JPS6163519A - モノシラン製造法 - Google Patents
モノシラン製造法Info
- Publication number
- JPS6163519A JPS6163519A JP18507984A JP18507984A JPS6163519A JP S6163519 A JPS6163519 A JP S6163519A JP 18507984 A JP18507984 A JP 18507984A JP 18507984 A JP18507984 A JP 18507984A JP S6163519 A JPS6163519 A JP S6163519A
- Authority
- JP
- Japan
- Prior art keywords
- trichlorosilane
- reaction
- monosilane
- silicon tetrachloride
- hydrogen
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 title claims abstract description 46
- 238000004519 manufacturing process Methods 0.000 title claims description 7
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 claims abstract description 81
- 239000005052 trichlorosilane Substances 0.000 claims abstract description 81
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 claims abstract description 55
- 239000005049 silicon tetrachloride Substances 0.000 claims abstract description 55
- 238000006243 chemical reaction Methods 0.000 claims abstract description 52
- 239000003054 catalyst Substances 0.000 claims abstract description 24
- 238000004821 distillation Methods 0.000 claims abstract description 24
- 239000001257 hydrogen Substances 0.000 claims abstract description 24
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 24
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims abstract description 22
- 150000001412 amines Chemical class 0.000 claims abstract description 4
- 238000007323 disproportionation reaction Methods 0.000 claims description 23
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 12
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 claims description 10
- 239000005046 Chlorosilane Substances 0.000 claims description 7
- 125000001931 aliphatic group Chemical group 0.000 claims description 4
- 238000001816 cooling Methods 0.000 claims description 4
- 239000000126 substance Substances 0.000 claims description 4
- 125000004432 carbon atom Chemical group C* 0.000 claims description 2
- 239000007795 chemical reaction product Substances 0.000 claims description 2
- 238000010791 quenching Methods 0.000 abstract description 6
- 230000000171 quenching effect Effects 0.000 abstract description 6
- FDNAPBUWERUEDA-UHFFFAOYSA-N silicon tetrachloride Chemical compound Cl[Si](Cl)(Cl)Cl FDNAPBUWERUEDA-UHFFFAOYSA-N 0.000 abstract description 6
- 230000000694 effects Effects 0.000 abstract description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 2
- 229910003910 SiCl4 Inorganic materials 0.000 abstract 5
- 229910003822 SiHCl3 Inorganic materials 0.000 abstract 5
- 238000009833 condensation Methods 0.000 abstract 1
- 230000005494 condensation Effects 0.000 abstract 1
- 150000002431 hydrogen Chemical class 0.000 abstract 1
- 239000006227 byproduct Substances 0.000 description 17
- 239000002994 raw material Substances 0.000 description 17
- 239000012495 reaction gas Substances 0.000 description 13
- 239000000203 mixture Substances 0.000 description 12
- 238000000034 method Methods 0.000 description 11
- 238000000926 separation method Methods 0.000 description 9
- ICSWLKDKQBNKAY-UHFFFAOYSA-N 1,1,3,3,5,5-hexamethyl-1,3,5-trisilinane Chemical compound C[Si]1(C)C[Si](C)(C)C[Si](C)(C)C1 ICSWLKDKQBNKAY-UHFFFAOYSA-N 0.000 description 8
- 239000007788 liquid Substances 0.000 description 8
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 7
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 7
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 6
- 239000007789 gas Substances 0.000 description 5
- 239000000047 product Substances 0.000 description 5
- 238000003786 synthesis reaction Methods 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 238000000066 reactive distillation Methods 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 230000018044 dehydration Effects 0.000 description 3
- 238000006297 dehydration reaction Methods 0.000 description 3
- 229910002804 graphite Inorganic materials 0.000 description 3
- 239000010439 graphite Substances 0.000 description 3
- 229910000077 silane Inorganic materials 0.000 description 3
- -1 silane compound Chemical class 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 238000000605 extraction Methods 0.000 description 2
- 150000003840 hydrochlorides Chemical class 0.000 description 2
- 239000012071 phase Substances 0.000 description 2
- 238000011084 recovery Methods 0.000 description 2
- 238000010992 reflux Methods 0.000 description 2
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 2
- 229910010271 silicon carbide Inorganic materials 0.000 description 2
- 239000007858 starting material Substances 0.000 description 2
- 239000013076 target substance Substances 0.000 description 2
- AVQQQNCBBIEMEU-UHFFFAOYSA-N 1,1,3,3-tetramethylurea Chemical compound CN(C)C(=O)N(C)C AVQQQNCBBIEMEU-UHFFFAOYSA-N 0.000 description 1
- KPZGRMZPZLOPBS-UHFFFAOYSA-N 1,3-dichloro-2,2-bis(chloromethyl)propane Chemical compound ClCC(CCl)(CCl)CCl KPZGRMZPZLOPBS-UHFFFAOYSA-N 0.000 description 1
- 229910002012 Aerosil® Inorganic materials 0.000 description 1
- UXVMQQNJUSDDNG-UHFFFAOYSA-L Calcium chloride Chemical compound [Cl-].[Cl-].[Ca+2] UXVMQQNJUSDDNG-UHFFFAOYSA-L 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 241001494479 Pecora Species 0.000 description 1
- 150000001450 anions Chemical class 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 239000001110 calcium chloride Substances 0.000 description 1
- 229910001628 calcium chloride Inorganic materials 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000003575 carbonaceous material Substances 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- MROCJMGDEKINLD-UHFFFAOYSA-N dichlorosilane Chemical compound Cl[SiH2]Cl MROCJMGDEKINLD-UHFFFAOYSA-N 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 210000003918 fraction a Anatomy 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- XTAZYLNFDRKIHJ-UHFFFAOYSA-N n,n-dioctyloctan-1-amine Chemical compound CCCCCCCCN(CCCCCCCC)CCCCCCCC XTAZYLNFDRKIHJ-UHFFFAOYSA-N 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 125000001453 quaternary ammonium group Chemical group 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000002210 silicon-based material Substances 0.000 description 1
- 235000011121 sodium hydroxide Nutrition 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Landscapes
- Silicon Compounds (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18507984A JPS6163519A (ja) | 1984-09-04 | 1984-09-04 | モノシラン製造法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18507984A JPS6163519A (ja) | 1984-09-04 | 1984-09-04 | モノシラン製造法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6163519A true JPS6163519A (ja) | 1986-04-01 |
| JPS643807B2 JPS643807B2 (en, 2012) | 1989-01-23 |
Family
ID=16164448
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18507984A Granted JPS6163519A (ja) | 1984-09-04 | 1984-09-04 | モノシラン製造法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6163519A (en, 2012) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2008146741A1 (ja) * | 2007-05-25 | 2008-12-04 | Mitsubishi Materials Corporation | トリクロロシランの製造方法と製造装置および多結晶シリコンの製造方法 |
| WO2010016116A1 (ja) * | 2008-08-06 | 2010-02-11 | 電気化学工業株式会社 | ハロゲン化水素、水素およびハロゲン化ケイ素を含む混合ガスから水素ガスを生産する方法、その水素ガスを用いたケイ素化合物の生産方法、およびその方法のためのプラント |
| WO2010050241A1 (ja) * | 2008-10-30 | 2010-05-06 | 三菱マテリアル株式会社 | トリクロロシランの製造方法および利用方法 |
| JP2010105865A (ja) * | 2008-10-30 | 2010-05-13 | Mitsubishi Materials Corp | トリクロロシランの製造方法および利用方法 |
| WO2010086996A1 (ja) * | 2009-01-30 | 2010-08-05 | 電気化学工業株式会社 | トリクロロシランの生産方法 |
| WO2010100750A1 (ja) * | 2009-03-06 | 2010-09-10 | 電気化学工業株式会社 | トリクロロシラン冷却塔およびそれを用いたトリクロロシラン製造方法 |
| JP2014516900A (ja) * | 2011-03-16 | 2014-07-17 | エボニック デグサ ゲーエムベーハー | オルガノクロロシランおよび四塩化ケイ素から含水素クロロシランに反応させるための反応器設計 |
-
1984
- 1984-09-04 JP JP18507984A patent/JPS6163519A/ja active Granted
Cited By (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009007240A (ja) * | 2007-05-25 | 2009-01-15 | Mitsubishi Materials Corp | トリクロロシランの製造方法と製造装置および多結晶シリコンの製造方法 |
| WO2008146741A1 (ja) * | 2007-05-25 | 2008-12-04 | Mitsubishi Materials Corporation | トリクロロシランの製造方法と製造装置および多結晶シリコンの製造方法 |
| US9994455B2 (en) | 2007-05-25 | 2018-06-12 | Mitsubishi Materials Corporation | Apparatus and method for manufacturing trichlorosilane and method for manufacturing polycrystalline silicon |
| EP2154110A4 (en) * | 2007-05-25 | 2015-07-15 | Mitsubishi Materials Corp | METHOD AND DEVICE FOR PREPARING TRICHLORSILANE AND METHOD FOR PRODUCING POLYCRYSTALLINE SILICON |
| WO2010016116A1 (ja) * | 2008-08-06 | 2010-02-11 | 電気化学工業株式会社 | ハロゲン化水素、水素およびハロゲン化ケイ素を含む混合ガスから水素ガスを生産する方法、その水素ガスを用いたケイ素化合物の生産方法、およびその方法のためのプラント |
| JP5566290B2 (ja) * | 2008-08-06 | 2014-08-06 | 電気化学工業株式会社 | ハロゲン化水素、水素およびハロゲン化ケイ素を含む混合ガスから水素ガスを生産する方法、その水素ガスを用いたケイ素化合物の生産方法、およびその方法のためのプラント |
| WO2010050241A1 (ja) * | 2008-10-30 | 2010-05-06 | 三菱マテリアル株式会社 | トリクロロシランの製造方法および利用方法 |
| JP2010105865A (ja) * | 2008-10-30 | 2010-05-13 | Mitsubishi Materials Corp | トリクロロシランの製造方法および利用方法 |
| US8168152B2 (en) | 2008-10-30 | 2012-05-01 | Mitsubishi Materials Corporation | Method for producing trichlorosilane and method for utilizing trichlorosilane |
| JP5580749B2 (ja) * | 2009-01-30 | 2014-08-27 | 電気化学工業株式会社 | トリクロロシランの生産方法 |
| WO2010086996A1 (ja) * | 2009-01-30 | 2010-08-05 | 電気化学工業株式会社 | トリクロロシランの生産方法 |
| WO2010100750A1 (ja) * | 2009-03-06 | 2010-09-10 | 電気化学工業株式会社 | トリクロロシラン冷却塔およびそれを用いたトリクロロシラン製造方法 |
| JP5374576B2 (ja) * | 2009-03-06 | 2013-12-25 | 電気化学工業株式会社 | トリクロロシラン冷却塔およびそれを用いたトリクロロシラン製造方法 |
| JP2014516900A (ja) * | 2011-03-16 | 2014-07-17 | エボニック デグサ ゲーエムベーハー | オルガノクロロシランおよび四塩化ケイ素から含水素クロロシランに反応させるための反応器設計 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS643807B2 (en, 2012) | 1989-01-23 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |