JPS6157907B2 - - Google Patents
Info
- Publication number
- JPS6157907B2 JPS6157907B2 JP13990682A JP13990682A JPS6157907B2 JP S6157907 B2 JPS6157907 B2 JP S6157907B2 JP 13990682 A JP13990682 A JP 13990682A JP 13990682 A JP13990682 A JP 13990682A JP S6157907 B2 JPS6157907 B2 JP S6157907B2
- Authority
- JP
- Japan
- Prior art keywords
- evaporation source
- crucible
- capsule
- evaporated
- evaporation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 230000008020 evaporation Effects 0.000 claims description 46
- 238000001704 evaporation Methods 0.000 claims description 46
- 239000000463 material Substances 0.000 claims description 17
- 239000000126 substance Substances 0.000 claims description 10
- 239000013307 optical fiber Substances 0.000 claims description 6
- 238000010438 heat treatment Methods 0.000 claims description 4
- 239000002775 capsule Substances 0.000 claims description 3
- 230000001678 irradiating effect Effects 0.000 claims 1
- 239000000758 substrate Substances 0.000 description 11
- 239000010408 film Substances 0.000 description 8
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 229910002804 graphite Inorganic materials 0.000 description 4
- 239000010439 graphite Substances 0.000 description 4
- 239000010453 quartz Substances 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 239000010409 thin film Substances 0.000 description 3
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 239000002699 waste material Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 241001071861 Lethrinus genivittatus Species 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000001151 other effect Effects 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 238000004781 supercooling Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13990682A JPS5931865A (ja) | 1982-08-13 | 1982-08-13 | カプセル型蒸発源 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13990682A JPS5931865A (ja) | 1982-08-13 | 1982-08-13 | カプセル型蒸発源 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5931865A JPS5931865A (ja) | 1984-02-21 |
JPS6157907B2 true JPS6157907B2 (enrdf_load_stackoverflow) | 1986-12-09 |
Family
ID=15256377
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13990682A Granted JPS5931865A (ja) | 1982-08-13 | 1982-08-13 | カプセル型蒸発源 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5931865A (enrdf_load_stackoverflow) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6396809U (enrdf_load_stackoverflow) * | 1986-12-12 | 1988-06-22 |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63137162A (ja) * | 1986-11-28 | 1988-06-09 | Mitsubishi Electric Corp | レ−ザ蒸着式多層膜形成装置 |
KR101358464B1 (ko) * | 2004-12-24 | 2014-02-05 | 후나 홀딩스 피티와이 엘티디 온 비해프 오브 에이치제이 패밀리 트러스트 | 바닷새 또는 거북이의 혼획 감소 장치 및 방법 |
DE502005004425D1 (de) * | 2005-12-07 | 2008-07-24 | Novaled Ag | Verfahren zum Abscheiden eines Aufdampfmaterials |
-
1982
- 1982-08-13 JP JP13990682A patent/JPS5931865A/ja active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6396809U (enrdf_load_stackoverflow) * | 1986-12-12 | 1988-06-22 |
Also Published As
Publication number | Publication date |
---|---|
JPS5931865A (ja) | 1984-02-21 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US5085166A (en) | Laser vapor deposition apparatus | |
US4101781A (en) | Stable fiber optic scintillative x-ray screen and method of production | |
JPH01785A (ja) | マスク半導体レ−ザ−の製造方法 | |
Abramova et al. | Photostimulated desorption of metal atoms from surfaces of transparent insulators | |
JPS6157907B2 (enrdf_load_stackoverflow) | ||
JPH11189472A (ja) | 窒化炭素の合成方法 | |
TWI877377B (zh) | 極紫外光光源裝置 | |
Graham | Properties of alkali metals adsorbed onto metal surfaces | |
JPH09298032A (ja) | 電子ビーム発生装置 | |
JPH0629160U (ja) | エキシマレーザ用ウインドウ | |
JPS62222058A (ja) | 透明導電膜の形成方法 | |
JPS6065792A (ja) | 分子線結晶成長装置 | |
US3124686A (en) | Goorissen | |
JPS5469953A (en) | Electron emission device | |
JPS6120032Y2 (enrdf_load_stackoverflow) | ||
JPH02179868A (ja) | 蒸着装置 | |
JP2558659B2 (ja) | 赤外線加熱単結晶製造装置 | |
SU964377A1 (ru) | Коллектор солнечной энергии | |
JPS63102310A (ja) | 単結晶薄膜の形成方法 | |
JPH0387360A (ja) | 真空蒸着装置 | |
JPS6132940A (ja) | 液体金属イオン源 | |
JPH0841629A (ja) | セルシャッターおよびその使用方法 | |
JP5653128B2 (ja) | レーザアブレーション装置 | |
JPS6266620A (ja) | 電子ビ−ム蒸着装置 | |
SU328259A1 (ru) | Сорбционно-ионный насос |