JPS6138266B2 - - Google Patents

Info

Publication number
JPS6138266B2
JPS6138266B2 JP8550381A JP8550381A JPS6138266B2 JP S6138266 B2 JPS6138266 B2 JP S6138266B2 JP 8550381 A JP8550381 A JP 8550381A JP 8550381 A JP8550381 A JP 8550381A JP S6138266 B2 JPS6138266 B2 JP S6138266B2
Authority
JP
Japan
Prior art keywords
container
evaporation
sectional area
evaporation source
cross
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP8550381A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57200560A (en
Inventor
Teruo Yamamoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fuji Electric Co Ltd
Original Assignee
Fuji Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Electric Co Ltd filed Critical Fuji Electric Co Ltd
Priority to JP8550381A priority Critical patent/JPS57200560A/ja
Publication of JPS57200560A publication Critical patent/JPS57200560A/ja
Publication of JPS6138266B2 publication Critical patent/JPS6138266B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Physical Vapour Deposition (AREA)
JP8550381A 1981-06-03 1981-06-03 Vessel for source of vaporization for vacuum deposition Granted JPS57200560A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8550381A JPS57200560A (en) 1981-06-03 1981-06-03 Vessel for source of vaporization for vacuum deposition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8550381A JPS57200560A (en) 1981-06-03 1981-06-03 Vessel for source of vaporization for vacuum deposition

Publications (2)

Publication Number Publication Date
JPS57200560A JPS57200560A (en) 1982-12-08
JPS6138266B2 true JPS6138266B2 (enrdf_load_html_response) 1986-08-28

Family

ID=13860729

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8550381A Granted JPS57200560A (en) 1981-06-03 1981-06-03 Vessel for source of vaporization for vacuum deposition

Country Status (1)

Country Link
JP (1) JPS57200560A (enrdf_load_html_response)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0446008U (enrdf_load_html_response) * 1990-08-24 1992-04-20

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19735814A1 (de) * 1997-08-18 1999-02-25 Kempten Elektroschmelz Gmbh Keramische Flash-TV-Verdampfer
JP6570567B2 (ja) * 2017-03-10 2019-09-04 キヤノン株式会社 蒸着装置及び蒸着方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0446008U (enrdf_load_html_response) * 1990-08-24 1992-04-20

Also Published As

Publication number Publication date
JPS57200560A (en) 1982-12-08

Similar Documents

Publication Publication Date Title
JPS6138266B2 (enrdf_load_html_response)
US2453763A (en) Selenium rectifier and process for making same
US3984585A (en) Vacuum evaporation plating method
US4513031A (en) Process for forming alloy layer
JPH06299336A (ja) 真空蒸着用蒸発源のルツボ
GB1103211A (en) Improvements in and relating to vapour deposition and evaporation sources
JPH029107B2 (enrdf_load_html_response)
JPH0372152B2 (enrdf_load_html_response)
JPH07111585B2 (ja) 電子写真用感光体の真空蒸発源容器
JPS5944055A (ja) 感光体
JPS5967368A (ja) 蒸発源構造
US4011079A (en) Method for producing an electrophotographic recording material
JPS5943871A (ja) 蒸発材料収容器
JPS5943868A (ja) 蒸着方法
JPS6165254A (ja) 電子写真用セレン感光体の製造方法
JPH03290669A (ja) 電子写真用感光体の製造方法
JPS6116343B2 (enrdf_load_html_response)
DE2430653A1 (de) Verfahren und vorrichtung fuer vakuumverdampfung von lichtempfindlichem material und dgl
JPS63171866A (ja) 電子写真用感光体製造装置
JPS6338569A (ja) 真空蒸着用蒸発装置
JPS5943866A (ja) 蒸着方法
JPS5949550A (ja) 電子写真用感光体の製造方法
HU187919B (en) Method for making photoelectrically sensitive and conductive layer
KR20250073755A (ko) 박막 증착용 소스공급장치 및 이를 이용한 박막 증착 방법
SU659642A1 (ru) Испаритель дл нанесени сложных соединений материалов