JPS6128030B2 - - Google Patents
Info
- Publication number
- JPS6128030B2 JPS6128030B2 JP55169057A JP16905780A JPS6128030B2 JP S6128030 B2 JPS6128030 B2 JP S6128030B2 JP 55169057 A JP55169057 A JP 55169057A JP 16905780 A JP16905780 A JP 16905780A JP S6128030 B2 JPS6128030 B2 JP S6128030B2
- Authority
- JP
- Japan
- Prior art keywords
- chamber
- cassette
- substrates
- processing
- processed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000758 substrate Substances 0.000 claims description 48
- 238000003780 insertion Methods 0.000 claims description 20
- 230000037431 insertion Effects 0.000 claims description 20
- 238000000605 extraction Methods 0.000 claims description 15
- 238000004544 sputter deposition Methods 0.000 claims description 11
- 230000007246 mechanism Effects 0.000 claims description 9
- 238000001312 dry etching Methods 0.000 claims description 3
- 238000007740 vapor deposition Methods 0.000 claims description 3
- 238000007789 sealing Methods 0.000 description 6
- 238000000034 method Methods 0.000 description 4
- 239000010408 film Substances 0.000 description 3
- 238000009434 installation Methods 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000007781 pre-processing Methods 0.000 description 1
- 238000002203 pretreatment Methods 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 230000007723 transport mechanism Effects 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- ing And Chemical Polishing (AREA)
- Drying Of Semiconductors (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16905780A JPS5792838A (en) | 1980-12-02 | 1980-12-02 | Cassette to cassette substrate process device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16905780A JPS5792838A (en) | 1980-12-02 | 1980-12-02 | Cassette to cassette substrate process device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5792838A JPS5792838A (en) | 1982-06-09 |
JPS6128030B2 true JPS6128030B2 (no) | 1986-06-28 |
Family
ID=15879535
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16905780A Granted JPS5792838A (en) | 1980-12-02 | 1980-12-02 | Cassette to cassette substrate process device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5792838A (no) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6015917A (ja) * | 1983-07-08 | 1985-01-26 | Hitachi Ltd | 分子線エピタキシ装置 |
JPS60117615A (ja) * | 1983-11-30 | 1985-06-25 | Hitachi Ltd | 分子線エピタキシ装置 |
DE3427057A1 (de) * | 1984-07-23 | 1986-01-23 | Standard Elektrik Lorenz Ag, 7000 Stuttgart | Anlage zum herstellen von halbleiter-schichtstrukturen durch epitaktisches wachstum |
JPH0612605Y2 (ja) * | 1985-01-17 | 1994-03-30 | 日新電機株式会社 | イオン注入装置用エンドステ−シヨン |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS53104580A (en) * | 1977-02-25 | 1978-09-11 | Ulvac Corp | Vacuum continuous treatment apparatus |
JPS5526047B2 (no) * | 1976-05-06 | 1980-07-10 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58696Y2 (ja) * | 1978-08-07 | 1983-01-07 | 株式会社徳田製作所 | 試料処理装置 |
-
1980
- 1980-12-02 JP JP16905780A patent/JPS5792838A/ja active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5526047B2 (no) * | 1976-05-06 | 1980-07-10 | ||
JPS53104580A (en) * | 1977-02-25 | 1978-09-11 | Ulvac Corp | Vacuum continuous treatment apparatus |
Also Published As
Publication number | Publication date |
---|---|
JPS5792838A (en) | 1982-06-09 |
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