JPS6218559A - 露光用マスク - Google Patents

露光用マスク

Info

Publication number
JPS6218559A
JPS6218559A JP60158743A JP15874385A JPS6218559A JP S6218559 A JPS6218559 A JP S6218559A JP 60158743 A JP60158743 A JP 60158743A JP 15874385 A JP15874385 A JP 15874385A JP S6218559 A JPS6218559 A JP S6218559A
Authority
JP
Japan
Prior art keywords
mask
light
exposure
stepped portion
blocking layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60158743A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6325659B2 (enrdf_load_stackoverflow
Inventor
Masataka Shirasaki
白崎　正孝
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP60158743A priority Critical patent/JPS6218559A/ja
Priority to CA504383A priority patent/CA1270934C/en
Priority to DE8686400592T priority patent/DE3687845T2/de
Priority to US06/841,801 priority patent/US4806442A/en
Priority to EP86400592A priority patent/EP0195724B1/en
Publication of JPS6218559A publication Critical patent/JPS6218559A/ja
Publication of JPS6325659B2 publication Critical patent/JPS6325659B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001—Phase modulating patterns, e.g. refractive index patterns

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optical Integrated Circuits (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
JP60158743A 1985-03-20 1985-07-17 露光用マスク Granted JPS6218559A (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP60158743A JPS6218559A (ja) 1985-07-17 1985-07-17 露光用マスク
CA504383A CA1270934C (en) 1985-03-20 1986-03-18 SPATIAL PHASE MODULATED MASKS AND METHODS FOR MAKING THESE MASKS AND PHASE DIFFRACTION GRATINGS
DE8686400592T DE3687845T2 (de) 1985-03-20 1986-03-20 Raeumliche phasenmodulationsmasken, verfahren zu deren herstellung und verfahren zur bildung von phasenverschobenen beugungsgittern.
US06/841,801 US4806442A (en) 1985-03-20 1986-03-20 Spatial phase modulating masks and production processes thereof, and processes for the formation of phase-shifted diffraction gratings
EP86400592A EP0195724B1 (en) 1985-03-20 1986-03-20 Spatial phase modulating masks and production processes thereof, and processes for the formation of phase-shifted diffraction gratings

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60158743A JPS6218559A (ja) 1985-07-17 1985-07-17 露光用マスク

Publications (2)

Publication Number Publication Date
JPS6218559A true JPS6218559A (ja) 1987-01-27
JPS6325659B2 JPS6325659B2 (enrdf_load_stackoverflow) 1988-05-26

Family

ID=15678366

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60158743A Granted JPS6218559A (ja) 1985-03-20 1985-07-17 露光用マスク

Country Status (1)

Country Link
JP (1) JPS6218559A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6371851A (ja) * 1986-09-16 1988-04-01 Hitachi Ltd 回折格子の作製方法及びそれに用いるオートマスク
DE102008050933B4 (de) 2007-10-12 2021-11-25 Smc Kabushiki Kaisha Laminierte Struktur für ein Fluid

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6371851A (ja) * 1986-09-16 1988-04-01 Hitachi Ltd 回折格子の作製方法及びそれに用いるオートマスク
DE102008050933B4 (de) 2007-10-12 2021-11-25 Smc Kabushiki Kaisha Laminierte Struktur für ein Fluid

Also Published As

Publication number Publication date
JPS6325659B2 (enrdf_load_stackoverflow) 1988-05-26

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term