JPS62157138U - - Google Patents
Info
- Publication number
- JPS62157138U JPS62157138U JP4562386U JP4562386U JPS62157138U JP S62157138 U JPS62157138 U JP S62157138U JP 4562386 U JP4562386 U JP 4562386U JP 4562386 U JP4562386 U JP 4562386U JP S62157138 U JPS62157138 U JP S62157138U
- Authority
- JP
- Japan
- Prior art keywords
- sample holder
- sample
- electrode
- gas supply
- utility
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000001312 dry etching Methods 0.000 claims 1
- 239000012495 reaction gas Substances 0.000 claims 1
Landscapes
- Drying Of Semiconductors (AREA)
Description
第１図は本考案による一実施例を示す側断面図
、第２図は本考案による一実施例の下部電極の平
面図、第３図は従来技術の装置を示す側断面図で
ある。
図において、１はチヤンバー、２は上部電極、
３は下部電極、４は試料、５はガス噴出口、６は
高周波発振器、７は真空計、を示す。
FIG. 1 is a side sectional view showing an embodiment of the present invention, FIG. 2 is a plan view of a lower electrode of an embodiment of the present invention, and FIG. 3 is a side sectional view showing a conventional device. In the figure, 1 is a chamber, 2 is an upper electrode,
3 is a lower electrode, 4 is a sample, 5 is a gas outlet, 6 is a high frequency oscillator, and 7 is a vacuum gauge.
Claims (1)
料載置部近傍部分に、反応ガス供給の噴出口を配
設してなることを特徴とするドライエツチング装
置。 1. A dry etching device comprising: an electrode having a sample holder on which a sample is placed; and a reaction gas supply outlet disposed in a portion near the sample holder.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1986045623U JPH0729631Y2 (en) | 1986-03-27 | 1986-03-27 | Dry etching equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1986045623U JPH0729631Y2 (en) | 1986-03-27 | 1986-03-27 | Dry etching equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62157138U true JPS62157138U (en) | 1987-10-06 |
| JPH0729631Y2 JPH0729631Y2 (en) | 1995-07-05 |
Family
ID=30864528
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1986045623U Expired - Lifetime JPH0729631Y2 (en) | 1986-03-27 | 1986-03-27 | Dry etching equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0729631Y2 (en) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60206027A (en) * | 1984-03-30 | 1985-10-17 | Hitachi Ltd | Plasma processing apparatus |
| JPS6127334U (en) * | 1984-07-24 | 1986-02-18 | 日本電気株式会社 | dry etching equipment |
-
1986
- 1986-03-27 JP JP1986045623U patent/JPH0729631Y2/en not_active Expired - Lifetime
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60206027A (en) * | 1984-03-30 | 1985-10-17 | Hitachi Ltd | Plasma processing apparatus |
| JPS6127334U (en) * | 1984-07-24 | 1986-02-18 | 日本電気株式会社 | dry etching equipment |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0729631Y2 (en) | 1995-07-05 |