JPS62131432U

JPS62131432U -

Info

Publication number: JPS62131432U
Application number: JP1842786U
Authority: JP
Priority date: 1986-02-12
Filing date: 1986-02-12
Publication date: 1987-08-19

Description

[Brief explanation of the drawing]

第１図はこの考案の一実施例によるレジスト塗
布装置の容器と整流盤との平面図、第２図は従来
のレジスト塗布装置の全体の断面図、第３図は同
じく容器と整流盤との平面図である。１……チヤツク、２……モータ、３……ウエハ
、４……容器、５……カツプ、６……排気口、７
……整流盤。なお、図中同一符号は同一又は相当
部分を示す。 FIG. 1 is a plan view of a container and a rectifier plate of a resist coating device according to an embodiment of the invention, FIG. 2 is a cross-sectional view of the entire conventional resist coating device, and FIG. FIG. 1...chuck, 2...motor, 3...wafer, 4...container, 5...cup, 6...exhaust port, 7
... Rectifier board. Note that the same reference numerals in the figures indicate the same or equivalent parts.

補正昭６１．５．２７実用新案登録請求の範囲を次のように補正する
。Amendment May 27, 1981 The scope of claims for utility model registration is amended as follows.

【実用新案登録請求の範囲】回転駆動手段を備え半導体ウエハを載置するチ
ヤツクと、チヤツクおよびウエハを囲繞する容器
と、容器底部に容器内の気流を排出する排気口と
、上記チヤツクと排気口との空間に排気気流を調
整するための整流板を備え、チヤツク上に載置さ
れたウエハにレジストを塗布するレジスト塗布装
置において、上記整流板はその外周縁と容器内壁
との隙間を、排気口に近いほど狹くしたことを特
徴とするレジスト塗布装置。図面の簡単な説明を次のように補正する。明細書第５頁第１３行、同頁第１５行、同頁１
８行の「整流盤」という記載を「整流板」とそれ
ぞれ補正する。[Scope of Claim for Utility Model Registration] A chuck equipped with rotation drive means and on which a semiconductor wafer is placed, a container surrounding the chuck and the wafer, an exhaust port at the bottom of the container for discharging airflow inside the container, and the chuck and the exhaust port. In a resist coating apparatus that applies resist to wafers placed on a chuck, the rectifying plate is equipped with a rectifying plate for adjusting exhaust airflow in the space between the chuck and the gap between the outer peripheral edge and the inner wall of the container. A resist coating device characterized by being narrower closer to the mouth. The brief description of the drawing has been amended as follows. Specification page 5, line 13, same page, line 15, same page 1
Correct the description "straightening plate" in line 8 to "straightening plate".

Claims

[Scope of utility model registration request]

A chuck equipped with a rotational drive means and on which a semiconductor wafer is placed, a container surrounding the chuck and the wafer, an exhaust port at the bottom of the container for discharging the airflow inside the container, and adjusting the exhaust airflow in the space between the chuck and the exhaust port. In a resist coating device that is equipped with a rectifier plate for applying resist to a wafer placed on a chuck, the gap between the outer periphery of the rectifier plate and the inner wall of the container becomes narrower as it approaches the exhaust port. A resist coating device featuring: