JPH0435726B2 - - Google Patents
Info
- Publication number
- JPH0435726B2 JPH0435726B2 JP13054478A JP13054478A JPH0435726B2 JP H0435726 B2 JPH0435726 B2 JP H0435726B2 JP 13054478 A JP13054478 A JP 13054478A JP 13054478 A JP13054478 A JP 13054478A JP H0435726 B2 JPH0435726 B2 JP H0435726B2
- Authority
- JP
- Japan
- Prior art keywords
- diffraction grating
- photoresist
- film
- metal thin
- thin film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 229920002120 photoresistant polymer Polymers 0.000 claims description 28
- 229910052751 metal Inorganic materials 0.000 claims description 21
- 239000002184 metal Substances 0.000 claims description 21
- 238000000034 method Methods 0.000 claims description 15
- 238000005530 etching Methods 0.000 claims description 10
- 238000004519 manufacturing process Methods 0.000 claims description 10
- 229910010272 inorganic material Inorganic materials 0.000 claims description 5
- 239000011147 inorganic material Substances 0.000 claims description 5
- 238000009826 distribution Methods 0.000 claims description 4
- 230000003287 optical effect Effects 0.000 claims description 2
- 239000010408 film Substances 0.000 claims 7
- 239000010409 thin film Substances 0.000 claims 6
- 239000000758 substrate Substances 0.000 description 13
- 239000011521 glass Substances 0.000 description 9
- 229910004298 SiO 2 Inorganic materials 0.000 description 6
- 150000002500 ions Chemical class 0.000 description 5
- 238000007796 conventional method Methods 0.000 description 4
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- 238000001020 plasma etching Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 238000003486 chemical etching Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 230000000593 degrading effect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 238000010791 quenching Methods 0.000 description 1
- 230000000171 quenching effect Effects 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/0018—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 with means for preventing ghost images
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13054478A JPS5557807A (en) | 1978-10-25 | 1978-10-25 | Production of diffraction grating |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13054478A JPS5557807A (en) | 1978-10-25 | 1978-10-25 | Production of diffraction grating |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5557807A JPS5557807A (en) | 1980-04-30 |
JPH0435726B2 true JPH0435726B2 (enrdf_load_stackoverflow) | 1992-06-12 |
Family
ID=15036812
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13054478A Granted JPS5557807A (en) | 1978-10-25 | 1978-10-25 | Production of diffraction grating |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5557807A (enrdf_load_stackoverflow) |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56137118A (en) * | 1980-03-29 | 1981-10-26 | Rikagaku Kenkyusho | Production of lamellar diffraction grating |
JPS60103308A (ja) * | 1983-11-11 | 1985-06-07 | Pioneer Electronic Corp | マイクロフレネルレンズの製造方法 |
JPS60103307A (ja) * | 1983-11-11 | 1985-06-07 | Pioneer Electronic Corp | マイクロフレネルレンズの製造方法 |
JP3147481B2 (ja) * | 1992-04-21 | 2001-03-19 | 松下電器産業株式会社 | ガラス製回折格子の成形用金型及びその製造方法及びガラス製回折格子の製造方法 |
JP5428636B2 (ja) * | 2009-06-17 | 2014-02-26 | 住友電気工業株式会社 | 回折格子の形成方法 |
JP5390357B2 (ja) | 2009-12-04 | 2014-01-15 | パナソニック株式会社 | 光学レンズ用プレス成形金型、ガラス製光学レンズ、及びガラス製光学レンズの製造方法 |
CN104459854B (zh) * | 2013-09-22 | 2017-12-01 | 清华大学 | 金属光栅的制备方法 |
US10592080B2 (en) | 2014-07-31 | 2020-03-17 | Microsoft Technology Licensing, Llc | Assisted presentation of application windows |
US10678412B2 (en) | 2014-07-31 | 2020-06-09 | Microsoft Technology Licensing, Llc | Dynamic joint dividers for application windows |
US10254942B2 (en) | 2014-07-31 | 2019-04-09 | Microsoft Technology Licensing, Llc | Adaptive sizing and positioning of application windows |
US11086216B2 (en) | 2015-02-09 | 2021-08-10 | Microsoft Technology Licensing, Llc | Generating electronic components |
US9827209B2 (en) * | 2015-02-09 | 2017-11-28 | Microsoft Technology Licensing, Llc | Display system |
US10018844B2 (en) | 2015-02-09 | 2018-07-10 | Microsoft Technology Licensing, Llc | Wearable image display system |
US10317677B2 (en) | 2015-02-09 | 2019-06-11 | Microsoft Technology Licensing, Llc | Display system |
CN116603700B (zh) * | 2022-02-08 | 2024-11-26 | 成都拓米双都光电有限公司 | 一种支撑栅板的制备方法 |
-
1978
- 1978-10-25 JP JP13054478A patent/JPS5557807A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS5557807A (en) | 1980-04-30 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US6015650A (en) | Method for forming micro patterns of semiconductor devices | |
JPH0435726B2 (enrdf_load_stackoverflow) | ||
US6200711B1 (en) | Phase mask for manufacturing diffraction grating, and method of manufacture | |
JP3377134B2 (ja) | 格子および二次元格子構造の反応性イオンエッチング | |
JP4824273B2 (ja) | 回折格子作製用位相マスク | |
JPH0815510A (ja) | バイナリーオプティクス及びその製造方法 | |
US4087281A (en) | Method of producing optical image on chromium or aluminum film with high-energy light beam | |
JPH06174907A (ja) | 金属格子の製作方法 | |
JPS6033504A (ja) | ブレ−ズド格子の製造方法 | |
JP2742683B2 (ja) | 透過型回折格子の製造方法 | |
JP2624351B2 (ja) | ホトマスクの製造方法 | |
JP2816833B2 (ja) | 位相シフトマスクの製造方法 | |
EP0490320B1 (en) | A method for producing a diffraction grating | |
JP2624354B2 (ja) | ホトマスク製造方法 | |
US4239787A (en) | Semitransparent and durable photolithography masks | |
JP2824314B2 (ja) | 反射型光曲げ導波路の製造方法 | |
JPH041703A (ja) | 位相シフト型回折格子の製造方法 | |
JPH0830764B2 (ja) | 回折格子の製造方法 | |
JPH06148413A (ja) | 回折格子の作成方法 | |
JPH11223714A (ja) | 回折格子作製用位相マスク及びその製造方法 | |
JPH11212246A (ja) | 回折格子形成用位相マスク | |
JPH06250007A (ja) | ブレーズド型回折格子の製造方法 | |
JPS646449B2 (enrdf_load_stackoverflow) | ||
JPS627001A (ja) | 回折格子の製造方法 | |
JPS6024933B2 (ja) | 電子線感応性無機レジスト |