JPS6148569A - プラズマｃｖｄ装置 - Google Patents

プラズマｃｖｄ装置

Info

Publication number
JPS6148569A
JPS6148569A JP16733584A JP16733584A JPS6148569A JP S6148569 A JPS6148569 A JP S6148569A JP 16733584 A JP16733584 A JP 16733584A JP 16733584 A JP16733584 A JP 16733584A JP S6148569 A JPS6148569 A JP S6148569A
Authority
JP
Japan
Prior art keywords
substrate
reaction vessel
film
vessel
org
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16733584A
Other languages
English (en)
Japanese (ja)
Other versions
JPH058272B2 (enrdf_load_stackoverflow
Inventor
Toshihiko Yoshitomi
吉富　敏彦
Hiroshi Horiuchi
堀内　博視
Yoshiharu Sato
佳晴 佐藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Chemical Corp
Original Assignee
Mitsubishi Chemical Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Chemical Industries Ltd filed Critical Mitsubishi Chemical Industries Ltd
Priority to JP16733584A priority Critical patent/JPS6148569A/ja
Publication of JPS6148569A publication Critical patent/JPS6148569A/ja
Publication of JPH058272B2 publication Critical patent/JPH058272B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/503—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using DC or AC discharges

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical Vapour Deposition (AREA)
JP16733584A 1984-08-10 1984-08-10 プラズマｃｖｄ装置 Granted JPS6148569A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16733584A JPS6148569A (ja) 1984-08-10 1984-08-10 プラズマｃｖｄ装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16733584A JPS6148569A (ja) 1984-08-10 1984-08-10 プラズマｃｖｄ装置

Publications (2)

Publication Number Publication Date
JPS6148569A true JPS6148569A (ja) 1986-03-10
JPH058272B2 JPH058272B2 (enrdf_load_stackoverflow) 1993-02-01

Family

ID=15847823

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16733584A Granted JPS6148569A (ja) 1984-08-10 1984-08-10 プラズマｃｖｄ装置

Country Status (1)

Country Link
JP (1) JPS6148569A (enrdf_load_stackoverflow)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0211768A (ja) * 1988-06-30 1990-01-16 Ulvac Corp 真空用部材内部の真空接触面処理方法
JPH04112009U (ja) * 1991-02-08 1992-09-29 トヤマ産機株式会社 溶着装置
JP2006249532A (ja) * 2005-03-11 2006-09-21 Ulvac Japan Ltd 皮膜形成装置及び有機高分子皮膜の形成方法
KR100899965B1 (ko) 2000-12-29 2009-05-28 램 리써치 코포레이션 저오염의 플라즈마 챔버 부품 및 그 제조방법

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0211768A (ja) * 1988-06-30 1990-01-16 Ulvac Corp 真空用部材内部の真空接触面処理方法
JPH04112009U (ja) * 1991-02-08 1992-09-29 トヤマ産機株式会社 溶着装置
KR100899965B1 (ko) 2000-12-29 2009-05-28 램 리써치 코포레이션 저오염의 플라즈마 챔버 부품 및 그 제조방법
JP2006249532A (ja) * 2005-03-11 2006-09-21 Ulvac Japan Ltd 皮膜形成装置及び有機高分子皮膜の形成方法

Also Published As

Publication number Publication date
JPH058272B2 (enrdf_load_stackoverflow) 1993-02-01

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term