JPS6138266B2 - - Google Patents

Info

Publication number
JPS6138266B2
JPS6138266B2 JP8550381A JP8550381A JPS6138266B2 JP S6138266 B2 JPS6138266 B2 JP S6138266B2 JP 8550381 A JP8550381 A JP 8550381A JP 8550381 A JP8550381 A JP 8550381A JP S6138266 B2 JPS6138266 B2 JP S6138266B2
Authority
JP
Japan
Prior art keywords
container
evaporation
sectional area
evaporation source
cross
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP8550381A
Other languages
Japanese (ja)
Other versions
JPS57200560A (en
Inventor
Teruo Yamamoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fuji Electric Co Ltd
Original Assignee
Fuji Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Electric Co Ltd filed Critical Fuji Electric Co Ltd
Priority to JP8550381A priority Critical patent/JPS57200560A/en
Publication of JPS57200560A publication Critical patent/JPS57200560A/en
Publication of JPS6138266B2 publication Critical patent/JPS6138266B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/243Crucibles for source material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Physical Vapour Deposition (AREA)

Description

【発明の詳細な説明】 本発明は電子写真用感光体の感光層の真空蒸着
の際に使用する蒸発源容器に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an evaporation source container used during vacuum deposition of a photosensitive layer of an electrophotographic photoreceptor.

電子写真用感光体は導電性基体の表面に、例え
ばセレン合金よりなる感光層を真空蒸着法により
被着したものである。しかし合金を蒸着する場合
には、蒸着の進行とともに蒸発源の合金の組成が
変化し、それに伴つて感光層の表面部分の組成も
変化するので、蒸着打切りの時点の若干の時間の
ずれにより感光体特性が大きく左右される。この
ため特性の安定した電子写真用感光体を得ること
が困難である。
An electrophotographic photoreceptor is one in which a photosensitive layer made of, for example, a selenium alloy is deposited on the surface of a conductive substrate by vacuum evaporation. However, when depositing an alloy, the composition of the alloy in the evaporation source changes as the deposition progresses, and the composition of the surface of the photosensitive layer changes accordingly. Body characteristics are greatly affected. For this reason, it is difficult to obtain an electrophotographic photoreceptor with stable characteristics.

本発明はこのような合金の蒸着に際しても安定
した特性の感光体が得られるような蒸発源容器を
提供することも目的とする。
Another object of the present invention is to provide an evaporation source container that can provide a photoreceptor with stable characteristics even when such an alloy is vapor-deposited.

この目的は容器が開口部側から底部側にかけて
水平断面積がほぼ一定の深さ部分と該部分に続い
て次第に前記断面積が減少する部分とからなるこ
とによつてそのような蒸発源容器を用いて蒸着を
行えば、蒸発面積の減少に伴ない蒸発速度が低下
する。従つて蒸着時間の変動の感光体特性に及ぼ
す影響が弱くなり、感光体特性が安定する。
This purpose is to improve such an evaporation source container by making the container consist of a depth portion where the horizontal cross-sectional area is approximately constant from the opening side to the bottom side, and a portion where the cross-sectional area gradually decreases following the depth portion. If the evaporation area is reduced, the evaporation rate will decrease as the evaporation area decreases. Therefore, the influence of variations in vapor deposition time on the photoreceptor characteristics is weakened, and the photoreceptor characteristics are stabilized.

以下図面を引用して本発明の実施例についてそ
の効果を説明する。
The effects of embodiments of the present invention will be described below with reference to the drawings.

第1図は蒸発源全体を示し、本発明による蒸発
源容器1は開口部側は平行な壁を持ち底部側では
三角形の鉛直断面を持つボート状で水平断面積が
下にいくにつれて次第に減少している。この容器
1の中に符号2で示す蒸着材料であるテルル5%
のセレン−テルル合金1000gを充填し、上部に開
口を有する保温カバー3内に配置し、ヒーター4
に通電して蒸着材料2を320℃に加熱して蒸発さ
せた。被蒸着基体として60℃に加熱したアルミニ
ウム管を使用し、蒸着時間を5分から30分までの
5分おきに設定して蒸着試験を行い、各蒸着時間
に対する蒸発量を測定して算出した蒸発速度を第
2図に線21として示す。比較のために第3図に
示す開口部側から底部まで等断面積を有する従来
の箱形ボート状容器5によつて行つた結果を破線
22として示す。また、容器1および5を用い蒸
着時間20分の条件においてそれぞれ連続10回の蒸
着を行い、得られた感光体の半減衰露光量を測定
した結果、容器1を用いたものは半減衰露光量の
ばらつきの範囲が0.4 lx・secであるのに対し、
従来の容器5を用いたものはその範囲が1.2 lx・
secであり、本発明による容器により大幅の特性
の安定化が得られることが判つた。すなわち、第
2図に示すような蒸着後半における蒸着速度の減
少により、蒸着打切りの時期のばらつきが特性に
大きな影響を与えないことが立証された。
FIG. 1 shows the entire evaporation source, and the evaporation source container 1 according to the present invention has a boat-like shape with parallel walls on the opening side and a triangular vertical cross section on the bottom side, and the horizontal cross-sectional area gradually decreases as it goes downward. ing. In this container 1, there is 5% tellurium, which is a vapor deposition material indicated by reference numeral 2.
filled with 1000 g of selenium-tellurium alloy, placed inside the heat insulation cover 3 having an opening at the top, and placed in the heater 4.
The vapor deposition material 2 was heated to 320° C. and evaporated. The evaporation rate was calculated by conducting a evaporation test using an aluminum tube heated to 60℃ as the substrate to be evaporated, setting the evaporation time every 5 minutes from 5 to 30 minutes, and measuring the amount of evaporation for each evaporation time. is shown as line 21 in FIG. For comparison, the results obtained using a conventional box-shaped boat-shaped container 5 having a uniform cross-sectional area from the opening side to the bottom shown in FIG. 3 are shown as a broken line 22. In addition, as a result of conducting 10 consecutive evaporations using Containers 1 and 5 under conditions of 20 minutes of evaporation time and measuring the half-attenuation exposure of the resulting photoreceptor, it was found that the half-attenuation exposure when using Container 1 was While the range of variation in is 0.4 lx・sec,
The range of the conventional container 5 is 1.2 lx・
sec, and it was found that the container according to the invention provides a significant stabilization of properties. That is, the decrease in the deposition rate in the latter half of the deposition as shown in FIG. 2 proves that variations in the timing of stopping the deposition do not have a large effect on the characteristics.

以上述べたように、本発明の蒸発源容器は、蒸
気圧の異なる複数の元素からなる合金を蒸発させ
るための容器を、開口部側から底部側にかけて水
平断面積がほぼ一定の深さ部分と、該部分に続い
て次第に前記断面積が減少する部分とからなる構
成とし、従来の箱形容器による場合と異なり蒸着
の進行に伴なつて蒸着速度を減少するように制御
することができるので、蒸着打切り時点のずれに
よる感光体特性のばらつきを従来の1/3以下に抑
えることができ、特性の安定した電子写真用感光
体の供給に対して極めて有効に使用されるもので
ある。
As described above, the evaporation source container of the present invention is a container for evaporating an alloy made of a plurality of elements having different vapor pressures, and has a depth portion whose horizontal cross-sectional area is approximately constant from the opening side to the bottom side. , and a part where the cross-sectional area gradually decreases following the part, and unlike the case of a conventional box-shaped container, the deposition rate can be controlled to decrease as the deposition progresses, It is possible to suppress variations in photoreceptor characteristics due to deviations in the point at which vapor deposition is stopped to less than 1/3 of that of conventional methods, and it is extremely effectively used for supplying photoreceptors for electrophotography with stable characteristics.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明による容器の一実施例を用いた
蒸発源の図式的断面図、第2図は蒸発速度と時間
の関係線図、第3図は従来の蒸発源容器の図式的
断面図。 1,11,12,13:蒸発源容器。
FIG. 1 is a schematic sectional view of an evaporation source using an embodiment of the container according to the present invention, FIG. 2 is a diagram showing the relationship between evaporation rate and time, and FIG. 3 is a schematic sectional view of a conventional evaporation source container. . 1, 11, 12, 13: Evaporation source container.

Claims (1)

【特許請求の範囲】[Claims] 1 蒸気圧の異なる複数の元素からなる合金を蒸
発させるための容器が開口部側から底部側にかけ
て水平断面積がほぼ一定の深さ部分と該部分に続
いて次第に前記断面積が減少する部分とからなる
ことを特徴とする真空蒸着用蒸発源容器。
1. A container for evaporating an alloy consisting of multiple elements having different vapor pressures has a depth portion where the horizontal cross-sectional area is approximately constant from the opening side to the bottom side, and a portion where the cross-sectional area gradually decreases following the depth portion. An evaporation source container for vacuum evaporation, characterized by comprising:
JP8550381A 1981-06-03 1981-06-03 Vessel for source of vaporization for vacuum deposition Granted JPS57200560A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8550381A JPS57200560A (en) 1981-06-03 1981-06-03 Vessel for source of vaporization for vacuum deposition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8550381A JPS57200560A (en) 1981-06-03 1981-06-03 Vessel for source of vaporization for vacuum deposition

Publications (2)

Publication Number Publication Date
JPS57200560A JPS57200560A (en) 1982-12-08
JPS6138266B2 true JPS6138266B2 (en) 1986-08-28

Family

ID=13860729

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8550381A Granted JPS57200560A (en) 1981-06-03 1981-06-03 Vessel for source of vaporization for vacuum deposition

Country Status (1)

Country Link
JP (1) JPS57200560A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0446008U (en) * 1990-08-24 1992-04-20
JPH0442253Y2 (en) * 1986-09-29 1992-10-06

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19735814A1 (en) * 1997-08-18 1999-02-25 Kempten Elektroschmelz Gmbh Ceramic flash TV evaporator
JP6570567B2 (en) * 2017-03-10 2019-09-04 キヤノン株式会社 Vapor deposition apparatus and vapor deposition method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0442253Y2 (en) * 1986-09-29 1992-10-06
JPH0446008U (en) * 1990-08-24 1992-04-20

Also Published As

Publication number Publication date
JPS57200560A (en) 1982-12-08

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