JPS62257147A - 新規な感光性樹脂組成物 - Google Patents
新規な感光性樹脂組成物Info
- Publication number
- JPS62257147A JPS62257147A JP61100467A JP10046786A JPS62257147A JP S62257147 A JPS62257147 A JP S62257147A JP 61100467 A JP61100467 A JP 61100467A JP 10046786 A JP10046786 A JP 10046786A JP S62257147 A JPS62257147 A JP S62257147A
- Authority
- JP
- Japan
- Prior art keywords
- formula
- tables
- general formula
- resin
- component
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/008—Azides
- G03F7/012—Macromolecular azides; Macromolecular additives, e.g. binders
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T403/00—Joints and connections
- Y10T403/33—Transverse rod to spaced plate surfaces
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T403/00—Joints and connections
- Y10T403/59—Manually releaseable latch type
- Y10T403/599—Spring biased manipulator
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61100467A JPS62257147A (ja) | 1986-04-30 | 1986-04-30 | 新規な感光性樹脂組成物 |
| US07/067,942 US4842984A (en) | 1986-04-30 | 1987-06-29 | Water soluble photosensitive resin compositions with bisazide compound |
| EP87109403A EP0297153A1 (en) | 1986-04-30 | 1987-06-30 | Novel photosensitive resin compositions |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61100467A JPS62257147A (ja) | 1986-04-30 | 1986-04-30 | 新規な感光性樹脂組成物 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62257147A true JPS62257147A (ja) | 1987-11-09 |
| JPH0453417B2 JPH0453417B2 (enExample) | 1992-08-26 |
Family
ID=14274712
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61100467A Granted JPS62257147A (ja) | 1986-04-30 | 1986-04-30 | 新規な感光性樹脂組成物 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US4842984A (enExample) |
| EP (1) | EP0297153A1 (enExample) |
| JP (1) | JPS62257147A (enExample) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0353666A3 (en) * | 1988-08-03 | 1990-05-23 | Toyo Gosei Kogyo Co., Ltd. | Photosensitive agent,photosensitive resin composition containing same, and method of image formation using the composition |
| DE19623891A1 (de) * | 1996-06-06 | 1997-12-11 | Micro Resist Technology Ges Fu | Lichtempfindlicher, wäßrig-alkalisch entwickelbarer, negativ arbeitender Resist |
| JP4678031B2 (ja) * | 2008-01-11 | 2011-04-27 | ソニー株式会社 | 液晶装置および電子機器 |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB763288A (en) * | 1954-06-16 | 1956-12-12 | Kodak Ltd | Improvements in photo mechanical processes and materials therefor |
| US3702765A (en) * | 1970-10-13 | 1972-11-14 | Eastman Kodak Co | Alkali-soluble light sensitive polymers and compositions and processes for using such polymers |
| JPS51149021A (en) * | 1974-12-28 | 1976-12-21 | Fuji Yakuhin Kogyo Kk | Water soluble photosensitive resin composition |
| DE3233912A1 (de) * | 1982-09-13 | 1984-03-15 | Merck Patent Gmbh, 6100 Darmstadt | Fotolacke zur ausbildung von reliefstrukturen aus hochwaermebestaendigen polymeren |
| JPS5953836A (ja) * | 1982-09-21 | 1984-03-28 | Fuji Photo Film Co Ltd | 感光性平版印刷版 |
| US4614701A (en) * | 1984-09-28 | 1986-09-30 | Sekisui Fine Chemical Co., Ltd. | Photocurable diazo or azide composition with acrylic copolymer having hydroxy and amino groups on separate acrylic monomer units |
| JPS6210104A (ja) * | 1985-07-05 | 1987-01-19 | Nitto Boseki Co Ltd | 新規な感光性樹脂の製造方法 |
| JPS62256801A (ja) * | 1986-04-28 | 1987-11-09 | Nitto Boseki Co Ltd | ポリアミン類から誘導される新規な機能性樹脂及びその製造方法 |
-
1986
- 1986-04-30 JP JP61100467A patent/JPS62257147A/ja active Granted
-
1987
- 1987-06-29 US US07/067,942 patent/US4842984A/en not_active Expired - Fee Related
- 1987-06-30 EP EP87109403A patent/EP0297153A1/en not_active Withdrawn
Also Published As
| Publication number | Publication date |
|---|---|
| EP0297153A1 (en) | 1989-01-04 |
| JPH0453417B2 (enExample) | 1992-08-26 |
| US4842984A (en) | 1989-06-27 |
Similar Documents
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| Merrill et al. | Photosensitive azide polymers | |
| WO2003087941A1 (fr) | Composition de resine positivement photosensible et procede de formation de motifs | |
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| JPH029610B2 (enExample) |