JPS6236531U - - Google Patents

Info

Publication number
JPS6236531U
JPS6236531U JP12705085U JP12705085U JPS6236531U JP S6236531 U JPS6236531 U JP S6236531U JP 12705085 U JP12705085 U JP 12705085U JP 12705085 U JP12705085 U JP 12705085U JP S6236531 U JPS6236531 U JP S6236531U
Authority
JP
Japan
Prior art keywords
wafer
mask
aligner
mask aligner
chuck
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12705085U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP12705085U priority Critical patent/JPS6236531U/ja
Publication of JPS6236531U publication Critical patent/JPS6236531U/ja
Pending legal-status Critical Current

Links

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図はこの考案の一実施例の要部断面図、第
2図は第1図のマスクアライナを使用したパター
ン測定結果を表わす図、第3図は従来のマスクア
ライナの要部断面図、第4図は従来のマスクアラ
イナを使用したパターン測定結果を表わす図であ
る。 10……ウエーハチヤツク、20……ウエーハ
載置面、25……ウエーハ載置面の周辺部、30
……ウエーハ、40……マスクホルダ、50……
マスク。
FIG. 1 is a cross-sectional view of a main part of an embodiment of this invention, FIG. 2 is a diagram showing pattern measurement results using the mask aligner of FIG. 1, and FIG. FIG. 4 is a diagram showing pattern measurement results using a conventional mask aligner. 10...Wafer rack, 20...Wafer placement surface, 25...Periphery of wafer placement surface, 30
...Wafer, 40...Mask holder, 50...
mask.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] ウエーハチヤツクに載置したウエーハとマスク
ホルダによつて把持されたマスクとを位置決めし
て密着させ露光をおこなうマスクアライナにおい
て、前記ウエーハチヤツクのウエーハ載置面をそ
の周辺部においてウエーハ側に湾曲させたことを
特徴とするマスクアライナ。
In a mask aligner that positions and brings a wafer placed on a wafer chuck and a mask held by a mask holder into close contact for exposure, the wafer mounting surface of the wafer chuck is curved toward the wafer at its periphery. Features of mask aligner.
JP12705085U 1985-08-20 1985-08-20 Pending JPS6236531U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12705085U JPS6236531U (en) 1985-08-20 1985-08-20

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12705085U JPS6236531U (en) 1985-08-20 1985-08-20

Publications (1)

Publication Number Publication Date
JPS6236531U true JPS6236531U (en) 1987-03-04

Family

ID=31021431

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12705085U Pending JPS6236531U (en) 1985-08-20 1985-08-20

Country Status (1)

Country Link
JP (1) JPS6236531U (en)

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