JPS62160460A - Vaporization source for vacuum vapor deposition - Google Patents
Vaporization source for vacuum vapor depositionInfo
- Publication number
- JPS62160460A JPS62160460A JP158186A JP158186A JPS62160460A JP S62160460 A JPS62160460 A JP S62160460A JP 158186 A JP158186 A JP 158186A JP 158186 A JP158186 A JP 158186A JP S62160460 A JPS62160460 A JP S62160460A
- Authority
- JP
- Japan
- Prior art keywords
- vapor
- heat
- temperature
- evaporation
- variance
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/02—Charge-receiving layers
- G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
- G03G5/08—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic
- G03G5/082—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic and not being incorporated in a bonding material, e.g. vacuum deposited
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
Abstract
Description
【発明の詳細な説明】
〔発明の属する技術5)野〕
本発明はセレンあるいはセレン合金のような光導電性材
料を基体上に真空頑塘しで電子写真用感光体を製造する
際に用いる真空蒸着用蒸発源に関する。[Detailed Description of the Invention] [Field 5) to which the invention pertains] The present invention is a method for manufacturing an electrophotographic photoreceptor by vacuum solidifying a photoconductive material such as selenium or a selenium alloy onto a substrate. Regarding evaporation sources for vacuum evaporation.
電子写真用感光体の感光層をに空蒸普により形成する一
般的な方法は、第3図に示すように、K空槽1内の圧力
をIPa以下の高真空に保ち、陣状の支持軸2に円筒状
基体3を装着して回転させながら、下方にある蒸発源4
に蒸着材料5を入れてヒータで加熱して蒸発させ基体3
上に感光層を形成する。その際、生産効率をあげるため
に支持軸2はできるだけ長くして一度に多数個の基体を
装着できるようKL、それにともなって蒸発源4も対応
して長くしているのが通例である。A general method for forming the photosensitive layer of an electrophotographic photoreceptor by vacuum vaporization is as shown in FIG. The cylindrical base 3 is attached to the shaft 2 and while rotating, the evaporation source 4 located below is
The vapor deposition material 5 is put into the substrate 3 and heated with a heater to evaporate it.
A photosensitive layer is formed on top. At this time, in order to increase production efficiency, it is customary to make the support shaft 2 as long as possible so that a large number of substrates can be attached at once, and the evaporation source 4 to be correspondingly long.
第4図は一般的な蒸発源の概念的横断面図であり、第5
図は第4図のc−cWIT面図である。蒸発源は二重構
造となっており、蒸着材料を収容する内部容器7と、蒸
着材料を加熱蒸発されるヒータ10と、これら内部容器
7とヒータ10を包囲し蒸発した材料の蒸気の流れを制
御しながら多数個の基体く向ってその長さに対応する長
さの蒸気噴出口(スリット)8から均一に噴出するよう
にした外部容器9とから構成される。このような蒸発源
を用い感光層を形成した場合、膜厚のばらつきはスリッ
ト8の形状を考慮することによシかなり低減することが
できる。Figure 4 is a conceptual cross-sectional view of a general evaporation source;
The figure is a c-cWIT plane view of FIG. 4. The evaporation source has a double structure: an inner container 7 that houses the evaporation material, a heater 10 that heats and evaporates the evaporation material, and a heater 10 that surrounds the inner container 7 and the heater 10 to direct the flow of vapor of the evaporated material. It is composed of an outer container 9 in which steam is uniformly spouted toward a large number of substrates from a spout (slit) 8 having a length corresponding to the length of the substrates in a controlled manner. When a photosensitive layer is formed using such an evaporation source, variations in film thickness can be significantly reduced by considering the shape of the slits 8.
一方、感光体の重要な電子写jlc%性の一つである光
感度は蒸着材料の蒸発!1度に大きく依存する。On the other hand, the photosensitivity, which is one of the important electrophotographic properties of a photoreceptor, is due to the evaporation of the deposited material! It depends a lot on once.
特にセレン・テルル系合金やセレン・ひ素糸合金などを
光導電性材料として用いる場合にはテルルやひ素のドー
プ量によプ光感度を制御しているが、これらの合金材料
は蒸発時分留しやすく蒸発温度により分留の度合が異な
るので蒸発温度のばらつきがあると光感度がばらつくこ
とになる。内部容器7が長い場合は周辺部の温度が中央
に比べて低くなるなどどうしても温度ばらつきが大きく
なり易いので光感度がばらつき易くなる。そこでこの問
題を回避するためにヒーターlOの長さはそのままにし
て内部容557の長さを第5図の二点鎖線で示したよう
に長さAから長さBの容器71にまで短かくしたとして
、外部容器9の中央’l K a ltすることにより
蒸着材料の蒸発面における温度ばらつきを低減すること
が試みられたが、この場合蒸発面での温度ばらつきは域
少したが、蒸発した蒸気が噴出するスリット8における
温度ばらつきは、ヒーター10の熱を吸収する部分が蒸
発熱による熱吸収がおきる中央部だけになることにより
、むしろばらつきが大きくなってしまい、光感度のばら
つきは低減できなかった。In particular, when selenium-tellurium alloys or selenium-arsenic thread alloys are used as photoconductive materials, the photosensitivity is controlled by the amount of tellurium or arsenic doped. Since the degree of fractional distillation varies depending on the evaporation temperature, variations in the evaporation temperature will cause variations in photosensitivity. If the inner container 7 is long, the temperature at the periphery will be lower than the center, and the temperature will tend to vary widely, making the photosensitivity more likely to vary. Therefore, in order to avoid this problem, the length of the inner content 557 is shortened from length A to length B of the container 71, as shown by the two-dot chain line in FIG. Therefore, an attempt was made to reduce the temperature variation on the evaporation surface of the evaporation material by placing the evaporation material in the center of the outer container 9. However, in this case, the temperature variation on the evaporation surface was reduced, but the evaporation The temperature variation in the slit 8 from which the steam spouts becomes larger because the only part of the heater 10 that absorbs heat is the central part where heat absorption due to the heat of evaporation occurs, and the variation in photosensitivity cannot be reduced. There wasn't.
本発明は上述の点に鑑みてなされたもので、蒸発源の外
部容器の蒸気噴出口の部分の温度ばらつきを低減して膜
厚均一でしかも光感度のばらつきの少ない感光層を形成
することのできる真空蒸着用蒸発源を提供することを目
的とする。The present invention has been made in view of the above-mentioned points, and is an object of the present invention to reduce temperature variations at the vapor jet port of an external container of an evaporation source, and to form a photosensitive layer with a uniform film thickness and less variation in photosensitivity. The purpose is to provide an evaporation source for vacuum evaporation that can be used.
本発明の目的は、真空蒸着用蒸発源の内部容器と加熱体
とを包囲する外部容器の蒸気噴出口近傍((ヒートパイ
プを取りつけることによって達成される。The object of the present invention is achieved by attaching a heat pipe near the steam outlet of the outer container surrounding the inner container and heating element of the evaporation source for vacuum evaporation.
第1図は本発明の一実施例の蒸発源の横断面図であり、
第2図は同上面図である。外部容器11の内部に内部容
器12と加熱体13が配置されておシ、外部容器11の
上部のスリット状蒸気噴出口の両側に蒸気噴出口の長手
方向に平行にヒートパイプ15が対向して溶接されてい
る。FIG. 1 is a cross-sectional view of an evaporation source according to an embodiment of the present invention,
FIG. 2 is a top view of the same. An inner container 12 and a heating element 13 are arranged inside the outer container 11, and heat pipes 15 are arranged on both sides of the slit-shaped steam outlet at the upper part of the outer container 11 in parallel with the longitudinal direction of the steam outlet. Welded.
4このような真空蒸着源を用い、内部容器12に蒸着材
料を充填し加熱体13で加熱して蒸発させると蒸気噴出
口14から蒸着材料の蒸気が噴出する。このとき、蒸気
噴出口の両側にヒートパイプが取り付けられているため
に1加熱体13からの熱のばらつきや外部容器11の設
置条件その他の外部要因な゛どにより温度ばらつきが生
じた場合、ヒートパイ 。4 Using such a vacuum evaporation source, when the inner container 12 is filled with a evaporation material and the material is heated and evaporated by the heating element 13, the vapor of the evaporation material is ejected from the steam outlet 14. At this time, because heat pipes are attached to both sides of the steam outlet, if temperature variations occur due to variations in heat from the first heating element 13, installation conditions of the outer container 11, or other external factors, the heat pipes may .
プ15の優れた熱輸送能によシ温度ばらつきは迅速に緩
和され解消されろうまた、蒸着材料が蒸発するときに蒸
気に生じた温度ばらつきも蒸気と外部容器、特にヒート
パイプ15の取り付けられた蒸気噴出口14の近傍との
熱の授受によって低減することができる。Due to the excellent heat transport ability of the heat pipe 15, temperature fluctuations will be quickly alleviated and eliminated.Also, temperature fluctuations caused in the steam when the deposition material is evaporated can be reduced by connecting the steam and the external container, especially the heat pipe 15 attached. This can be reduced by transferring heat to and from the vicinity of the steam outlet 14.
かくシて、セレン・テルル系合金、セレン・ひ素糸合金
のような分留を起こしやすい材料の場合にも1度ばらつ
きの少ない均質な蒸気が蒸気噴出口より噴出されること
になり、膜厚均一で光感度特性などにもばらつきの少な
い感光層が得られ優れた電子写真感光体の製造が可能と
なる。In this way, even in the case of materials that are prone to fractional distillation, such as selenium-tellurium alloys and selenium-arsenic thread alloys, homogeneous steam with little variation is ejected from the steam outlet, and the film thickness can be reduced. A uniform photosensitive layer with little variation in photosensitivity and the like can be obtained, making it possible to manufacture an excellent electrophotographic photoreceptor.
〔発明の効果1
$発明は、真空蒸着用蒸発源の外部容器の蒸気噴出口の
両側にヒートパイプを改り付けることKよ)蒸気温度の
均一化を図るもので、これにより蒸気成分の均質化が可
能となり、特にセレン系材料の蒸着膜を形成し利用する
電子写真用感光体の製造には極めて有効である。[Effect of the invention 1 The invention is to make the steam temperature uniform by installing heat pipes on both sides of the steam outlet of the external container of the evaporation source for vacuum evaporation, thereby making the steam components homogeneous. This method is particularly effective in manufacturing electrophotographic photoreceptors in which a vapor-deposited film of a selenium-based material is formed and utilized.
第1図は本発明の一実施例の蒸発源の横断面図、第2図
はその上面図、第3図は真空蒸着槽の横断面図、第4図
は従来の一例の蒸発源の横断面図、第5図は第4図のC
−C断面図である。
11・・・外部容器、12・・・内部容器、13・・・
加熱体、14・・・蒸気噴出口、15・・・ヒートパイ
プ。
、′
v 1図
第3図
−c
第4図Fig. 1 is a cross-sectional view of an evaporation source according to an embodiment of the present invention, Fig. 2 is a top view thereof, Fig. 3 is a cross-sectional view of a vacuum evaporation tank, and Fig. 4 is a cross-sectional view of an evaporation source of a conventional example. Top view, Figure 5 is C of Figure 4
-C sectional view. 11...Outer container, 12...Inner container, 13...
Heating body, 14... Steam spout, 15... Heat pipe. ,' v 1 Figure 3-c Figure 4
Claims (1)
外部容器の蒸気噴出口近傍にヒートパイプが取り付けら
れたことを特徴とする真空蒸着用蒸発源。1) An evaporation source for vacuum evaporation, characterized in that a heat pipe is attached near the steam outlet of an outer container that surrounds an inner container that accommodates an evaporation material and a heating element.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP158186A JPS62160460A (en) | 1986-01-08 | 1986-01-08 | Vaporization source for vacuum vapor deposition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP158186A JPS62160460A (en) | 1986-01-08 | 1986-01-08 | Vaporization source for vacuum vapor deposition |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS62160460A true JPS62160460A (en) | 1987-07-16 |
Family
ID=11505480
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP158186A Pending JPS62160460A (en) | 1986-01-08 | 1986-01-08 | Vaporization source for vacuum vapor deposition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS62160460A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100929035B1 (en) | 2007-08-23 | 2009-11-26 | 삼성모바일디스플레이주식회사 | Heating vessel and deposition apparatus equipped with the same |
JP2013076120A (en) * | 2011-09-30 | 2013-04-25 | Hitachi High-Technologies Corp | Evaporation source and film forming apparatus |
-
1986
- 1986-01-08 JP JP158186A patent/JPS62160460A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100929035B1 (en) | 2007-08-23 | 2009-11-26 | 삼성모바일디스플레이주식회사 | Heating vessel and deposition apparatus equipped with the same |
US8075693B2 (en) | 2007-08-23 | 2011-12-13 | Samsung Mobile Display Co., Ltd. | Crucible heating apparatus and deposition apparatus including the same |
JP2013076120A (en) * | 2011-09-30 | 2013-04-25 | Hitachi High-Technologies Corp | Evaporation source and film forming apparatus |
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