JPS6154217B2 - - Google Patents

Info

Publication number
JPS6154217B2
JPS6154217B2 JP16126178A JP16126178A JPS6154217B2 JP S6154217 B2 JPS6154217 B2 JP S6154217B2 JP 16126178 A JP16126178 A JP 16126178A JP 16126178 A JP16126178 A JP 16126178A JP S6154217 B2 JPS6154217 B2 JP S6154217B2
Authority
JP
Japan
Prior art keywords
silicone rubber
printing plate
weight
silicone
lithographic printing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP16126178A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5589842A (en
Inventor
Masaharu Kobayashi
Mitsuru Suezawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toray Industries Inc
Original Assignee
Toray Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toray Industries Inc filed Critical Toray Industries Inc
Priority to JP16126178A priority Critical patent/JPS5589842A/ja
Publication of JPS5589842A publication Critical patent/JPS5589842A/ja
Publication of JPS6154217B2 publication Critical patent/JPS6154217B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/075Silicon-containing compounds
    • G03F7/0752Silicon-containing compounds in non photosensitive layers or as additives, e.g. for dry lithography
JP16126178A 1978-12-28 1978-12-28 Retouching method for plate face of waterless lithographic printing plate Granted JPS5589842A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16126178A JPS5589842A (en) 1978-12-28 1978-12-28 Retouching method for plate face of waterless lithographic printing plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16126178A JPS5589842A (en) 1978-12-28 1978-12-28 Retouching method for plate face of waterless lithographic printing plate

Publications (2)

Publication Number Publication Date
JPS5589842A JPS5589842A (en) 1980-07-07
JPS6154217B2 true JPS6154217B2 (de) 1986-11-21

Family

ID=15731727

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16126178A Granted JPS5589842A (en) 1978-12-28 1978-12-28 Retouching method for plate face of waterless lithographic printing plate

Country Status (1)

Country Link
JP (1) JPS5589842A (de)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5855932A (ja) * 1981-09-30 1983-04-02 Toray Ind Inc 湿し水不要平版印刷版の後処理方法
JPS5882247A (ja) * 1981-11-11 1983-05-17 Toray Ind Inc 湿し水不要平版印刷版原板
JPS62299854A (ja) * 1986-06-18 1987-12-26 Fuji Photo Film Co Ltd 湿し水不要平版印刷版用版面修正液
JP2577616B2 (ja) * 1988-06-28 1997-02-05 コニカ株式会社 湿し水不要平版印刷版用版面修正液
JP2808218B2 (ja) * 1992-09-28 1998-10-08 富士写真フイルム株式会社 水なし平版印刷版の版面修正方法

Also Published As

Publication number Publication date
JPS5589842A (en) 1980-07-07

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