JPS62175729A - 感光性組成物 - Google Patents

感光性組成物

Info

Publication number
JPS62175729A
JPS62175729A JP1857286A JP1857286A JPS62175729A JP S62175729 A JPS62175729 A JP S62175729A JP 1857286 A JP1857286 A JP 1857286A JP 1857286 A JP1857286 A JP 1857286A JP S62175729 A JPS62175729 A JP S62175729A
Authority
JP
Japan
Prior art keywords
acid
photosensitive
photosensitive composition
polymer
alkali
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1857286A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0544018B2 (enrdf_load_stackoverflow
Inventor
Nobuyuki Kita
喜多 信行
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP1857286A priority Critical patent/JPS62175729A/ja
Publication of JPS62175729A publication Critical patent/JPS62175729A/ja
Publication of JPH0544018B2 publication Critical patent/JPH0544018B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
    • G03F7/0955Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer one of the photosensitive systems comprising a non-macromolecular photopolymerisable compound having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • General Physics & Mathematics (AREA)
JP1857286A 1986-01-30 1986-01-30 感光性組成物 Granted JPS62175729A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1857286A JPS62175729A (ja) 1986-01-30 1986-01-30 感光性組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1857286A JPS62175729A (ja) 1986-01-30 1986-01-30 感光性組成物

Publications (2)

Publication Number Publication Date
JPS62175729A true JPS62175729A (ja) 1987-08-01
JPH0544018B2 JPH0544018B2 (enrdf_load_stackoverflow) 1993-07-05

Family

ID=11975335

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1857286A Granted JPS62175729A (ja) 1986-01-30 1986-01-30 感光性組成物

Country Status (1)

Country Link
JP (1) JPS62175729A (enrdf_load_stackoverflow)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03240060A (ja) * 1990-02-19 1991-10-25 Fuji Photo Film Co Ltd 感光性平版印刷版
JPH03240061A (ja) * 1990-02-19 1991-10-25 Fuji Photo Film Co Ltd 感光性平版印刷版
JPH0425845A (ja) * 1990-05-21 1992-01-29 Fuji Photo Film Co Ltd 感光性平版印刷版
JPH04274429A (ja) * 1991-03-01 1992-09-30 Fuji Photo Film Co Ltd 感光性平版印刷版
CN110032041A (zh) * 2019-05-07 2019-07-19 深圳市华星光电半导体显示技术有限公司 光阻组合物、显示面板及其制备方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5849940A (ja) * 1981-06-30 1983-03-24 Konishiroku Photo Ind Co Ltd 感光性組成物
JPS60165646A (ja) * 1984-02-09 1985-08-28 Dainippon Ink & Chem Inc 水性アルカリ現像液で現像可能な感光性画像形成材料
JPS60191244A (ja) * 1984-03-13 1985-09-28 Dainippon Ink & Chem Inc 水性アルカリ現像液で現像可能な感光性画像形成材料

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5849940A (ja) * 1981-06-30 1983-03-24 Konishiroku Photo Ind Co Ltd 感光性組成物
JPS60165646A (ja) * 1984-02-09 1985-08-28 Dainippon Ink & Chem Inc 水性アルカリ現像液で現像可能な感光性画像形成材料
JPS60191244A (ja) * 1984-03-13 1985-09-28 Dainippon Ink & Chem Inc 水性アルカリ現像液で現像可能な感光性画像形成材料

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03240060A (ja) * 1990-02-19 1991-10-25 Fuji Photo Film Co Ltd 感光性平版印刷版
JPH03240061A (ja) * 1990-02-19 1991-10-25 Fuji Photo Film Co Ltd 感光性平版印刷版
JPH0425845A (ja) * 1990-05-21 1992-01-29 Fuji Photo Film Co Ltd 感光性平版印刷版
JPH04274429A (ja) * 1991-03-01 1992-09-30 Fuji Photo Film Co Ltd 感光性平版印刷版
CN110032041A (zh) * 2019-05-07 2019-07-19 深圳市华星光电半导体显示技术有限公司 光阻组合物、显示面板及其制备方法

Also Published As

Publication number Publication date
JPH0544018B2 (enrdf_load_stackoverflow) 1993-07-05

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees