JPS6214039A - 表面検査装置 - Google Patents

表面検査装置

Info

Publication number
JPS6214039A
JPS6214039A JP15142085A JP15142085A JPS6214039A JP S6214039 A JPS6214039 A JP S6214039A JP 15142085 A JP15142085 A JP 15142085A JP 15142085 A JP15142085 A JP 15142085A JP S6214039 A JPS6214039 A JP S6214039A
Authority
JP
Japan
Prior art keywords
sample plate
light
outline
range
surface inspection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15142085A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0364827B2 (enrdf_load_stackoverflow
Inventor
Izuo Hourai
泉雄 蓬莱
Masashi Honda
本田 正志
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi High Tech Corp
Original Assignee
Hitachi Electronics Engineering Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Electronics Engineering Co Ltd filed Critical Hitachi Electronics Engineering Co Ltd
Priority to JP15142085A priority Critical patent/JPS6214039A/ja
Publication of JPS6214039A publication Critical patent/JPS6214039A/ja
Publication of JPH0364827B2 publication Critical patent/JPH0364827B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/95Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501Semiconductor wafers
    • G01N21/9503Wafer edge inspection

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
JP15142085A 1985-07-11 1985-07-11 表面検査装置 Granted JPS6214039A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15142085A JPS6214039A (ja) 1985-07-11 1985-07-11 表面検査装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15142085A JPS6214039A (ja) 1985-07-11 1985-07-11 表面検査装置

Publications (2)

Publication Number Publication Date
JPS6214039A true JPS6214039A (ja) 1987-01-22
JPH0364827B2 JPH0364827B2 (enrdf_load_stackoverflow) 1991-10-08

Family

ID=15518227

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15142085A Granted JPS6214039A (ja) 1985-07-11 1985-07-11 表面検査装置

Country Status (1)

Country Link
JP (1) JPS6214039A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008203151A (ja) * 2007-02-21 2008-09-04 Topcon Corp ウエハ表面検査方法及びその装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008203151A (ja) * 2007-02-21 2008-09-04 Topcon Corp ウエハ表面検査方法及びその装置

Also Published As

Publication number Publication date
JPH0364827B2 (enrdf_load_stackoverflow) 1991-10-08

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