JPS62158317A - Ｃｖｄ装置用ガスノズル - Google Patents
Ｃｖｄ装置用ガスノズルInfo
- Publication number
- JPS62158317A JPS62158317A JP29842885A JP29842885A JPS62158317A JP S62158317 A JPS62158317 A JP S62158317A JP 29842885 A JP29842885 A JP 29842885A JP 29842885 A JP29842885 A JP 29842885A JP S62158317 A JPS62158317 A JP S62158317A
- Authority
- JP
- Japan
- Prior art keywords
- gas
- nozzle
- opening
- chamber
- gases
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000007789 gas Substances 0.000 abstract description 49
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract description 5
- 239000012495 reaction gas Substances 0.000 abstract description 5
- 229910052710 silicon Inorganic materials 0.000 abstract description 5
- 239000010703 silicon Substances 0.000 abstract description 5
- 239000000428 dust Substances 0.000 abstract description 4
- 239000000203 mixture Substances 0.000 abstract description 3
- 208000037998 chronic venous disease Diseases 0.000 abstract 1
- 238000009489 vacuum treatment Methods 0.000 abstract 1
- 235000012431 wafers Nutrition 0.000 description 14
- 239000010409 thin film Substances 0.000 description 4
- 239000011261 inert gas Substances 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 102100025490 Slit homolog 1 protein Human genes 0.000 description 2
- 101710123186 Slit homolog 1 protein Proteins 0.000 description 2
- 239000000779 smoke Substances 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 238000011010 flushing procedure Methods 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP29842885A JPS62158317A (ja) | 1985-12-28 | 1985-12-28 | Ｃｖｄ装置用ガスノズル |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP29842885A JPS62158317A (ja) | 1985-12-28 | 1985-12-28 | Ｃｖｄ装置用ガスノズル |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62158317A true JPS62158317A (ja) | 1987-07-14 |
| JPH0588536B2 JPH0588536B2 (https=) | 1993-12-22 |
Family
ID=17859574
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP29842885A Granted JPS62158317A (ja) | 1985-12-28 | 1985-12-28 | Ｃｖｄ装置用ガスノズル |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62158317A (https=) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0747503A1 (en) * | 1995-06-09 | 1996-12-11 | Ebara Corporation | Reactant gas injector for chemical vapor deposition apparatus |
| JP2007254869A (ja) * | 2006-03-24 | 2007-10-04 | Kyoto Univ | 原料ガス噴出用ノズル及び化学的気相成膜装置 |
-
1985
- 1985-12-28 JP JP29842885A patent/JPS62158317A/ja active Granted
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0747503A1 (en) * | 1995-06-09 | 1996-12-11 | Ebara Corporation | Reactant gas injector for chemical vapor deposition apparatus |
| US5728223A (en) * | 1995-06-09 | 1998-03-17 | Ebara Corporation | Reactant gas ejector head and thin-film vapor deposition apparatus |
| KR100427426B1 (ko) * | 1995-06-09 | 2004-07-12 | 가부시키 가이샤 에바라 세이사꾸쇼 | 반응가스분사헤드및증기상박막성장장치 |
| JP2007254869A (ja) * | 2006-03-24 | 2007-10-04 | Kyoto Univ | 原料ガス噴出用ノズル及び化学的気相成膜装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0588536B2 (https=) | 1993-12-22 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| LAPS | Cancellation because of no payment of annual fees |