JPS6146068B2 - - Google Patents
Info
- Publication number
- JPS6146068B2 JPS6146068B2 JP54098370A JP9837079A JPS6146068B2 JP S6146068 B2 JPS6146068 B2 JP S6146068B2 JP 54098370 A JP54098370 A JP 54098370A JP 9837079 A JP9837079 A JP 9837079A JP S6146068 B2 JPS6146068 B2 JP S6146068B2
- Authority
- JP
- Japan
- Prior art keywords
- source
- semiconductor layer
- electrode
- gate electrode
- tft
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/67—Thin-film transistors [TFT]
- H10D30/6757—Thin-film transistors [TFT] characterised by the structure of the channel, e.g. transverse or longitudinal shape or doping profile
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/67—Thin-film transistors [TFT]
- H10D30/674—Thin-film transistors [TFT] characterised by the active materials
- H10D30/675—Group III-V materials, Group II-VI materials, Group IV-VI materials, selenium or tellurium
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
- H10D62/17—Semiconductor regions connected to electrodes not carrying current to be rectified, amplified or switched, e.g. channel regions
- H10D62/213—Channel regions of field-effect devices
- H10D62/221—Channel regions of field-effect devices of FETs
- H10D62/235—Channel regions of field-effect devices of FETs of IGFETs
Landscapes
- Non-Volatile Memory (AREA)
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9837079A JPS5623780A (en) | 1979-07-31 | 1979-07-31 | Manufacture of thin film transistor |
DE3028718A DE3028718C2 (de) | 1979-07-31 | 1980-07-29 | Dünnfilmtransistor in Verbindung mit einer Anzeigevorrichtung |
US06/173,818 US4404578A (en) | 1979-07-31 | 1980-07-30 | Structure of thin film transistors |
GB8025044A GB2056770B (en) | 1979-07-31 | 1980-07-31 | Thin film transistors |
GB08316195A GB2127216B (en) | 1979-07-31 | 1983-06-14 | Improved s of thin film transistors and manufacture method thereof |
GB08316196A GB2126779B (en) | 1979-07-31 | 1983-06-14 | Thin-film transistor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9837079A JPS5623780A (en) | 1979-07-31 | 1979-07-31 | Manufacture of thin film transistor |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5623780A JPS5623780A (en) | 1981-03-06 |
JPS6146068B2 true JPS6146068B2 (enrdf_load_stackoverflow) | 1986-10-11 |
Family
ID=14217985
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9837079A Granted JPS5623780A (en) | 1979-07-31 | 1979-07-31 | Manufacture of thin film transistor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5623780A (enrdf_load_stackoverflow) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5867066A (ja) * | 1981-10-16 | 1983-04-21 | Semiconductor Energy Lab Co Ltd | 絶緑ゲート型電界効果半導体装置の作製方法 |
JPS58134476A (ja) * | 1982-02-05 | 1983-08-10 | Mitsubishi Electric Corp | 薄膜トランジスタ |
JPS58190063A (ja) * | 1982-04-30 | 1983-11-05 | Seiko Epson Corp | 透過型液晶表示パネル用薄膜トランジスタ |
JPS61161764A (ja) * | 1985-01-11 | 1986-07-22 | Nec Corp | 薄膜トランジスタの製造方法 |
JPH0537117Y2 (enrdf_load_stackoverflow) * | 1985-12-12 | 1993-09-20 | ||
EP0225901B1 (fr) * | 1985-06-11 | 1989-12-20 | Institut Français du Pétrole | Canalisation utilisable notamment pour le transport de fluides et permettant de limiter la permeabilite aux fluides transportes |
JPS6298884U (enrdf_load_stackoverflow) * | 1985-12-12 | 1987-06-24 | ||
JP2554931B2 (ja) * | 1989-06-07 | 1996-11-20 | 川崎製鉄株式会社 | 積層スパイラル管 |
WO2019187070A1 (ja) * | 2018-03-30 | 2019-10-03 | シャープ株式会社 | トランジスタおよび表示装置 |
-
1979
- 1979-07-31 JP JP9837079A patent/JPS5623780A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS5623780A (en) | 1981-03-06 |
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