JPS61286211A - クロロシランの製造法 - Google Patents
クロロシランの製造法Info
- Publication number
- JPS61286211A JPS61286211A JP61124749A JP12474986A JPS61286211A JP S61286211 A JPS61286211 A JP S61286211A JP 61124749 A JP61124749 A JP 61124749A JP 12474986 A JP12474986 A JP 12474986A JP S61286211 A JPS61286211 A JP S61286211A
- Authority
- JP
- Japan
- Prior art keywords
- silicon
- reaction
- oxygen source
- hydrogen chloride
- trichlorosilane
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/08—Compounds containing halogen
- C01B33/107—Halogenated silanes
- C01B33/1071—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof
- C01B33/10742—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by hydrochlorination of silicon or of a silicon-containing material
- C01B33/10757—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by hydrochlorination of silicon or of a silicon-containing material with the preferential formation of trichlorosilane
- C01B33/10763—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by hydrochlorination of silicon or of a silicon-containing material with the preferential formation of trichlorosilane from silicon
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/08—Compounds containing halogen
- C01B33/107—Halogenated silanes
- C01B33/1071—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof
- C01B33/10742—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by hydrochlorination of silicon or of a silicon-containing material
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Silicon Compounds (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US06/739,681 US4585643A (en) | 1985-05-31 | 1985-05-31 | Process for preparing chlorosilanes from silicon and hydrogen chloride using an oxygen promoter |
US739681 | 1985-05-31 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS61286211A true JPS61286211A (ja) | 1986-12-16 |
Family
ID=24973356
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP61124749A Pending JPS61286211A (ja) | 1985-05-31 | 1986-05-31 | クロロシランの製造法 |
Country Status (4)
Country | Link |
---|---|
US (1) | US4585643A (de) |
EP (1) | EP0203610A3 (de) |
JP (1) | JPS61286211A (de) |
CA (1) | CA1238472A (de) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20200045555A (ko) * | 2017-10-05 | 2020-05-04 | 와커 헤미 아게 | 클로로실란의 제조 방법 |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63233007A (ja) * | 1987-03-23 | 1988-09-28 | Mitsubishi Metal Corp | クロロポリシランの製造方法 |
US5176892A (en) * | 1990-12-06 | 1993-01-05 | Dow Corning Corporation | Supported metal catalyzed production of tetrachlorosilane |
US5160720A (en) * | 1990-12-12 | 1992-11-03 | Dow Corning Corporation | Metal catalyzed production of tetrachlorosilane |
US5401872A (en) * | 1994-03-07 | 1995-03-28 | Hemlock Semiconductor | Treatment of vent gas to remove hydrogen chloride |
US5798137A (en) | 1995-06-07 | 1998-08-25 | Advanced Silicon Materials, Inc. | Method for silicon deposition |
US5871705A (en) * | 1996-09-19 | 1999-02-16 | Tokuyama Corporation | Process for producing trichlorosilane |
DE10049963B4 (de) * | 2000-10-10 | 2009-04-09 | Evonik Degussa Gmbh | Verfahren zur Herstellung von Trichlorsilan |
NO321276B1 (no) * | 2003-07-07 | 2006-04-18 | Elkem Materials | Fremgangsmate for fremstilling av triklorsilan og silisium for bruk ved fremstilling av triklorsilan |
DE102008017304A1 (de) * | 2008-03-31 | 2009-10-01 | Schmid Silicon Technology Gmbh | Verfahren und Anlage zur Herstellung von Reinstsilizium |
US20100264362A1 (en) * | 2008-07-01 | 2010-10-21 | Yongchae Chee | Method of producing trichlorosilane (TCS) rich Chlorosilane product stably from a fluidized gas phase reactor (FBR) and the structure of the reactor |
US20100001236A1 (en) * | 2008-07-01 | 2010-01-07 | Yongchae Chee | Method of producing trichlorosilane (TCS) rich product stably from a fluidized gas phase reactor (FBR) and the structure of the reactor |
CN102574091B (zh) * | 2009-05-12 | 2016-03-16 | 普罗斯迪尼公司 | 用于合成三氯硅烷的流化床方法和三氯硅烷合成器 |
CN113387362B (zh) * | 2021-05-08 | 2022-11-29 | 内蒙古新特硅材料有限公司 | 改进的冷氢化合成三氯氢硅的方法及装置 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1102119B (de) * | 1959-04-22 | 1961-03-16 | Wacker Chemie Gmbh | Verfahren zur kontinuierlichen Herstellung von anorganischen und organischen Siliciumverbindungen |
FR1239350A (fr) * | 1959-06-24 | 1960-12-16 | Pechiney | Perfectionnement à la fabrication industrielle du trichlorosilane |
ES259162A1 (es) * | 1959-06-24 | 1961-01-01 | Pechiney Prod Chimiques Sa | Procedimiento perfeccionado para la fabricaciën industrial de triclorosilano |
US3148035A (en) * | 1960-03-10 | 1964-09-08 | Wacker Chemie Gmbh | Apparatus for the continuous production of silicon chloroform and/or silicon tetrachloride |
US3104104A (en) * | 1961-01-11 | 1963-09-17 | Wood Dorathy Machado | Jumping, exercise, and play device |
US3704104A (en) * | 1970-06-01 | 1972-11-28 | Texas Instruments Inc | Process for the production of trichlorosilane |
US4092446A (en) * | 1974-07-31 | 1978-05-30 | Texas Instruments Incorporated | Process of refining impure silicon to produce purified electronic grade silicon |
DE2623290A1 (de) * | 1976-05-25 | 1977-12-08 | Wacker Chemitronic | Verfahren zur herstellung von trichlorsilan und/oder siliciumtetrachlorid |
US4374110A (en) * | 1981-06-15 | 1983-02-15 | Motorola, Inc. | Purification of silicon source materials |
-
1985
- 1985-05-31 US US06/739,681 patent/US4585643A/en not_active Expired - Fee Related
-
1986
- 1986-05-07 CA CA000508592A patent/CA1238472A/en not_active Expired
- 1986-05-30 EP EP86107350A patent/EP0203610A3/de not_active Withdrawn
- 1986-05-31 JP JP61124749A patent/JPS61286211A/ja active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20200045555A (ko) * | 2017-10-05 | 2020-05-04 | 와커 헤미 아게 | 클로로실란의 제조 방법 |
JP2020535103A (ja) * | 2017-10-05 | 2020-12-03 | ワッカー ケミー アクチエンゲゼルシャフトWacker Chemie AG | クロロシラン類の製造方法 |
Also Published As
Publication number | Publication date |
---|---|
US4585643A (en) | 1986-04-29 |
CA1238472A (en) | 1988-06-28 |
EP0203610A2 (de) | 1986-12-03 |
EP0203610A3 (de) | 1988-03-23 |
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