JPS58146576U - Coating device - Google Patents
Coating deviceInfo
- Publication number
- JPS58146576U JPS58146576U JP4130382U JP4130382U JPS58146576U JP S58146576 U JPS58146576 U JP S58146576U JP 4130382 U JP4130382 U JP 4130382U JP 4130382 U JP4130382 U JP 4130382U JP S58146576 U JPS58146576 U JP S58146576U
- Authority
- JP
- Japan
- Prior art keywords
- coating device
- semiconductor wafer
- coating
- pipe
- spin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Coating Apparatus (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
第１図は従来の塗布装置の断面図、第２図は本考案の一
実施例を示す塗布装置の断面図である。
１・・・・・・外箱、２・・・・・・カップ、３・・・
・・・中空シャフトモータ、４・・・・・・回転軸、５
．６・・・・・・軸受、７・・・・・・ウェハーチャッ
ク、８・・・・・・ウェハー、９・・・・・・飛散した
塗布液、１０・・・・・・パイプ。FIG. 1 is a cross-sectional view of a conventional coating device, and FIG. 2 is a cross-sectional view of a coating device showing an embodiment of the present invention. 1...Outer box, 2...Cup, 3...
...Hollow shaft motor, 4...Rotating shaft, 5
．． 6...Bearing, 7...Wafer chuck, 8...Wafer, 9...Scattered coating liquid, 10...Pipe.
Claims (1)
、回転する半導体ウェハーを囲んで設けられているカッ
プ内壁面に沿って気体を吹き下ろすパイプを設けたこと
を特徴とする塗布装置。1. A coating device for spin-coating a liquid onto the surface of a semiconductor wafer, characterized in that the coating device is provided with a pipe for blowing gas down along the inner wall surface of a cup surrounding the rotating semiconductor wafer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4130382U JPS58146576U (en) | 1982-03-24 | 1982-03-24 | Coating device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4130382U JPS58146576U (en) | 1982-03-24 | 1982-03-24 | Coating device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS58146576U true JPS58146576U (en) | 1983-10-01 |
Family
ID=30052488
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4130382U Pending JPS58146576U (en) | 1982-03-24 | 1982-03-24 | Coating device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58146576U (en) |
-
1982
- 1982-03-24 JP JP4130382U patent/JPS58146576U/en active Pending
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS58146576U (en) | Coating device | |
| JPS5925941U (en) | Rotating machine shaft sealing device | |
| JPS6112653U (en) | Bakyu whip | |
| JPS5863744U (en) | spin coater | |
| JPS58117129U (en) | cleaning rotating brush | |
| JPS58177623U (en) | bearing device | |
| JPS6144831U (en) | Wafer drying equipment | |
| JPS59173341U (en) | Rotary coating device | |
| JPS5859991U (en) | Liquid ring vacuum pump equipment | |
| JPS59166441U (en) | spin coater | |
| JPS59143985U (en) | ice cream container | |
| JPS59187139U (en) | semiconductor wafer holder equipment | |
| JPS58169222U (en) | rotating plate bearing | |
| JPS60117034U (en) | Semiconductor vacuum rotary chuck | |
| JPS60136141U (en) | Wafer transfer device | |
| JPS599084U (en) | chemical vapor deposition equipment | |
| JPS5858335U (en) | spin coater | |
| JPS63140623U (en) | ||
| JPS58144222U (en) | Propulsion machine position measurement device | |
| JPS58105786U (en) | Cryogenic refrigerant supply equipment for superconducting rotating machines | |
| JPS6096841U (en) | semiconductor equipment | |
| JPS5881128U (en) | Propeller shaft vibration damping device | |
| JPS6042730U (en) | semiconductor manufacturing equipment | |
| JPS5891473U (en) | spinner device | |
| JPS5811957U (en) | Rotating electric machine bearing cover |