JPS6219051B2 - - Google Patents

Info

Publication number
JPS6219051B2
JPS6219051B2 JP57068657A JP6865782A JPS6219051B2 JP S6219051 B2 JPS6219051 B2 JP S6219051B2 JP 57068657 A JP57068657 A JP 57068657A JP 6865782 A JP6865782 A JP 6865782A JP S6219051 B2 JPS6219051 B2 JP S6219051B2
Authority
JP
Japan
Prior art keywords
film
polymer material
organic
material film
graft
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP57068657A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58186935A (ja
Inventor
Toshiaki Tamamura
Saburo Imamura
Masao Morita
Osamu Kogure
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NTT Inc
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP57068657A priority Critical patent/JPS58186935A/ja
Publication of JPS58186935A publication Critical patent/JPS58186935A/ja
Publication of JPS6219051B2 publication Critical patent/JPS6219051B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/38—Treatment before imagewise removal, e.g. prebaking

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP57068657A 1982-04-26 1982-04-26 パタ−ン形成法 Granted JPS58186935A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57068657A JPS58186935A (ja) 1982-04-26 1982-04-26 パタ−ン形成法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57068657A JPS58186935A (ja) 1982-04-26 1982-04-26 パタ−ン形成法

Publications (2)

Publication Number Publication Date
JPS58186935A JPS58186935A (ja) 1983-11-01
JPS6219051B2 true JPS6219051B2 (OSRAM) 1987-04-25

Family

ID=13379985

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57068657A Granted JPS58186935A (ja) 1982-04-26 1982-04-26 パタ−ン形成法

Country Status (1)

Country Link
JP (1) JPS58186935A (OSRAM)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0622624U (ja) * 1992-05-26 1994-03-25 株式会社東洋電機工業所 空冷軸受構造

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6194041A (ja) * 1984-10-16 1986-05-12 Matsushita Electric Ind Co Ltd パタ−ン形成方法
JPS61138254A (ja) * 1984-12-10 1986-06-25 Matsushita Electric Ind Co Ltd パタ−ン形成方法
JPS6221151A (ja) * 1985-07-19 1987-01-29 Matsushita Electric Ind Co Ltd パタ−ン形成方法
JPH07113774B2 (ja) * 1987-05-29 1995-12-06 株式会社日立製作所 パタ−ンの形成方法
JPH01123232A (ja) * 1987-11-09 1989-05-16 Mitsubishi Electric Corp パターン形成方法
EP1767989A4 (en) * 2004-05-31 2010-05-05 Fujifilm Corp METHOD FOR FORMING A PATTERN PATTERN, PATTERN PATIENT MATERIAL, LITHOGRAPHIC PROCESS, METHOD FOR PRODUCING A CONDUCTIVE STRUCTURE, CONDUCTIVE STRUCTURE, PROCESS FOR PREPARING A COLOR FILTER, COLOR FILTER AND PROCESS FOR PRODUCING A MICROLINE
JP4575098B2 (ja) * 2004-09-28 2010-11-04 株式会社東芝 パターン形成方法および電子デバイスの製造方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0622624U (ja) * 1992-05-26 1994-03-25 株式会社東洋電機工業所 空冷軸受構造

Also Published As

Publication number Publication date
JPS58186935A (ja) 1983-11-01

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