JPS62106352A - 走査型x線顕微鏡 - Google Patents

走査型x線顕微鏡

Info

Publication number
JPS62106352A
JPS62106352A JP60246510A JP24651085A JPS62106352A JP S62106352 A JPS62106352 A JP S62106352A JP 60246510 A JP60246510 A JP 60246510A JP 24651085 A JP24651085 A JP 24651085A JP S62106352 A JPS62106352 A JP S62106352A
Authority
JP
Japan
Prior art keywords
ray
image
rays
sample
scanning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60246510A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0543080B2 (enrdf_load_stackoverflow
Inventor
Hiromoto Nakazawa
中沢 弘基
Koji Nozaki
浩司 野崎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute for Materials Science
Original Assignee
National Institute for Research in Inorganic Material
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by National Institute for Research in Inorganic Material filed Critical National Institute for Research in Inorganic Material
Priority to JP60246510A priority Critical patent/JPS62106352A/ja
Publication of JPS62106352A publication Critical patent/JPS62106352A/ja
Publication of JPH0543080B2 publication Critical patent/JPH0543080B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G21NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21KTECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K7/00Gamma- or X-ray microscopes

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
JP60246510A 1985-11-01 1985-11-01 走査型x線顕微鏡 Granted JPS62106352A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60246510A JPS62106352A (ja) 1985-11-01 1985-11-01 走査型x線顕微鏡

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60246510A JPS62106352A (ja) 1985-11-01 1985-11-01 走査型x線顕微鏡

Publications (2)

Publication Number Publication Date
JPS62106352A true JPS62106352A (ja) 1987-05-16
JPH0543080B2 JPH0543080B2 (enrdf_load_stackoverflow) 1993-06-30

Family

ID=17149462

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60246510A Granted JPS62106352A (ja) 1985-11-01 1985-11-01 走査型x線顕微鏡

Country Status (1)

Country Link
JP (1) JPS62106352A (enrdf_load_stackoverflow)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01141343A (ja) * 1987-11-27 1989-06-02 Hitachi Ltd X線分析装置及びx線分析方法
JPH01316683A (ja) * 1988-06-17 1989-12-21 Natl Inst For Res In Inorg Mater X線検出装置
JPH04204399A (ja) * 1990-11-30 1992-07-24 Seiko Instr Inc 軟x線集光器
WO2005026708A1 (ja) * 2003-09-10 2005-03-24 National Institute For Materials Science X線回折顕微鏡装置およびx線回折顕微鏡装置によるx線回折測定方法
JP2009505111A (ja) * 2005-08-22 2009-02-05 ユニサンティス ヨーロッパ ゲーエムベーハー X線レンズ位置決め装置、x線装置、およびx線レンズの位置決め方法
JP2009097937A (ja) * 2007-10-16 2009-05-07 Fujitsu Ltd 試料分析装置、試料分析方法および試料分析プログラム

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01141343A (ja) * 1987-11-27 1989-06-02 Hitachi Ltd X線分析装置及びx線分析方法
JPH01316683A (ja) * 1988-06-17 1989-12-21 Natl Inst For Res In Inorg Mater X線検出装置
JPH04204399A (ja) * 1990-11-30 1992-07-24 Seiko Instr Inc 軟x線集光器
WO2005026708A1 (ja) * 2003-09-10 2005-03-24 National Institute For Materials Science X線回折顕微鏡装置およびx線回折顕微鏡装置によるx線回折測定方法
JP2009505111A (ja) * 2005-08-22 2009-02-05 ユニサンティス ヨーロッパ ゲーエムベーハー X線レンズ位置決め装置、x線装置、およびx線レンズの位置決め方法
JP2009097937A (ja) * 2007-10-16 2009-05-07 Fujitsu Ltd 試料分析装置、試料分析方法および試料分析プログラム

Also Published As

Publication number Publication date
JPH0543080B2 (enrdf_load_stackoverflow) 1993-06-30

Similar Documents

Publication Publication Date Title
US11619596B2 (en) X-ray photoemission system for 3-D laminography
US6389101B1 (en) Parallel x-ray nanotomography
Rarback et al. Scanning x‐ray microscope with 75‐nm resolution
KR102003202B1 (ko) 결정학적 그레인 배향 맵핑 능력을 가진 실험실 x-레이 마이크로-단층촬영 시스템
US20100091947A1 (en) Differential Interference Phase Contrast X-ray Imaging System
JP2003043200A (ja) X線顕微鏡装置
JP2008268105A (ja) X線ビーム源、x線ビーム照射装置、x線ビーム透過撮影装置、x線ビームct装置、x線元素マッピング検査装置及びx線ビーム形成方法
JP2004144478A (ja) X線分析装置および方法
JP3850711B2 (ja) 放射線利用検査装置
JPH06258260A (ja) X線回折装置
JPS62106352A (ja) 走査型x線顕微鏡
JP5489412B2 (ja) 蛍光x線分析機能付き高分解能x線顕微装置
Shimomura et al. X-ray diffraction contrast of polycrystalline material, visualized by scanning X-ray analytical microscope
US6935778B2 (en) Methods and devices for aligning and determining the focusing characteristics of x-ray optics
Wu et al. Hot spot localization in the field of view of the Kirkpatrick–Baez microscope
Nixon X-ray microscopy
JPH11133200A (ja) X線走査顕微方法及び顕微鏡
JP4623879B2 (ja) ビームの評価方法および装置
Kenney et al. Soft X-ray microscopy at the NSLS
JP5759257B2 (ja) X線装置
Parish Microfocus X-Ray Technology—A Review of Developments and Application
JPH0675042B2 (ja) X線断層像撮影装置
CN108709898A (zh) 基于组合x射线毛细管的微束x射线荧光分析系统
JPH07243996A (ja) X線微小分析法
JPH0560702A (ja) X線を用いた断層像撮像方法及び装置

Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term