JPS6136372B2 - - Google Patents
Info
- Publication number
- JPS6136372B2 JPS6136372B2 JP11249478A JP11249478A JPS6136372B2 JP S6136372 B2 JPS6136372 B2 JP S6136372B2 JP 11249478 A JP11249478 A JP 11249478A JP 11249478 A JP11249478 A JP 11249478A JP S6136372 B2 JPS6136372 B2 JP S6136372B2
- Authority
- JP
- Japan
- Prior art keywords
- tube
- liner
- reaction
- reaction tube
- gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11249478A JPS5539630A (en) | 1978-09-13 | 1978-09-13 | Vapor phase growth device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11249478A JPS5539630A (en) | 1978-09-13 | 1978-09-13 | Vapor phase growth device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5539630A JPS5539630A (en) | 1980-03-19 |
JPS6136372B2 true JPS6136372B2 (enrdf_load_stackoverflow) | 1986-08-18 |
Family
ID=14588043
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11249478A Granted JPS5539630A (en) | 1978-09-13 | 1978-09-13 | Vapor phase growth device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5539630A (enrdf_load_stackoverflow) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106824935A (zh) * | 2016-12-08 | 2017-06-13 | 尚涛 | 一种气相色谱玻璃衬管的清洗方法 |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6221005Y2 (enrdf_load_stackoverflow) * | 1980-12-19 | 1987-05-28 | ||
JPS58181796A (ja) * | 1982-04-19 | 1983-10-24 | Matsushita Electric Ind Co Ltd | 結晶成長方法 |
JPS6167915A (ja) * | 1984-09-12 | 1986-04-08 | Hitachi Tokyo Electronics Co Ltd | プラズマcvd装置 |
JPH04180619A (ja) * | 1990-11-15 | 1992-06-26 | Nec Yamagata Ltd | 半導体製造用横形反応炉 |
JP4734950B2 (ja) * | 2005-02-17 | 2011-07-27 | 株式会社デンソー | 熱処理装置 |
JP2009527877A (ja) | 2006-02-23 | 2009-07-30 | シーメンス アクチエンゲゼルシヤフト | パワー半導体モジュールの短絡装置 |
-
1978
- 1978-09-13 JP JP11249478A patent/JPS5539630A/ja active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106824935A (zh) * | 2016-12-08 | 2017-06-13 | 尚涛 | 一种气相色谱玻璃衬管的清洗方法 |
Also Published As
Publication number | Publication date |
---|---|
JPS5539630A (en) | 1980-03-19 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS63119226A (ja) | 化学蒸着システム | |
JPS6136372B2 (enrdf_load_stackoverflow) | ||
JPS63316425A (ja) | 半導体装置の製造装置 | |
JPS5927611B2 (ja) | 気相成長方法 | |
JPS62128518A (ja) | 気相成長装置 | |
JPS6122619A (ja) | 気相エピタキシヤル成長装置 | |
JPS6226171B2 (enrdf_load_stackoverflow) | ||
JPS58176196A (ja) | 化合物結晶成長装置 | |
JP2656029B2 (ja) | 結晶成長装置 | |
JPS6344988Y2 (enrdf_load_stackoverflow) | ||
JPS62182196A (ja) | 気相成長装置 | |
JPS60109218A (ja) | 分子線エピタキシャル成長装置 | |
JPH0388325A (ja) | 気相成長装置 | |
JPS63202909A (ja) | 気相成長方法 | |
JPS60109222A (ja) | 3−v族化合物半導体の気相成長装置 | |
JPS62230693A (ja) | 気相成長装置 | |
JPS6169115A (ja) | 気相エピタキシヤル成長方法 | |
JPH0794428A (ja) | 半導体薄膜気相成長装置 | |
JPH0244800B2 (ja) | Tanketsushoseichosochi | |
JPH0415913A (ja) | 有機金属気相成長法とそれに用いるサセプタ | |
JPH01218010A (ja) | 気相成長装置並びにそのリアクタのクリーニング方法及び気相成長方法 | |
JPS6025227A (ja) | 化合物半導体気相成長装置 | |
JPS61229320A (ja) | 気相成長装置 | |
JPS6131394A (ja) | 気相成長方法 | |
JPS62189727A (ja) | 有機金属熱分解気相成長装置 |