcc/min, and 100% hydrogen (N2) gas at IQcc/min. After maintaining at 13
.. A high frequency power of 5614 Hz was applied to generate a glow discharge, and the output of the high frequency power source was maintained at 80 Wi:. In this way, a thickness of 2
A photoreceptor was obtained having a photoconductive layer having a thickness of 5 .mu.m and consisting of an n-type semiconductor mainly composed of amorphous silicon and containing phosphorus as impurities, as well as hydrogen and nitrogen.
このようにして得られた感光体を複写機に入れ、負のコ
ロナ帯電方式で画質評価を行なったところ、実用に耐え
得る画像濃度は得られなかった。When the photoreceptor thus obtained was placed in a copying machine and the image quality was evaluated using a negative corona charging method, an image density that could withstand practical use was not obtained.
実施例2:
比較例2と同じ形状の円筒状Af基板上に、ジルコニウ
ムテトラブトキサイド1重量部、エチルアルコール10
0重量部からなる溶液を浸漬塗布し、250℃の炉中で
2時間乾燥して0.2μm厚の中間層を設けた。次に、
この中間層上に、比較例2と同じ方法により、比較例2
と同じ内容の非晶質ケイ素を主体とする光導電層を、比
較例2とほぼ同じ膜厚で設けた。Example 2: On a cylindrical Af substrate having the same shape as Comparative Example 2, 1 part by weight of zirconium tetrabutoxide and 10 parts by weight of ethyl alcohol were added.
A solution consisting of 0 parts by weight was applied by dip coating and dried in an oven at 250° C. for 2 hours to provide an intermediate layer with a thickness of 0.2 μm. next,
Comparative Example 2 was applied onto this intermediate layer by the same method as Comparative Example 2.
A photoconductive layer mainly composed of amorphous silicon having the same content as in Comparative Example 2 was provided with approximately the same thickness as Comparative Example 2.
このようにして得られた感光体を複写機に入れ、負のコ
ロナ帯電方式で画質評価したところ、初期時では実用上
問題のない画像濃度が得られた。また、複写操作を5万
回繰り返したが画像濃度の低下はみられなかった。When the photoreceptor thus obtained was placed in a copying machine and the image quality was evaluated using a negative corona charging method, an image density that was acceptable for practical use was obtained at the initial stage. Further, although the copying operation was repeated 50,000 times, no decrease in image density was observed.
比較例3:
容量結合型プラズマCVD装置の反応室内の所定の位置
に円筒状Aβ基彼を設置し、基板温度を所定の温度であ
る250℃に維持し、反応室内に100%シラン(Si
H,)ガスを毎分12 Qcc、水素希釈の300pp
m ホスフィン(Pl’13) ガスを毎分39cc
、および100%の酸素(0□ )ガスを毎分1.9c
c、さらに100%水素(H2)ガスを毎分89ccで
流入させ、反応槽内をQ、5Torrの内圧に維持した
後、13.56MHzの高周波電力を投入して、グロー
放電を生じせしめ、高周波電源の出力を85Wに維持し
た。このようにして、円筒状のAj2基板上に、厚さ2
5μmで非晶質ケイ素を主体とし不純物としてリン、更
に、水素と酸素を含有するn型半導体から成る光導電層
を有する感光体を得た。Comparative Example 3: A cylindrical Aβ group was installed at a predetermined position in the reaction chamber of a capacitively coupled plasma CVD apparatus, the substrate temperature was maintained at a predetermined temperature of 250°C, and 100% silane (Si) was placed in the reaction chamber.
H,) gas per minute at 12 Qcc, 300pp of hydrogen dilution
m phosphine (Pl'13) gas at 39cc per minute
, and 100% oxygen (0□) gas at 1.9 c/min.
c. Furthermore, 100% hydrogen (H2) gas was introduced at a rate of 89 cc per minute to maintain an internal pressure of Q, 5 Torr in the reaction tank, and then 13.56 MHz high frequency power was applied to generate a glow discharge and high frequency The output of the power supply was maintained at 85W. In this way, on the cylindrical Aj2 substrate, a thickness of 2
A photoreceptor having a photoconductive layer having a thickness of 5 μm and consisting of an n-type semiconductor mainly composed of amorphous silicon and containing phosphorus as impurities and hydrogen and oxygen was obtained.
このようにして1尋られた感光体を複写機に入れ、負の
コロナ帯電方式で画質評価を行なったところ、実用に耐
え得る画像1度は得られなかった。When the photoreceptor thus prepared was placed in a copying machine and the image quality was evaluated using a negative corona charging method, no image capable of withstanding practical use was obtained.
実施例3:
比較例3と同じ形状の円筒状Aβ基板上に、ジルコニウ
ムテトラブトキサイド1重量部、メチルトリメトキシシ
ラン1重量部、エチルアルコール100重量部、イソプ
ロピルアルコール100重量部からなる溶液を浸漬塗布
し、250℃の炉中にて2時間乾燥して0.1μm厚の
中間層を設けた。Example 3: A solution consisting of 1 part by weight of zirconium tetrabutoxide, 1 part by weight of methyltrimethoxysilane, 100 parts by weight of ethyl alcohol, and 100 parts by weight of isopropyl alcohol was immersed onto a cylindrical Aβ substrate having the same shape as in Comparative Example 3. It was coated and dried in an oven at 250° C. for 2 hours to form an intermediate layer with a thickness of 0.1 μm.
次に、この中間層上に、比較例3と同じ方法により比較
例3と同じ内容の非晶質ケイ素を主体とする光導電層を
比較例3とほぼ同じ膜厚で設けた。Next, on this intermediate layer, a photoconductive layer mainly composed of amorphous silicon having the same contents as in Comparative Example 3 was provided by the same method as in Comparative Example 3 and having almost the same thickness as in Comparative Example 3.
このようにして1尋られた感光体を複写機に入れ、負の
コロナ帯電方式で画質評価したところ、初期時では実用
上問題のない画像濃度がi与られた。また、複写操作を
5万回繰り返したが画像濃度の(圧下はみられなかった
。When the photoreceptor thus prepared was placed in a copying machine and the image quality was evaluated using a negative corona charging method, an image density of no problem for practical use was given at the initial stage. Further, although the copying operation was repeated 50,000 times, no reduction in image density was observed.
発明の効果
本発明の電子写真用感光体は、非晶質ケイ素からの成る
感光体の優れた特性である高機械的強度、高耐久性、高
耐熱、高光感度を保持し、しかも、外部環境や使用回数
の影響を受けずに高い電荷保持力を有して、優れた品質
の画像を洪することができる。Effects of the Invention The electrophotographic photoreceptor of the present invention retains the excellent properties of a photoreceptor made of amorphous silicon, such as high mechanical strength, high durability, high heat resistance, and high photosensitivity, and is also resistant to the external environment. It has a high charge retention ability regardless of the number of times it is used or the number of times it is used, and can produce images of excellent quality.
Claims (1)
る電子写真用感光体において、 前記光導電層が、水素原子を含有する非晶質ケイ素を主
体とし不純物としてリン原子を含有するn型半導体から
成り、更に、炭素原子、窒素原子または酸素原子のうち
の少なくとも1種類を含有しており、 前記中間層が、有機ジルコニウム化合物を少なくとも1
種類含む溶液の乾燥硬化物から成ることを特徴とする電
子写真用感光体。[Scope of Claims] An electrophotographic photoreceptor comprising an intermediate layer and a photoconductive layer sequentially laminated on a conductive substrate, wherein the photoconductive layer is mainly composed of amorphous silicon containing hydrogen atoms as an impurity. The intermediate layer is made of an n-type semiconductor containing phosphorus atoms, and further contains at least one of carbon atoms, nitrogen atoms, and oxygen atoms, and the intermediate layer contains at least one organic zirconium compound.
1. A photoreceptor for electrophotography, characterized in that it is made of a dried and cured product of a solution containing various types of photoreceptors.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11780486A JPS62273549A (en) | 1986-05-22 | 1986-05-22 | Electrophotographic sensitive body |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11780486A JPS62273549A (en) | 1986-05-22 | 1986-05-22 | Electrophotographic sensitive body |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS62273549A true JPS62273549A (en) | 1987-11-27 |
Family
ID=14720687
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11780486A Pending JPS62273549A (en) | 1986-05-22 | 1986-05-22 | Electrophotographic sensitive body |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS62273549A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5443934A (en) * | 1992-01-31 | 1995-08-22 | Fuji Xerox Co., Ltd. | Electrophotographic photoreceptor |
US5582948A (en) * | 1994-03-22 | 1996-12-10 | Fuji Xerox Co., Ltd. | Process for producing electrophotographic photoreceptor |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57119357A (en) * | 1981-01-16 | 1982-07-24 | Canon Inc | Photoconductive member |
JPS57119359A (en) * | 1981-01-16 | 1982-07-24 | Canon Inc | Photoconductive member |
JPS5833257A (en) * | 1982-05-10 | 1983-02-26 | Canon Inc | Photoconductive member |
JPS59223441A (en) * | 1983-06-03 | 1984-12-15 | Fuji Xerox Co Ltd | Electrophotographic sensitive body |
JPS59223439A (en) * | 1983-06-03 | 1984-12-15 | Fuji Xerox Co Ltd | Electrophotographic sensitive body |
-
1986
- 1986-05-22 JP JP11780486A patent/JPS62273549A/en active Pending
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57119357A (en) * | 1981-01-16 | 1982-07-24 | Canon Inc | Photoconductive member |
JPS57119359A (en) * | 1981-01-16 | 1982-07-24 | Canon Inc | Photoconductive member |
JPS5833257A (en) * | 1982-05-10 | 1983-02-26 | Canon Inc | Photoconductive member |
JPS59223441A (en) * | 1983-06-03 | 1984-12-15 | Fuji Xerox Co Ltd | Electrophotographic sensitive body |
JPS59223439A (en) * | 1983-06-03 | 1984-12-15 | Fuji Xerox Co Ltd | Electrophotographic sensitive body |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5443934A (en) * | 1992-01-31 | 1995-08-22 | Fuji Xerox Co., Ltd. | Electrophotographic photoreceptor |
US5582948A (en) * | 1994-03-22 | 1996-12-10 | Fuji Xerox Co., Ltd. | Process for producing electrophotographic photoreceptor |
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