JPS6325659B2 - - Google Patents

Info

Publication number
JPS6325659B2
JPS6325659B2 JP15874385A JP15874385A JPS6325659B2 JP S6325659 B2 JPS6325659 B2 JP S6325659B2 JP 15874385 A JP15874385 A JP 15874385A JP 15874385 A JP15874385 A JP 15874385A JP S6325659 B2 JPS6325659 B2 JP S6325659B2
Authority
JP
Japan
Prior art keywords
mask
stepped portion
film
light
blocking layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP15874385A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6218559A (ja
Inventor
Masataka Shirasaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP60158743A priority Critical patent/JPS6218559A/ja
Priority to CA504383A priority patent/CA1270934C/en
Priority to DE8686400592T priority patent/DE3687845T2/de
Priority to US06/841,801 priority patent/US4806442A/en
Priority to EP86400592A priority patent/EP0195724B1/en
Publication of JPS6218559A publication Critical patent/JPS6218559A/ja
Publication of JPS6325659B2 publication Critical patent/JPS6325659B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001—Phase modulating patterns, e.g. refractive index patterns

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optical Integrated Circuits (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
JP60158743A 1985-03-20 1985-07-17 露光用マスク Granted JPS6218559A (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP60158743A JPS6218559A (ja) 1985-07-17 1985-07-17 露光用マスク
CA504383A CA1270934C (en) 1985-03-20 1986-03-18 SPATIAL PHASE MODULATED MASKS AND METHODS FOR MAKING THESE MASKS AND PHASE DIFFRACTION GRATINGS
DE8686400592T DE3687845T2 (de) 1985-03-20 1986-03-20 Raeumliche phasenmodulationsmasken, verfahren zu deren herstellung und verfahren zur bildung von phasenverschobenen beugungsgittern.
US06/841,801 US4806442A (en) 1985-03-20 1986-03-20 Spatial phase modulating masks and production processes thereof, and processes for the formation of phase-shifted diffraction gratings
EP86400592A EP0195724B1 (en) 1985-03-20 1986-03-20 Spatial phase modulating masks and production processes thereof, and processes for the formation of phase-shifted diffraction gratings

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60158743A JPS6218559A (ja) 1985-07-17 1985-07-17 露光用マスク

Publications (2)

Publication Number Publication Date
JPS6218559A JPS6218559A (ja) 1987-01-27
JPS6325659B2 true JPS6325659B2 (enrdf_load_stackoverflow) 1988-05-26

Family

ID=15678366

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60158743A Granted JPS6218559A (ja) 1985-03-20 1985-07-17 露光用マスク

Country Status (1)

Country Link
JP (1) JPS6218559A (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07101302B2 (ja) * 1986-09-16 1995-11-01 株式会社日立製作所 回折格子の作製方法及びそれに用いるオートマスク
JP5252264B2 (ja) 2007-10-12 2013-07-31 Ｓｍｃ株式会社 流体用積層構造体

Also Published As

Publication number Publication date
JPS6218559A (ja) 1987-01-27

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term