JPS6214825B2 - - Google Patents

Info

Publication number
JPS6214825B2
JPS6214825B2 JP17934780A JP17934780A JPS6214825B2 JP S6214825 B2 JPS6214825 B2 JP S6214825B2 JP 17934780 A JP17934780 A JP 17934780A JP 17934780 A JP17934780 A JP 17934780A JP S6214825 B2 JPS6214825 B2 JP S6214825B2
Authority
JP
Japan
Prior art keywords
shutter
exposure
closing operation
amount
wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP17934780A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57101839A (en
Inventor
Keiichiro Sakado
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nippon Kogaku KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Kogaku KK filed Critical Nippon Kogaku KK
Priority to JP17934780A priority Critical patent/JPS57101839A/ja
Publication of JPS57101839A publication Critical patent/JPS57101839A/ja
Publication of JPS6214825B2 publication Critical patent/JPS6214825B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70558—Dose control, i.e. achievement of a desired dose
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP17934780A 1980-12-18 1980-12-18 Exposure device for wafer or photomask Granted JPS57101839A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17934780A JPS57101839A (en) 1980-12-18 1980-12-18 Exposure device for wafer or photomask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17934780A JPS57101839A (en) 1980-12-18 1980-12-18 Exposure device for wafer or photomask

Publications (2)

Publication Number Publication Date
JPS57101839A JPS57101839A (en) 1982-06-24
JPS6214825B2 true JPS6214825B2 (ko) 1987-04-03

Family

ID=16064247

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17934780A Granted JPS57101839A (en) 1980-12-18 1980-12-18 Exposure device for wafer or photomask

Country Status (1)

Country Link
JP (1) JPS57101839A (ko)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5858730A (ja) * 1981-10-05 1983-04-07 Hitachi Ltd 投影露光装置
JPS6070452A (ja) * 1983-09-28 1985-04-22 Nippon Kogaku Kk <Nikon> 露光装置
JPH0715875B2 (ja) * 1984-12-27 1995-02-22 キヤノン株式会社 露光装置及び方法
JPS60198726A (ja) * 1984-03-23 1985-10-08 Hitachi Ltd Ｘ線露光装置の露光量調整方法と装置
JPS61278140A (ja) * 1985-05-31 1986-12-09 Fuji Photo Optical Co Ltd 回折格子露光装置における露光時間設定方法
JP2571054B2 (ja) * 1987-04-28 1997-01-16 キヤノン株式会社 露光装置及び素子製造方法
DE68929187T2 (de) 1988-09-02 2000-09-28 Canon Kk Belichtungsapparat

Also Published As

Publication number Publication date
JPS57101839A (en) 1982-06-24

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