JPS6141445B2 - - Google Patents
Info
- Publication number
- JPS6141445B2 JPS6141445B2 JP12260678A JP12260678A JPS6141445B2 JP S6141445 B2 JPS6141445 B2 JP S6141445B2 JP 12260678 A JP12260678 A JP 12260678A JP 12260678 A JP12260678 A JP 12260678A JP S6141445 B2 JPS6141445 B2 JP S6141445B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- interdigital
- etching
- acoustic wave
- surface acoustic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000004519 manufacturing process Methods 0.000 claims description 13
- 238000000034 method Methods 0.000 claims description 12
- 229910052751 metal Inorganic materials 0.000 claims description 11
- 239000002184 metal Substances 0.000 claims description 11
- 239000000758 substrate Substances 0.000 claims description 8
- 238000010897 surface acoustic wave method Methods 0.000 claims description 8
- 238000005530 etching Methods 0.000 claims description 5
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical group [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 229910052804 chromium Inorganic materials 0.000 description 3
- 239000011651 chromium Substances 0.000 description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 238000003486 chemical etching Methods 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 238000005546 reactive sputtering Methods 0.000 description 1
- 238000000992 sputter etching Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/08—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of resonators or networks using surface acoustic waves
Landscapes
- Physics & Mathematics (AREA)
- Acoustics & Sound (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12260678A JPS5550717A (en) | 1978-10-06 | 1978-10-06 | Manufacture for surface acoustic wave filter |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12260678A JPS5550717A (en) | 1978-10-06 | 1978-10-06 | Manufacture for surface acoustic wave filter |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5550717A JPS5550717A (en) | 1980-04-12 |
JPS6141445B2 true JPS6141445B2 (enrdf_load_stackoverflow) | 1986-09-16 |
Family
ID=14840097
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12260678A Granted JPS5550717A (en) | 1978-10-06 | 1978-10-06 | Manufacture for surface acoustic wave filter |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5550717A (enrdf_load_stackoverflow) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57124912A (en) * | 1981-12-16 | 1982-08-04 | Hitachi Ltd | Manufacture for surface acoustic wave device |
JPS5920722U (ja) * | 1982-07-30 | 1984-02-08 | 株式会社東芝 | 弾性表面波デバイス |
JPS61284991A (ja) * | 1985-06-11 | 1986-12-15 | 電気化学工業株式会社 | アルミニウム/銅複合箔張基板の回路形成法 |
-
1978
- 1978-10-06 JP JP12260678A patent/JPS5550717A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS5550717A (en) | 1980-04-12 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US7112913B2 (en) | Surface acoustic wave apparatus and manufacturing method therefor | |
US6516503B1 (en) | Method of making surface acoustic wave device | |
US7665196B2 (en) | Method for forming a multi-frequency surface acoustic wave device | |
JP3189719B2 (ja) | 弾性表面波装置の製造方法 | |
JPS6141445B2 (enrdf_load_stackoverflow) | ||
JP3172124B2 (ja) | 弾性表面波装置およびその製造方法 | |
CN114124027A (zh) | 一种具有t型idt结构的saw滤波器及其制造方法 | |
JPH10190389A (ja) | Sawフィルタ及びその製造方法 | |
JPS6142891B2 (enrdf_load_stackoverflow) | ||
JPS5942965B2 (ja) | インタ−デイジタル構造のキヤパシタの製作方法 | |
JP3480626B2 (ja) | 弾性表面波素子の電極形成方法 | |
JPH0998043A (ja) | 弾性表面波デバイスおよびその製造方法 | |
JPH0316409A (ja) | 弾性表面波装置およびその製造方法 | |
JPH11312942A (ja) | 弾性表面波デバイスの製造方法 | |
JPH0421205A (ja) | 弾性表面波デバイスの製造方法 | |
JPS5855686B2 (ja) | 表面弾性波装置の製造方法 | |
JPH03272212A (ja) | 表面弾性波素子の製造方法 | |
JPH01103010A (ja) | 弾性表面波デバイスの製造方法 | |
JPS589414A (ja) | 弾性表面波すだれ状変換器の製造方法 | |
JPS626509A (ja) | 表面弾性波デバイスの製造方法 | |
GB2381976A (en) | Electrode pad construction and connection for surface acoustic wave apparatus | |
JPS6113705A (ja) | 表面弾性波素子の製造方法 | |
JPS62154911A (ja) | 弾性表面波デバイス製造方法 | |
JP2909930B2 (ja) | 圧電共振素子の製造方法 | |
JPS5847311A (ja) | 弾性表面波装置の製造方法 |