JPH0588536B2 - - Google Patents
Info
- Publication number
- JPH0588536B2 JPH0588536B2 JP29842885A JP29842885A JPH0588536B2 JP H0588536 B2 JPH0588536 B2 JP H0588536B2 JP 29842885 A JP29842885 A JP 29842885A JP 29842885 A JP29842885 A JP 29842885A JP H0588536 B2 JPH0588536 B2 JP H0588536B2
- Authority
- JP
- Japan
- Prior art keywords
- gas
- opening
- nozzle
- meandering
- gap
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000007789 gas Substances 0.000 description 48
- 235000012431 wafers Nutrition 0.000 description 12
- 239000010409 thin film Substances 0.000 description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- 239000000428 dust Substances 0.000 description 3
- 239000011261 inert gas Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000376 reactant Substances 0.000 description 2
- 239000012495 reaction gas Substances 0.000 description 2
- 239000000779 smoke Substances 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 238000011010 flushing procedure Methods 0.000 description 1
- 239000011796 hollow space material Substances 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP29842885A JPS62158317A (ja) | 1985-12-28 | 1985-12-28 | Ｃｖｄ装置用ガスノズル |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP29842885A JPS62158317A (ja) | 1985-12-28 | 1985-12-28 | Ｃｖｄ装置用ガスノズル |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62158317A JPS62158317A (ja) | 1987-07-14 |
| JPH0588536B2 true JPH0588536B2 (https=) | 1993-12-22 |
Family
ID=17859574
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP29842885A Granted JPS62158317A (ja) | 1985-12-28 | 1985-12-28 | Ｃｖｄ装置用ガスノズル |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62158317A (https=) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3380091B2 (ja) * | 1995-06-09 | 2003-02-24 | 株式会社荏原製作所 | 反応ガス噴射ヘッド及び薄膜気相成長装置 |
| JP4940425B2 (ja) * | 2006-03-24 | 2012-05-30 | 国立大学法人京都大学 | 原料ガス噴出用ノズル及び化学的気相成膜装置 |
-
1985
- 1985-12-28 JP JP29842885A patent/JPS62158317A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62158317A (ja) | 1987-07-14 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| LAPS | Cancellation because of no payment of annual fees |