JPS6141229Y2 - - Google Patents
Info
- Publication number
- JPS6141229Y2 JPS6141229Y2 JP5193480U JP5193480U JPS6141229Y2 JP S6141229 Y2 JPS6141229 Y2 JP S6141229Y2 JP 5193480 U JP5193480 U JP 5193480U JP 5193480 U JP5193480 U JP 5193480U JP S6141229 Y2 JPS6141229 Y2 JP S6141229Y2
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- processing gas
- gas
- wafer container
- furnace body
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 235000012431 wafers Nutrition 0.000 claims description 48
- 238000009423 ventilation Methods 0.000 claims description 19
- 230000002093 peripheral effect Effects 0.000 claims description 5
- 239000011148 porous material Substances 0.000 claims 2
- 239000007789 gas Substances 0.000 description 34
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- 238000002347 injection Methods 0.000 description 5
- 239000007924 injection Substances 0.000 description 5
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000011295 pitch Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 229910000077 silane Inorganic materials 0.000 description 2
- 229910052814 silicon oxide Inorganic materials 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000012447 hatching Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
Landscapes
- Drying Of Semiconductors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5193480U JPS6141229Y2 (enrdf_load_stackoverflow) | 1980-04-18 | 1980-04-18 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5193480U JPS6141229Y2 (enrdf_load_stackoverflow) | 1980-04-18 | 1980-04-18 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS56155446U JPS56155446U (enrdf_load_stackoverflow) | 1981-11-20 |
JPS6141229Y2 true JPS6141229Y2 (enrdf_load_stackoverflow) | 1986-11-25 |
Family
ID=29646815
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5193480U Expired JPS6141229Y2 (enrdf_load_stackoverflow) | 1980-04-18 | 1980-04-18 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6141229Y2 (enrdf_load_stackoverflow) |
-
1980
- 1980-04-18 JP JP5193480U patent/JPS6141229Y2/ja not_active Expired
Also Published As
Publication number | Publication date |
---|---|
JPS56155446U (enrdf_load_stackoverflow) | 1981-11-20 |
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