JPS58186935A - パタ−ン形成法 - Google Patents

パタ−ン形成法

Info

Publication number
JPS58186935A
JPS58186935A JP57068657A JP6865782A JPS58186935A JP S58186935 A JPS58186935 A JP S58186935A JP 57068657 A JP57068657 A JP 57068657A JP 6865782 A JP6865782 A JP 6865782A JP S58186935 A JPS58186935 A JP S58186935A
Authority
JP
Japan
Prior art keywords
film
polymer material
material film
organic
graft
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57068657A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6219051B2 (OSRAM
Inventor
Toshiaki Tamamura
敏昭 玉村
Saburo Imamura
三郎 今村
Masao Morita
雅夫 森田
Osamu Kogure
小暮　攻
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NTT Inc
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP57068657A priority Critical patent/JPS58186935A/ja
Publication of JPS58186935A publication Critical patent/JPS58186935A/ja
Publication of JPS6219051B2 publication Critical patent/JPS6219051B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/38—Treatment before imagewise removal, e.g. prebaking

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP57068657A 1982-04-26 1982-04-26 パタ−ン形成法 Granted JPS58186935A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57068657A JPS58186935A (ja) 1982-04-26 1982-04-26 パタ−ン形成法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57068657A JPS58186935A (ja) 1982-04-26 1982-04-26 パタ−ン形成法

Publications (2)

Publication Number Publication Date
JPS58186935A true JPS58186935A (ja) 1983-11-01
JPS6219051B2 JPS6219051B2 (OSRAM) 1987-04-25

Family

ID=13379985

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57068657A Granted JPS58186935A (ja) 1982-04-26 1982-04-26 パタ−ン形成法

Country Status (1)

Country Link
JP (1) JPS58186935A (OSRAM)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6194041A (ja) * 1984-10-16 1986-05-12 Matsushita Electric Ind Co Ltd パタ−ン形成方法
JPS61138254A (ja) * 1984-12-10 1986-06-25 Matsushita Electric Ind Co Ltd パタ−ン形成方法
JPS6221151A (ja) * 1985-07-19 1987-01-29 Matsushita Electric Ind Co Ltd パタ−ン形成方法
JPS63297435A (ja) * 1987-05-29 1988-12-05 Hitachi Ltd パタ−ンの形成方法
JPH01123232A (ja) * 1987-11-09 1989-05-16 Mitsubishi Electric Corp パターン形成方法
WO2005116763A1 (ja) * 2004-05-31 2005-12-08 Fujifilm Corporation グラフトパターン形成方法、グラフトパターン材料、リソグラフィ方法、導電性パターン形成方法、導電性パターン、カラーフィルタの製造方法、カラーフィルタ、及びマイクロレンズの製造方法
JP2006098546A (ja) * 2004-09-28 2006-04-13 Toshiba Corp パターン形成方法および電子デバイスの製造方法

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0622624U (ja) * 1992-05-26 1994-03-25 株式会社東洋電機工業所 空冷軸受構造

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6194041A (ja) * 1984-10-16 1986-05-12 Matsushita Electric Ind Co Ltd パタ−ン形成方法
JPS61138254A (ja) * 1984-12-10 1986-06-25 Matsushita Electric Ind Co Ltd パタ−ン形成方法
JPS6221151A (ja) * 1985-07-19 1987-01-29 Matsushita Electric Ind Co Ltd パタ−ン形成方法
JPS63297435A (ja) * 1987-05-29 1988-12-05 Hitachi Ltd パタ−ンの形成方法
JPH01123232A (ja) * 1987-11-09 1989-05-16 Mitsubishi Electric Corp パターン形成方法
WO2005116763A1 (ja) * 2004-05-31 2005-12-08 Fujifilm Corporation グラフトパターン形成方法、グラフトパターン材料、リソグラフィ方法、導電性パターン形成方法、導電性パターン、カラーフィルタの製造方法、カラーフィルタ、及びマイクロレンズの製造方法
JPWO2005116763A1 (ja) * 2004-05-31 2008-04-03 富士フイルム株式会社 グラフトパターン形成方法、グラフトパターン材料、リソグラフィ方法、導電性パターン形成方法、導電性パターン、カラーフィルタの製造方法、カラーフィルタ、及びマイクロレンズの製造方法
JP2006098546A (ja) * 2004-09-28 2006-04-13 Toshiba Corp パターン形成方法および電子デバイスの製造方法

Also Published As

Publication number Publication date
JPS6219051B2 (OSRAM) 1987-04-25

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