JPS6184030A - ゲ−トアレイマスタスライス集積回路装置 - Google Patents

ゲ−トアレイマスタスライス集積回路装置

Info

Publication number
JPS6184030A
JPS6184030A JP59205504A JP20550484A JPS6184030A JP S6184030 A JPS6184030 A JP S6184030A JP 59205504 A JP59205504 A JP 59205504A JP 20550484 A JP20550484 A JP 20550484A JP S6184030 A JPS6184030 A JP S6184030A
Authority
JP
Japan
Prior art keywords
wiring
basic
basic cell
cells
master slice
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59205504A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0531310B2 (en:Method
Inventor
Shigeru Fujii
藤井　滋
Yoshihisa Takayama
高山　良久
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP59205504A priority Critical patent/JPS6184030A/ja
Publication of JPS6184030A publication Critical patent/JPS6184030A/ja
Publication of JPH0531310B2 publication Critical patent/JPH0531310B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/90—Masterslice integrated circuits
    • H10D84/903—Masterslice integrated circuits comprising field effect technology

Landscapes

  • Semiconductor Integrated Circuits (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
  • Design And Manufacture Of Integrated Circuits (AREA)
JP59205504A 1984-10-02 1984-10-02 ゲ−トアレイマスタスライス集積回路装置 Granted JPS6184030A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59205504A JPS6184030A (ja) 1984-10-02 1984-10-02 ゲ−トアレイマスタスライス集積回路装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59205504A JPS6184030A (ja) 1984-10-02 1984-10-02 ゲ−トアレイマスタスライス集積回路装置

Publications (2)

Publication Number Publication Date
JPS6184030A true JPS6184030A (ja) 1986-04-28
JPH0531310B2 JPH0531310B2 (en:Method) 1993-05-12

Family

ID=16507953

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59205504A Granted JPS6184030A (ja) 1984-10-02 1984-10-02 ゲ−トアレイマスタスライス集積回路装置

Country Status (1)

Country Link
JP (1) JPS6184030A (en:Method)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62264641A (ja) * 1986-05-13 1987-11-17 株式会社東芝 ゲ−トアレイ素子の設計方法
US4910574A (en) * 1987-04-30 1990-03-20 Ibm Corporation Porous circuit macro for semiconductor integrated circuits

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5944859A (ja) * 1982-09-07 1984-03-13 Toshiba Corp 基本セル
JPS59163837A (ja) * 1983-03-09 1984-09-14 Toshiba Corp 半導体集積回路
JPS59163836A (ja) * 1983-03-09 1984-09-14 Toshiba Corp 半導体集積回路

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5944859A (ja) * 1982-09-07 1984-03-13 Toshiba Corp 基本セル
JPS59163837A (ja) * 1983-03-09 1984-09-14 Toshiba Corp 半導体集積回路
JPS59163836A (ja) * 1983-03-09 1984-09-14 Toshiba Corp 半導体集積回路

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62264641A (ja) * 1986-05-13 1987-11-17 株式会社東芝 ゲ−トアレイ素子の設計方法
US4910574A (en) * 1987-04-30 1990-03-20 Ibm Corporation Porous circuit macro for semiconductor integrated circuits

Also Published As

Publication number Publication date
JPH0531310B2 (en:Method) 1993-05-12

Similar Documents

Publication Publication Date Title
US5298774A (en) Gate array system semiconductor integrated circuit device
JPH0516188B2 (en:Method)
US4745307A (en) Semiconductor integrated circuit with a programmable logic array
JPS6184030A (ja) ゲ−トアレイマスタスライス集積回路装置
JPS59177944A (ja) 半導体集積回路装置
JPH1098108A (ja) 半導体装置
JPS586157A (ja) Ｃｍｏｓマスタ・スライスｌｓｉ
JPS6184847A (ja) ゲ−トアレイマスタスライス集積回路装置
JPH0122733B2 (en:Method)
JPS6017930A (ja) マスタ・スライス方式に於ける基本セル
JPS6074647A (ja) 半導体集積回路装置
JPS62263653A (ja) 半導体集積回路装置の製造方法
CA2074001C (en) Master slice lsi with fault detection circuitry
JPS6199349A (ja) ゲ−トアレイマスタスライス集積回路装置におけるクリツプ方法
JPH0562469B2 (en:Method)
JP2523709B2 (ja) 半導体集積回路の配線方法
JPH0563944B2 (en:Method)
JPH0534832B2 (en:Method)
KR920005798B1 (ko) 보더레스 마스터 슬라이스 반도체장치
JPS6199348A (ja) ゲ−トアレイマスタスライス集積回路装置におけるクリツプ方法
JP2634800B2 (ja) 半導体集積回路スタンダードセル
JP3236745B2 (ja) Ｌｓｉチップのレイアウト方法
JPH0575079A (ja) マスタースライス方式集積回路装置
JPH03109766A (ja) 半導体集積回路装置
JPS61125147A (ja) 半導体集積回路