JPS53104580A - Vacuum continuous treatment apparatus - Google Patents

Vacuum continuous treatment apparatus

Info

Publication number
JPS53104580A
JPS53104580A JP1927277A JP1927277A JPS53104580A JP S53104580 A JPS53104580 A JP S53104580A JP 1927277 A JP1927277 A JP 1927277A JP 1927277 A JP1927277 A JP 1927277A JP S53104580 A JPS53104580 A JP S53104580A
Authority
JP
Japan
Prior art keywords
vacuum
treatment apparatus
continuous treatment
vacuum continuous
treatment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1927277A
Other languages
Japanese (ja)
Other versions
JPS6132393B2 (en
Inventor
Chikara Hayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ulvac Inc
Original Assignee
Ulvac Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ulvac Inc filed Critical Ulvac Inc
Priority to JP1927277A priority Critical patent/JPS53104580A/en
Publication of JPS53104580A publication Critical patent/JPS53104580A/en
Publication of JPS6132393B2 publication Critical patent/JPS6132393B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases

Abstract

PURPOSE:To considerably reduce suspension of dust in the vacuum atmosphere of the entire treatment system and reduce vacuum treatemtn time by moving the objects to b etreated in a vacuum sealed state from a vacuum storage chamber via hermetic cover into a vacuum treatment chamber and peforming the treatment continuously.
JP1927277A 1977-02-25 1977-02-25 Vacuum continuous treatment apparatus Granted JPS53104580A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1927277A JPS53104580A (en) 1977-02-25 1977-02-25 Vacuum continuous treatment apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1927277A JPS53104580A (en) 1977-02-25 1977-02-25 Vacuum continuous treatment apparatus

Publications (2)

Publication Number Publication Date
JPS53104580A true JPS53104580A (en) 1978-09-11
JPS6132393B2 JPS6132393B2 (en) 1986-07-26

Family

ID=11994802

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1927277A Granted JPS53104580A (en) 1977-02-25 1977-02-25 Vacuum continuous treatment apparatus

Country Status (1)

Country Link
JP (1) JPS53104580A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5792838A (en) * 1980-12-02 1982-06-09 Anelva Corp Cassette to cassette substrate process device
JPS6193542A (en) * 1984-10-12 1986-05-12 Anelva Corp Vacuum device
JPH03177572A (en) * 1979-12-21 1991-08-01 Varian Assoc Inc Device for heat treatment of wafer

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111763922A (en) * 2020-07-30 2020-10-13 宿迁市金田塑业有限公司 Vacuum coating machine capable of realizing continuous coating function

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5014997A (en) * 1973-06-13 1975-02-17

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5014997A (en) * 1973-06-13 1975-02-17

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03177572A (en) * 1979-12-21 1991-08-01 Varian Assoc Inc Device for heat treatment of wafer
JPH0633457B2 (en) * 1979-12-21 1994-05-02 バリアン・アソシエイツ・インコーポレイテッド Wafer heat treatment equipment
JPS5792838A (en) * 1980-12-02 1982-06-09 Anelva Corp Cassette to cassette substrate process device
JPS6128030B2 (en) * 1980-12-02 1986-06-28 Nichiden Anelva Kk
JPS6193542A (en) * 1984-10-12 1986-05-12 Anelva Corp Vacuum device

Also Published As

Publication number Publication date
JPS6132393B2 (en) 1986-07-26

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